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1. 发明申请

US20100140462A1 System and Method for Real-Time Measurement of Sail Conditions and Dynamics 审中-公开
标题翻译：船舶条件和动力学实时测量系统与方法
公开(公告)号：US20100140462A1
公开(公告)日：2010-06-10
申请号：US12515732
申请日：2007-11-20
申请人： Thomas Farrell , John Levins , Michael Todd
发明人： Thomas Farrell , John Levins , Michael Todd
IPC分类号： G01J1/42 , G02B6/00 , G01K11/32 , G01M11/08
CPC分类号： G01M11/085 , B63H9/04 , B63H9/0657 , G01K11/3206
摘要： The invention provides an optical measurement system and method for monitoring the condition of a sail, the system comprising: an optical interrogation unit that produces and receives an optical signal; and an optical fibre network that interconnects the interrogation unit with a plurality of optical sensors in communication with the sail, wherein the sensors are mounted onto the sail. The optical system measures parameters of the sail, from which shape, integrity and overall conditions of the sail can be calculated in real-time.
摘要翻译：本发明提供了一种用于监视帆状况的光学测量系统和方法，该系统包括：光询问单元，其产生和接收光信号; 以及光纤网络，其将询问单元与与帆连通的多个光学传感器互连，其中传感器安装在帆上。光学系统测量帆的参数，从而可以实时计算帆的形状，完整性和总体状况。

2. 发明授权

US08699875B2 Dispersion measurement system and method in an optical communication network 有权
标题翻译：光通信网络中的色散测量系统和方法
公开(公告)号：US08699875B2
公开(公告)日：2014-04-15
申请号：US13810957
申请日：2011-07-19
申请人： Emilio Bravi , Giuseppe Tali , David McDonald , Michael Todd , David Bernard
发明人： Emilio Bravi , Giuseppe Tali , David McDonald , Michael Todd , David Bernard
IPC分类号： G01N21/41 , H04B10/07 , H04B17/00 , G01N21/84
CPC分类号： H04B10/07951 , G01M11/332 , G01M11/335 , G01M11/338 , H04B10/073
摘要： The invention relates to a system and method of dispersion measurement in an optical fiber network. The invention provides means for transmitting from a transmitting node, using a single tunable laser transmitter, two consecutive bursts of data at different wavelengths λ1 and λ2 to a receiver node, wherein each burst of data comprises a unique sequence of amplitude modulated data, and wherein the two sequences are injected with a fixed known delay. The delay between the two consecutive bursts of data is maintained by selective switching of the tunable laser, such that clock recovery circuitry at the receiver node remains locked during the delay between the two bursts. The dispersion measurements method of the present invention is based on walk off and bit position detection between two wavelengths suitable for fast optical burst switching network is described. This method does not require an operator, extra equipment, or traffic interruption on the network.
摘要翻译：本发明涉及光纤网络中色散测量的系统和方法。本发明提供了用于使用单个可调谐激光发射器从不同波长λ1和λ2的两个连续的数据突发传送到接收机节点的装置，其中每个数据突发包括幅度调制数据的唯一序列，并且其中两个序列以固定的已知延迟注入。通过可调谐激光器的选择性切换来维持两个连续的数据脉冲之间的延迟，使得接收器节点处的时钟恢复电路在两个脉冲串之间的延迟期间保持锁定。本发明的色散测量方法是基于步行和适用于快速光突发交换网络的两个波长之间的位位置检测进行描述的。该方法不需要网络上的操作员，额外的设备或流量中断。

3. 发明授权

US08130641B2 Methods and systems for managing network traffic within a virtual network system 有权
标题翻译：用于管理虚拟网络系统内的网络流量的方法和系统
公开(公告)号：US08130641B2
公开(公告)日：2012-03-06
申请号：US12403466
申请日：2009-03-13
申请人： Patrick Choy Ming Wong , Scott Robert Koster , Michael Todd
发明人： Patrick Choy Ming Wong , Scott Robert Koster , Michael Todd
IPC分类号： H04L12/26
CPC分类号： H04L41/00
摘要： Methods, systems and computer readable mediums storing computer executable programs for managing network traffic within a virtual network system. A virtual network system defined within a physical network device is identified. A first virtual network device defined within the virtual network system is identified. A virtual network appliance within the physical network device is defined. The virtual network appliance is communicatively coupled to the first virtual network device. The virtual network appliance is communicatively coupled to the virtual network system. The virtual network appliance is operable to manage network traffic associated with the first virtual network device.
摘要翻译：存储用于管理虚拟网络系统内的网络流量的计算机可执行程序的方法，系统和计算机可读介质。识别在物理网络设备内定义的虚拟网络系统。识别在虚拟网络系统内定义的第一虚拟网络设备。定义物理网络设备内的虚拟网络设备。虚拟网络设备通信地耦合到第一虚拟网络设备。虚拟网络设备通信地耦合到虚拟网络系统。虚拟网络设备可操作以管理与第一虚拟网络设备相关联的网络流量。

4. 发明申请

US20080014725A1 DEPOSITION OVER MIXED SUBSTRATES USING TRISILANE 有权
标题翻译：使用TRISILANE的混合基板上的沉积
公开(公告)号：US20080014725A1
公开(公告)日：2008-01-17
申请号：US11843552
申请日：2007-08-22
申请人： Michael Todd
发明人： Michael Todd
IPC分类号： H01L21/20
CPC分类号： C23C16/0272 , B82Y10/00 , B82Y30/00 , C23C16/22 , C23C16/24 , C23C16/30 , C23C16/308 , C23C16/325 , C23C16/345 , C23C16/36 , C23C16/56 , C30B25/02 , C30B29/06 , H01L21/02422 , H01L21/0243 , H01L21/0245 , H01L21/0251 , H01L21/02529 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/02592 , H01L21/02595 , H01L21/02598 , H01L21/0262 , H01L21/02667 , H01L21/2257 , H01L21/28035 , H01L21/28044 , H01L21/28194 , H01L21/28525 , H01L21/28556 , H01L21/3185 , H01L21/32055 , H01L28/84 , H01L29/127 , H01L29/51 , H01L29/517 , H01L29/518 , H01L29/66181 , H01L29/66242 , H01L31/1804 , H01L31/182 , H01L31/202 , Y02E10/546 , Y02E10/547 , Y02P70/521 , Y10S438/933
摘要： Trisilane is used in chemical vapor deposition methods to deposit silicon-containing films over mixed substrates. Such methods are useful in semiconductor manufacturing to provide a variety of advantages, including uniform deposition over heterogeneous surfaces, high deposition rates, and higher manufacturing productivity. An example is in forming the base region of a heterojunction bipolar transistor, including simultaneous deposition over both single crystal semiconductor surfaces and amorphous insulating regions.
摘要翻译：三氯硅烷用于化学气相沉积方法以在混合的基底上沉积含硅膜。这种方法在半导体制造中可用于提供各种优点，包括在异质表面上的均匀沉积，高沉积速率和更高的制造生产率。例如，形成异质结双极晶体管的基极区域，包括在单晶半导体表面和非晶绝缘区域上的同时沉积。

5. 发明申请

US20070102790A1 Process for deposition of semiconductor films 有权
公开(公告)号：US20070102790A1
公开(公告)日：2007-05-10
申请号：US11642167
申请日：2006-12-20
申请人： Michael Todd
发明人： Michael Todd
IPC分类号： H01L31/117 , H01L31/00 , H01L29/739
CPC分类号： C23C16/0272 , B82Y10/00 , B82Y30/00 , C23C16/22 , C23C16/24 , C23C16/30 , C23C16/308 , C23C16/325 , C23C16/345 , C23C16/36 , C23C16/56 , C30B25/02 , C30B29/06 , H01L21/02422 , H01L21/0243 , H01L21/0245 , H01L21/0251 , H01L21/02529 , H01L21/02532 , H01L21/02576 , H01L21/02579 , H01L21/02592 , H01L21/02595 , H01L21/02598 , H01L21/0262 , H01L21/02667 , H01L21/2257 , H01L21/28035 , H01L21/28044 , H01L21/28194 , H01L21/28525 , H01L21/28556 , H01L21/3185 , H01L21/32055 , H01L28/84 , H01L29/127 , H01L29/51 , H01L29/517 , H01L29/518 , H01L29/66181 , H01L29/66242 , H01L31/1804 , H01L31/182 , H01L31/202 , Y02E10/546 , Y02E10/547 , Y02P70/521 , Y10S438/933
摘要： Chemical vapor deposition processes utilize higher order silanes and germanium precursors as chemical precursors. The processes have high deposition rates yet produce more uniform films, both compositionally and in thickness, than films prepared using conventional chemical precursors. In preferred embodiments, trisilane is employed to deposit SiGe-containing films that are useful in the semiconductor industry in various applications such as transistor gate electrodes.

6. 发明申请

US20070032676A1 Process for depositing low dielectric constant materials 失效
标题翻译：低介电常数材料沉积工艺
公开(公告)号：US20070032676A1
公开(公告)日：2007-02-08
申请号：US11581657
申请日：2006-10-16
申请人： Michael Todd
发明人： Michael Todd
IPC分类号： C07F7/04
CPC分类号： C23C16/30 , C07F7/0896 , C23C16/401 , H01L21/02126 , H01L21/02131 , H01L21/022 , H01L21/02211 , H01L21/02216 , H01L21/02271 , H01L21/31629 , H01L21/31633 , Y10T428/24942 , Y10T428/24975
摘要： Chemical vapor deposition processes result in films having low dielectric constants when suitable chemical precursors are utilized. Preferred chemical precursors include siloxanes, (fluoroalkyl)fluorosiloxanes, (fluoroalkyl)silanes, (alkyl)fluorosilanes, (fluoroalkyl)fluorosilanes, alkylsiloxysilanes, alkoxysilanes, alkylalkoxysilanes, silylmethanes, alkoxysilylmethanes, alkylalkoxysilylmethanes, alkoxymethanes, alkylalkoxymethanes, and mixtures thereof. The precursors are particularly suited to thermal CVD for producing low dielectric constant films at relatively low temperatures, particularly without the use of additional oxidizing agents. Such films are useful in the microelectronics industry.
摘要翻译：当使用合适的化学前体时，化学气相沉积工艺导致具有低介电常数的膜。优选的化学前体包括硅氧烷，（氟烷基）氟硅氧烷，（氟烷基）硅烷，（烷基）氟硅烷，（氟代烷基）氟硅烷，烷基硅氧烷，烷氧基硅烷，烷基烷氧基硅烷，甲硅烷基甲烷，烷氧基甲硅烷基甲烷，烷基烷氧基甲硅烷基甲烷，烷氧基甲烷，烷基烷氧基甲烷及其混合物。前体特别适用于在较低温度下制备低介电常数膜的热CVD，特别是不使用另外的氧化剂。这种膜在微电子工业中是有用的。

7. 发明申请

US20060216417A1 System for control of gas injectors 有权
标题翻译：气体喷射器控制系统
公开(公告)号：US20060216417A1
公开(公告)日：2006-09-28
申请号：US11373408
申请日：2006-03-09
申请人： Michael Todd , Keith Weeks , Paul Jacobson
发明人： Michael Todd , Keith Weeks , Paul Jacobson
IPC分类号： C23C16/00
CPC分类号： C23C16/45523 , C23C16/45574 , C23C16/52
摘要： A substrate processing system has computer controlled injectors. The computer is configured to adjust a plurality of injectors, such as during deposition of a graded layer, between depositions of two different layers, or between deposition and chamber clean steps.
摘要翻译：基板处理系统具有计算机控制的喷射器。计算机被配置为调整多个喷射器，例如在沉积层析层期间，在两个不同层的沉积之间，或在沉积和室清洁步骤之间。

8. 发明申请

US20060088985A1 Low temperature silicon compound deposition 有权
标题翻译：低温硅化合物沉积
公开(公告)号：US20060088985A1
公开(公告)日：2006-04-27
申请号：US11213449
申请日：2005-08-25
申请人： Ruben Haverkort , Yuet Wan , Marinus De Blank , Cornelius van der Jeugd , Jacobus Beulens , Michael Todd , Keith Weeks , Christian Werkhoven , Christophe Pomarede
发明人： Ruben Haverkort , Yuet Wan , Marinus De Blank , Cornelius van der Jeugd , Jacobus Beulens , Michael Todd , Keith Weeks , Christian Werkhoven , Christophe Pomarede
IPC分类号： H01L21/20
CPC分类号： H01L21/0217 , C23C16/24 , C23C16/345 , C23C16/4408 , C23C16/45523 , C23C16/56 , H01L21/02329 , H01L21/0234 , H01L21/02381 , H01L21/02532 , H01L21/0262 , H01L21/3144 , H01L21/3185
摘要： Sequential processes are conducted in a batch reaction chamber to form ultra high quality silicon-containing compound layers, e.g., silicon nitride layers, at low temperatures. Under reaction rate limited conditions, a silicon layer is deposited on a substrate using trisilane as the silicon precursor. Trisilane flow is interrupted. A silicon nitride layer is then formed by nitriding the silicon layer with nitrogen radicals, such as by pulsing the plasma power (remote or in situ) on after a trisilane step. The nitrogen radical supply is stopped. Optionally non-activated ammonia is also supplied, continuously or intermittently. If desired, the process is repeated for greater thickness, purging the reactor after each trisilane and silicon compounding step to avoid gas phase reactions, with each cycle producing about 5-7 angstroms of silicon nitride.
摘要翻译：在间歇反应室中进行连续工艺，以在低温下形成超高质量的含硅化合物层，例如氮化硅层。在反应速率有限的条件下，使用丙硅烷作为硅前体在基板上沉积硅层。三氯甲烷流动中断。然后通过用氮自由基氮化硅层来形成氮化硅层，例如通过在丙硅烷步骤之后脉冲等离子体功率（远程或原位）而形成。停止氮气供应。任选地，还可以连续或间歇地提供非活化氨。如果需要，重复该过程以获得更大的厚度，在每个丙硅烷和硅化合步骤之后清洗反应器以避免气相反应，每个循环产生约5-7埃的氮化硅。

9. 发明授权

US09264441B2 System and method for securing a network from zero-day vulnerability exploits 有权
公开(公告)号：US09264441B2
公开(公告)日：2016-02-16
申请号：US12079013
申请日：2008-03-24
申请人： Michael Todd , Scott Robert Koster , Patrick Choy Ming Wong
发明人： Michael Todd , Scott Robert Koster , Patrick Choy Ming Wong
IPC分类号： G06F7/04 , H04L29/06 , G06F21/53 , G06F21/55 , G06F21/56 , G06F21/57
CPC分类号： H04L63/1416 , G06F21/53 , G06F21/552 , G06F21/564 , G06F21/566 , G06F21/577 , G06F2221/2101 , H04L63/1441 , H04L63/1491
摘要： A method of securing a network from vulnerability exploits, including the steps of a traffic analysis engine receiving a plurality of packets destined for an internal operating system; the traffic analysis engine selectively forwarding the packets to at least one virtual machine emulating the internal operating system; the virtual machine processing each forwarded packet; a rapid analysis engine identifying a malicious packet from the processed packets; and the rapid analysis engine creating a new signature to identify the malicious packet.

10. 发明授权

US08917616B2 Methods and apparatus for detection of a NAT device 有权
标题翻译：用于检测NAT设备的方法和装置
公开(公告)号：US08917616B2
公开(公告)日：2014-12-23
申请号：US13260162
申请日：2009-10-28
申请人： Michael Todd , Patrick Choy Ming Wong , Matthew Richard Thomas Hall
发明人： Michael Todd , Patrick Choy Ming Wong , Matthew Richard Thomas Hall
IPC分类号： H04L12/26 , H04L29/12
CPC分类号： H04L61/2514 , H04L29/12367 , H04L43/18 , H04L63/1416
摘要： A method for detection of a network address translation (NAT) device in a network is described herein. An edge network device detects a first packet at an edge port of the edge network device. A second packet is detected at the edge port of the edge network device. It is determined whether a time to live (TTL) value associated with the first packet is different from a TTL value associated with the second packet. Where the TTL value associated with the first packet is different from a TTL value associated with the second packet, it is determined that a NAT device is connected to the edge port. Where the TTL value associated with the first packet is the same as a TTL value associated with the second packet, it is determined that a NAT device is not connected to the edge port.
摘要翻译：本文描述了一种网络中的网络地址转换（NAT）设备的检测方法。边缘网络设备在边缘网络设备的边缘端口处检测第一分组。在边缘网络设备的边缘端口处检测到第二个分组。确定与第一分组相关联的生存时间（TTL）值是否与与第二分组相关联的TTL值不同。在与第一分组相关联的TTL值不同于与第二分组相关联的TTL值的情况下，确定NAT设备连接到边缘端口。在与第一分组相关联的TTL值与第二分组相关联的TTL值相同的情况下，确定NAT设备未连接到边缘端口。

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