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    • 4. 发明申请
    • METHOD AND APPARATUS FOR PROVIDING PROBABLE CAUSE RELATING TO VEHICLE NON-COMPLIANCE
    • 提供与车辆不合规有关的可能原因的方法和装置
    • US20130138267A1
    • 2013-05-30
    • US13746349
    • 2013-01-22
    • Gerald HigniteJames HalseyArnie LambertTim Thomas
    • Gerald HigniteJames HalseyArnie LambertTim Thomas
    • G06F17/00
    • G06F17/00G06Q10/10G08G1/096716G08G1/096741G08G1/096775G08G1/205G08G1/207
    • The present invention provides systems, methods and devices to generate an indication or signal by an indicator device of a vehicle that is detectable near the vehicle regarding one or more statuses of the vehicle, such as insurance policy, registration, crimes, wanted persons, etc. The indicator device may produce the indication or signal based on a control signal sent from a remote control system to the indicator device via a network and/or broadcast transmitter. The control system may determine the control signal and vehicle status based on information from external database(s). The indicator device may also receive local status information regarding the vehicle or any person associated with the vehicle. Such local status information may be sent back to the control system as a report signal, which may be stored in a remote database. The indicator signal or report signal may be detected by law enforcement near the vehicle.
    • 本发明提供了一种系统,方法和装置,用于通过车辆的指示装置产生指示或信号,所述指示装置在车辆附近可以检测到关于车辆的一个或多个状态,例如保险单,登记,犯罪,想要的人等 指示器装置可以基于通过网络和/或广播发射机从遥控系统发送到指示符装置的控制信号来产生指示或信号。 控制系统可以基于来自外部数据库的信息来确定控制信号和车辆状态。 指示装置还可以接收关于车辆或与车辆相关联的任何人的本地状态信息。 这样的本地状态信息可以作为可以存储在远程数据库中的报告信号发送回控制系统。 指示信号或报告信号可以由车辆附近的执法机构检测。
    • 7. 发明授权
    • Scanning laser lithography system alignment apparatus
    • 扫描激光光刻系统对准装置
    • US5327338A
    • 1994-07-05
    • US973567
    • 1992-11-09
    • Paul AllenMike BohanTim ThomasRobin Teitzel
    • Paul AllenMike BohanTim ThomasRobin Teitzel
    • G03F7/20B41J2/435
    • G03F7/704
    • A direct-write lithography tool having improved alignment characteristics. The present invention discloses use of an optical alignment apparatus in a multi-beam lithography system. The optical alignment apparatus provides for alignment through a reduction lens utilized by the multi-beam lithography system for writing to semiconductor wafers and the like through use of optics for correction of distortion and curvature caused by viewing with a radiant energy beam of a different wavelength than the beams used for writing. Further, the alignment optics provide for multiple paths in a single optics system through use of liquid crystal retarders and beam splitters to direct the radiant energy beam through a selected optical path. In the present invention, a first optical path may provide for high magnification and a second for low magnification. Further, other optical paths may provide for bright or dark field illumination and viewing.
    • 具有改进的对准特性的直写光刻工具。 本发明公开了在多光束光刻系统中使用光学对准装置。 光学对准装置通过多光束光刻系统使用的还原透镜进行对准,用于通过使用用于校正由不同波长的辐射能量束观察引起的失真和曲率的光学元件来写入半导体晶片等 梁用于书写。 此外,对准光学器件通过使用液晶延迟器和分束器来引导辐射能量束通过所选择的光路而在单个光学系统中提供多个路径。 在本发明中,第一光路可以提供高倍率,而第二光路可以提供低放大率。 此外,其他光路可以提供亮场或暗场照明和观看。