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1. 发明授权

US4694264A Radio frequency coaxial feedthrough device 失效
标题翻译：射频同轴馈通装置
公开(公告)号：US4694264A
公开(公告)日：1987-09-15
申请号：US836776
申请日：1986-03-05
申请人： Thomas L. Owens , Frederick W. Baity , Daniel J. Hoffman , John H. Whealton
发明人： Thomas L. Owens , Frederick W. Baity , Daniel J. Hoffman , John H. Whealton
IPC分类号： H01P1/08 , H01P1/30 , H01P5/02
CPC分类号： H01P1/30 , H01P1/08
摘要： A radio frequency coaxial vacuum feedthrough is provided which utilizes a cylindrical ceramic vacuum break formed of an alumina ceramic. The cylinder is coaxially disposed and brazed between tapered coaxial conductors to form a vacuum sealed connection between a pressurized upstream coaxial transmission line and a utilization device located within a vacuum container. The feedthrough provides 50 ohm matched impedance RF feedthrough up to about 500 MHz at power levels in the multimegawatt range.
摘要翻译：提供射频同轴真空馈通，其利用由氧化铝陶瓷形成的圆柱形陶瓷真空断裂。气缸同轴地布置并钎焊在锥形同轴导体之间，以在加压的上游同轴传输线和位于真空容器内的利用装置之间形成真空密封连接。馈通提供50欧姆匹配阻抗RF馈通，高达约500 MHz，功率水平在多瓦瓦范围内。

2. 发明授权

US4755345A Impedance matched, high-power, rf antenna for ion cyclotron resonance heating of a plasma 失效
标题翻译：阻抗匹配，大功率，射频天线用于等离子体的离子回旋共振加热
公开(公告)号：US4755345A
公开(公告)日：1988-07-05
申请号：US891833
申请日：1986-08-01
申请人： Frederick W. Baity, Jr. , Daniel J. Hoffman , Thomas L. Owens
发明人： Frederick W. Baity, Jr. , Daniel J. Hoffman , Thomas L. Owens
IPC分类号： H01Q7/00 , H05H1/18 , G21B1/00
CPC分类号： H05H1/18 , H01Q7/005
摘要： A resonant double loop radio frequency (rf) antenna for radiating high-power rf energy into a magnetically confined plasma. An inductive element in the form of a large current strap, forming the radiating element, is connected between two variable capacitors to form a resonant circuit. A real input impedance results from tapping into the resonant circuit along the inductive element, generally near the midpoint thereof. The impedance can be matched to the source impedance by adjusting the separate capacitors for a given tap arrangement or by keeping the two capacitances fixed and adjustng the tap position. This results in a substantial reduction in the voltage and current in the transmission system to the antenna compared to unmatched antennas. Because the complete circuit loop consisting of the two capacitors and the inductive element is resonant, current flows in the same direction along the entire length of the radiating element and is approximately equal in each branch of the circuit. Unidirectional current flow permits excitation of low order poloidal modes which penetrate more deeply into the plasma.
摘要翻译：用于将大功率射频能量辐射到磁限制等离子体中的共振双环射频（RF）天线。形成辐射元件的大电流带形式的电感元件连接在两个可变电容器之间以形成谐振电路。真正的输入阻抗是通过沿着电感元件的谐振电路进入，通常在其中点附近。阻抗可以通过调整给定抽头布置的单独电容器或通过保持两个电容固定并调整分接头位置来匹配源阻抗。与未匹配的天线相比，这导致传输系统对天线的电压和电流的显着降低。由于由两个电容器和电感元件组成的完整的电路回路是谐振的，所以电流沿着辐射元件的整个长度在相同的方向上流动，并且在电路的每个分支中大致相等。单向电流允许激发更深入等离子体的低阶极向模式。

3. 发明授权

US09767988B2 Method of controlling the switched mode ion energy distribution system 有权
公开(公告)号：US09767988B2
公开(公告)日：2017-09-19
申请号：US13596976
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： C23C14/00 , H01J37/32
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

4. 发明授权

US09685297B2 Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system 有权
公开(公告)号：US09685297B2
公开(公告)日：2017-06-20
申请号：US13597093
申请日：2012-08-28
申请人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
发明人： Daniel Carter , Victor Brouk , Daniel J. Hoffman
IPC分类号： C23C14/34 , H01J37/08 , G01N27/06 , H01J37/32
CPC分类号： H01J37/08 , G01N27/06 , H01J37/32944 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

5. 发明授权

US09362089B2 Method of controlling the switched mode ion energy distribution system 有权
标题翻译：控制开关式离子能量分配系统的方法
公开(公告)号：US09362089B2
公开(公告)日：2016-06-07
申请号：US13597050
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： C23C14/34 , H01J37/32
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能并将衬底夹持到衬底支撑件的系统，方法和装置。一种示例性方法包括将衬底放置在等离子体室中，在等离子体室中形成等离子体，可控制地将功率切换到衬底，以便向衬底施加周期性电压函数（或修改的周期性电压函数），并且对衬底进行调制周期性电压功能的多个周期，周期性电压函数响应于衬底表面处的离子能量的限定分布，以便以时间平均的方式实现定义的离子能量分布。

6. 发明授权

US09309594B2 System, method and apparatus for controlling ion energy distribution of a projected plasma 有权
标题翻译：用于控制投影等离子体的离子能量分布的系统，方法和装置
公开(公告)号：US09309594B2
公开(公告)日：2016-04-12
申请号：US13193345
申请日：2011-07-28
申请人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
发明人： Daniel J. Hoffman , Victor Brouk , Daniel Carter
IPC分类号： C23C16/50 , C23C14/34 , H01J37/32
CPC分类号： C23C16/50 , C23C14/345 , H01J37/32009 , H01J37/32082 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber via a remotely generated ionizing electromagnetic field that extends into the plasma chamber from a remote projected source, controllably switching power to the substrate so as to apply a periodic voltage function to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a desired distribution of energies of ions at the surface of the substrate so as to effectuate the desired distribution of ion energies on a time-averaged basis.
摘要翻译：公开了用于调节等离子体室中的离子能量的系统，方法和装置。一种示例性方法包括将基板放置在等离子体室中，通过远程产生的电离电磁场在等离子体室中形成等离子体，该离子化电磁场从远程投影源延伸到等离子体室中，可控制地将功率切换到基板，以便施加周期性电压功能到基板，并且在周期性电压函数的多个周期中调制周期性电压函数，其响应于衬底表面处的离子能量的期望分布，以便在一段时间内实现所需的离子能量分布依据。

7. 发明授权

US08884525B2 Remote plasma source generating a disc-shaped plasma 有权
标题翻译：远程等离子体源产生盘形等离子体
公开(公告)号：US08884525B2
公开(公告)日：2014-11-11
申请号：US13425159
申请日：2012-03-20
申请人： Daniel J. Hoffman , Daniel Carter , Randy Grilley , Karen Peterson
发明人： Daniel J. Hoffman , Daniel Carter , Randy Grilley , Karen Peterson
IPC分类号： H05B31/26 , B23K10/00 , H05H1/46
CPC分类号： H05H1/46 , H05H2001/4652
摘要： Disclosed herein are systems, methods and apparatuses for dissociating a non-activated gas through a disc-shaped plasma in a remote plasma source. Two inductive elements, one on either side of the disc-shaped plasma, generate a magnetic field that induces electric fields that sustain the disc-shaped plasma. The inductive elements can be coiled conductors having any number of loops and can be arranged in planar or vertical coils or a combination of planar and vertical coils. Additionally, the ratio of inductive element radius to gap distance between the two inductive elements can be configured to achieve a desired vertical plasma confinement.
摘要翻译：本文公开了用于通过远程等离子体源中的盘形等离子体解离非活化气体的系统，方法和装置。两个感应元件，一个在盘形等离子体的两侧，产生一个磁场，其诱导维持盘形等离子体的电场。电感元件可以是具有任何数量的环的线圈导体，并且可以布置在平面或垂直线圈中或平面和垂直线圈的组合。此外，电感元件半径与两个感应元件之间的间隙距离的比可以被配置成实现期望的垂直等离子体约束。

8. 发明授权

US08608900B2 Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes 有权
标题翻译：具有前馈热控制系统的等离子体反应器，其使用用于适应RF功率变化或晶片温度变化的热模型
公开(公告)号：US08608900B2
公开(公告)日：2013-12-17
申请号：US11409183
申请日：2006-04-21
申请人： Douglas A. Buchberger, Jr. , Paul Lukas Brillhart , Richard Fovell , Hamid Tavassoli , Douglas H. Burns , Kallol Bera , Daniel J. Hoffman
发明人： Douglas A. Buchberger, Jr. , Paul Lukas Brillhart , Richard Fovell , Hamid Tavassoli , Douglas H. Burns , Kallol Bera , Daniel J. Hoffman
IPC分类号： H01L21/3065 , C23C16/52 , C23C16/46 , C23C16/458 , C23C16/503 , C23C16/509
CPC分类号： H01L21/67248 , F25B49/02 , F25B2400/0401 , F25B2400/0403 , F25B2400/0411 , F25B2700/21174 , F25B2700/21175 , H01J37/32091 , H01J37/32183 , H01J37/32724 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L21/6831 , H05H2001/4682
摘要： A plasma reactor having a reactor chamber and an electrostatic chuck with a surface for holding a workpiece inside the chamber includes a backside gas pressure source coupled to the electrostatic chuck for applying a thermally conductive gas under a selected pressure into a workpiece-surface interface formed whenever a workpiece is held on the surface and an evaporator inside the electrostatic chuck and a refrigeration loop having an expansion valve for controlling flow of coolant through the evaporator. The reactor further includes a temperature sensor in the electrostatic chuck and a memory storing a schedule of changes in RF power or wafer temperature. The reactor further includes a thermal model capable of simulating heat transfer between the evaporator and the surface based upon measurements from the temperature sensor, and a control processor coupled to the thermal model and to the memory and governing the backside gas pressure source in response to a prediction from the model of a change in the selected pressure that would compensate for the next scheduled change in RF power or implement the next scheduled change in wafer temperature.
摘要翻译：具有反应室和具有用于将工件保持在室内的表面的静电卡盘的等离子体反应器包括耦合到静电卡盘的背侧气体压力源，用于在选定压力下将导热气体施加到每次形成的工件表面界面中工件被保持在表面上，蒸发器在静电卡盘内部，制冷回路具有用于控制通过蒸发器的冷却剂流动的膨胀阀。反应器还包括静电卡盘中的温度传感器和存储RF功率或晶片温度变化计划的存储器。反应器还包括热模型，其能够基于来自温度传感器的测量来模拟蒸发器和表面之间的热传递;以及控制处理器，其耦合到热模型和存储器，并且响应于所述热模型和存储器控制背侧气体压力源从所选压力的变化的模型中预测将补偿下一次调频的功率变化或实现下一个预定的晶片温度的变化。

9. 发明授权

US08337660B2 Capacitively coupled plasma reactor having very agile wafer temperature control 有权
公开(公告)号：US08337660B2
公开(公告)日：2012-12-25
申请号：US12855678
申请日：2010-08-12
申请人： Douglas A. Buchberger, Jr. , Paul Lukas Brillhart , Richard Fovell , Hamid Tavassoli , Douglas H. Burns , Kallol Bera , Daniel J. Hoffman , Kenneth W. Cowans , William W. Cowans , Glenn W. Zubillaga , Isaac Millan
发明人： Douglas A. Buchberger, Jr. , Paul Lukas Brillhart , Richard Fovell , Hamid Tavassoli , Douglas H. Burns , Kallol Bera , Daniel J. Hoffman , Kenneth W. Cowans , William W. Cowans , Glenn W. Zubillaga , Isaac Millan
IPC分类号： H01L21/306 , C23C16/46 , C23C16/52 , H01L21/683
CPC分类号： H01L21/67248 , H01L21/67069 , H01L21/67109 , H01L21/6831
摘要： A plasma reactor for processing a workpiece includes a reactor chamber, an electrostatic chuck within the chamber having a top surface for supporting a workpiece and having indentations in the top surface that form enclosed gas flow channels whenever covered by a workpiece resting on the top surface. The reactor further includes thermal control apparatus thermally coupled to the electrostatic chuck, an RF plasma bias power generator coupled to apply RF power to the electrostatic chuck, a pressurized gas supply of a thermally conductive gas, a controllable gas valve coupling the pressurized gas supply to the indentations to facilitate filling the channels with the thermally conductive gas for heat transfer between a backside of a workpiece and the electrostatic chuck at a heat transfer rate that is a function of the pressure against the backside of the workpiece of the thermally conductive gas. The reactor further includes an agile workpiece temperature control loop including (a) a temperature probe in the electrostatic chuck, and (b) a backside gas pressure controller coupled to an output of the temperature probe and responsive to a specified desired temperature, the controller governing the gas valve in response to a difference between the output of the temperature probe and the desired temperature.

10. 发明申请

US20120319584A1 METHOD OF CONTROLLING THE SWITCHED MODE ION ENERGY DISTRIBUTION SYSTEM 有权
公开(公告)号：US20120319584A1
公开(公告)日：2012-12-20
申请号：US13597050
申请日：2012-08-28
申请人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
发明人： Victor Brouk , Daniel J. Hoffman , Daniel Carter
IPC分类号： H05H1/24
CPC分类号： H01J37/32009 , H01J37/32174 , H01J37/32935 , H01J37/3299
摘要： Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis.

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