专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US10416560B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition 有权
公开(公告)号：US10416560B2
公开(公告)日：2019-09-17
申请号：US15791667
申请日：2017-10-24
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Naozumi Matsumoto , Yasuhide Ohuchi , Tatsuro Ishikawa , Mayumi Kuroko , Dai Shiota
IPC分类号： C09B67/46 , G03F7/004 , G02B5/20 , G03F7/075 , C09B67/20 , G03F7/028 , G03F7/16 , G03F7/20 , G03F7/26 , C09B5/62 , C09B57/00 , G03F7/00 , G03F7/027 , G03F7/038 , G03F7/105
摘要： A coloring agent dispersion which contains a satisfactorily dispersed pigment, and results in a photosensitive resin composition capable of forming a cured film when mixed in the photosensitive resin composition; a photosensitive resin composition containing the coloring agent dispersion; a cured product of the composition; an organic EL element provided with the cured product; a method for forming a pattern using the composition; and a method for producing a photosensitive resin composition using the dispersion. In a coloring agent dispersion including a coloring agent which contains a pigment and a dispersant, a dispersant containing a silsesquioxane compound of a specific structure is used.

2. 发明授权

US08889323B2 Photosensitive resin composition 有权
标题翻译：感光树脂组合物
公开(公告)号：US08889323B2
公开(公告)日：2014-11-18
申请号：US14140789
申请日：2013-12-26
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Dai Shiota , Mayumi Kuroko , Tatsuro Ishikawa
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0755 , G03F7/0757
摘要： A photosensitive resin composition having excellent storage stability which can form a high precision pattern upon a low amount of exposure; a method of forming a pattern including a polysiloxane coating with the photosensitive resin composition; and an electronic component including a pattern including a polysiloxane coating formed with the photosensitive resin composition. A compound which generates an imidazole compound having a predetermined structure by light is added to a photosensitive resin composition including one or more hydrolyzable silane compounds, hydrolysates of the hydrolyzable silane compounds and condensates thereof and a photo-base generator or a photo-acid generator.
摘要翻译：一种具有优异的储存稳定性的感光性树脂组合物，其能够在低曝光量时形成高精度图案; 用感光性树脂组合物形成包含聚硅氧烷涂层的图案的方法; 以及包含由感光性树脂组合物形成的聚硅氧烷涂层的图案的电子部件。将含有一种或多种可水解硅烷化合物，水解性硅烷化合物及其缩合物的水解物和光产生剂或光酸发生剂的感光性树脂组合物加入到通过光产生具有预定结构的咪唑化合物的化合物。

3. 发明授权

US10322989B2 Transparent body production method, transparent body, and amorphous body 有权
公开(公告)号：US10322989B2
公开(公告)日：2019-06-18
申请号：US15509168
申请日：2015-09-25
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Dai Shiota , Kunihiro Noda , Hiroki Chisaka , Mayumi Kuroko
IPC分类号： C07C43/215 , C08F20/30 , C08F16/32 , C08F20/20 , C07C43/23 , C08F16/26 , C08F216/12 , C08F216/14 , C08F220/30 , C08F220/32 , C08F222/10
摘要： A transparent body production method that includes subjecting the compound represented by formula (1) to heating at a temperature equal to or greater than the melting point of said compound. In formula (1), each of W1 and W2 is the group represented by formula (2) in which the ring Z is an aromatic hydrocarbon ring, X is a single bond or —S—, R1 is a single bond or an alkylene group having 1-4 carbon atoms, R2 is a specific substituent, and m is an integer of 0 or higher, the group represented by formula (4) is —OH— or a (meth)acryloyloxy group, each of the rings Y1 and Y2 is an aromatic hydrocarbon ring, R is a single bond or a specific divalent group, each of R3a and R3b is —CN, a halogen group, or a monovalent hydrocarbon group, and each of n1 and n2 is an integer of 0-4.

4. 发明申请

US20200270456A1 SILICON-CONTAINING RESIN COMPOSITION 审中-公开
公开(公告)号：US20200270456A1
公开(公告)日：2020-08-27
申请号：US16870552
申请日：2020-05-08
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Hiroki Chisaka , Mayumi Kuroko , Kunihiro Noda , Dai Shiota
IPC分类号： C08L83/04 , C09D183/04 , C09D183/16 , C08L83/16 , C09D7/40 , C08G77/60 , C07C69/14 , C08J5/18
摘要： A silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the composition, and a crack-free silica-based coating film formed using the composition. The silicon-containing resin composition includes a silicon-containing resin and a solvent, in which one or more of siloxane resins and polysilanes is used as the silicon-containing resin, and the solvent contains a cycloalkyl acetate having a specific structure.

5. 发明授权

US10689514B2 Silicon-containing resin composition 有权
公开(公告)号：US10689514B2
公开(公告)日：2020-06-23
申请号：US15740227
申请日：2016-07-08
申请人： TOKYO OHKA KOGYO CO., LTD.
发明人： Hiroki Chisaka , Mayumi Kuroko , Kunihiro Noda , Dai Shiota
IPC分类号： C08L83/04 , C08L83/16 , C09D183/04 , C09D183/16 , C09D7/40 , C08G77/60 , C07C69/14 , C08J5/18
摘要： A silicon-containing resin composition with which it is possible to form a silica-based coating film in which generation of cracks is minimized, a method for forming a silica-based coating film using the silicon-containing resin composition, and a crack-free silica-based coating film formed using the silicon-containing resin composition. The silicon-containing resin composition includes a silicon-containing resin and a solvent, in which one or more of siloxane resins and polysilanes is used as the silicon-containing resin, and the solvent contains a cycloalkyl acetate having a specific structure.

6. 发明申请

US20140178808A1 PHOTOSENSITIVE RESIN COMPOSITION 有权
标题翻译：感光树脂组合物
公开(公告)号：US20140178808A1
公开(公告)日：2014-06-26
申请号：US14140789
申请日：2013-12-26
申请人： Tokyo Ohka Kogyo Co., Ltd.
发明人： Dai Shiota , Mayumi Kuroko , Tatsuro Ishikawa
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0755 , G03F7/0757
摘要： A photosensitive resin composition having excellent storage stability which can form a high precision pattern upon a low amount of exposure; a method of forming a pattern including a polysiloxane coating with the photosensitive resin composition; and an electronic component including a pattern including a polysiloxane coating formed with the photosensitive resin composition. A compound which generates an imidazole compound having a predetermined structure by light is added to a photosensitive resin composition including one or more hydrolyzable silane compounds, hydrolysates of the hydrolyzable silane compounds and condensates thereof and a photo-base generator or a photo-acid generator.
摘要翻译：一种具有优异的储存稳定性的感光性树脂组合物，其能够在低曝光量时形成高精度图案; 用感光性树脂组合物形成包含聚硅氧烷涂层的图案的方法; 以及包含由感光性树脂组合物形成的聚硅氧烷涂层的图案的电子部件。将含有一种或多种可水解硅烷化合物，水解性硅烷化合物及其缩合物的水解物和光产生剂或光酸发生剂的感光性树脂组合物加入到通过光产生具有预定结构的咪唑化合物的化合物。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式