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    • 8. 发明授权
    • Methods for addressing electro-optic materials
    • 电光材料寻址方法
    • US06825970B2
    • 2004-11-30
    • US10065055
    • 2002-09-13
    • Alberto GoenagaKarl R. AmundsonMichael L. SteinerLibing Zhang
    • Alberto GoenagaKarl R. AmundsonMichael L. SteinerLibing Zhang
    • G02B2600
    • G02F1/133348G02F1/167
    • The invention provides a first process for addressing an electro-optic material having first and second display states differing in at least one optical characteristic and being capable of being changed from its first to its second display state by application of an electric field to the material, the process comprising applying an electrically charged fluid to a portion of at least one surface of the material, thereby changing the display state of a portion of the material. The invention also provides a second process for addressing an electro-optic material, this process comprising contacting the electro-optic material with a non-conductive brush means wet with a conductive liquid while applying a potential difference between the brush means and the electro-optic material.
    • 本发明提供了一种用于寻址具有在至少一个光学特性上不同的第一和第二显示状态并且能够通过向该材料施加电场而从其第一显示状态改变到第二显示状态的电光材料的第一过程, 所述方法包括将带电流体施加到所述材料的至少一个表面的一部分,从而改变所述材料的一部分的显示状态。 本发明还提供了一种用于寻址电光材料的第二种方法,该方法包括使电光材料与润湿导电液体的非导电刷装置接触,同时在刷装置和电光学器件之间施加电位差 材料。