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1. 发明申请

US20090280727A1 POLISHING SYSTEM WITH THREE HEADED CAROUSEL 审中-公开
标题翻译：具有三头卡车的抛光系统
公开(公告)号：US20090280727A1
公开(公告)日：2009-11-12
申请号：US12118438
申请日：2008-05-09
申请人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
发明人： LAKSHMANAN KARUPPIAH , Tetsuya Ishikawa , Donald J.K. Olgado , Allen L. D'Ambra , Hung Chih Chen
IPC分类号： B24B29/02 , B24B1/00
CPC分类号： B24B41/005 , B24B27/0076 , B24B37/345
摘要： Embodiments of the present invention provide a polishing module configured to use in a polishing system. The polishing module comprises a base member, two polishing stations disposed on the base member, one load cup, and a carousel having three polishing heads.
摘要翻译：本发明的实施例提供了一种配置成在抛光系统中使用的抛光模块。抛光模块包括基座构件，设置在基座构件上的两个抛光台，一个负载杯和具有三个抛光头的圆盘传送带。

2. 发明申请

US20080268753A1 NON-CONTACT WET WAFER HOLDER 审中-公开
标题翻译：非接触式湿纸架
公开(公告)号：US20080268753A1
公开(公告)日：2008-10-30
申请号：US11739450
申请日：2007-04-24
申请人： Tetsuya Ishikawa , Donald J.K. Olgado , Hung Chih Chen
发明人： Tetsuya Ishikawa , Donald J.K. Olgado , Hung Chih Chen
IPC分类号： B24B1/00
CPC分类号： B24B37/30 , H01L21/6838
摘要： The present invention relates to a load cup configured to speed up substrate transferring to and from a carrier head and to reduce corrosion during the transferring. One embodiment of the present invention provides a non-contact substrate holder comprising a pedestal having a top surface configured to support a substrate, and at least one injection port configured to eject a high velocity liquid stream on the top surface of the pedestal, wherein the liquid stream in configured to secure the substrate on the pedestal without the substrate contacting the top surface of the pedestal.
摘要翻译：本发明涉及一种负载杯，其被配置为加速基板向载体头转移和从载体头转移并减少转印期间的腐蚀。本发明的一个实施例提供了一种非接触衬底保持器，其包括具有构造成支撑衬底的顶表面的基座和被配置为在基座的顶表面上喷射高速液体流的至少一个注入端口，其中，液体流被配置成将基板固定在基座上，而基板不接触基座的顶面。

3. 发明申请

US20110045170A1 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY THERMAL SPRAYING 有权
标题翻译：电喷活性锂离子电池原位沉积
公开(公告)号：US20110045170A1
公开(公告)日：2011-02-24
申请号：US12862265
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
IPC分类号： B05D5/12 , B05C11/06
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising electrochemically active precursor particles dispersed in a carrying medium is provided to a processing chamber and thermally treated using a combustible gas mixture also provided to the chamber. The precursor is converted to nanocrystals by the thermal energy, and the nanocrystals are deposited on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。将包含分散在载运介质中的电化学活性前体颗粒的前体混合物提供到处理室，并使用也提供给室的可燃气体混合物进行热处理。通过热能将前体转化成纳米晶体，并将纳米晶体沉积在基底上。当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。

4. 发明申请

US20110045206A1 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY PLASMA SPRAYING 有权
标题翻译：电池活性锂离子电池原位沉积
公开(公告)号：US20110045206A1
公开(公告)日：2011-02-24
申请号：US12862244
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
IPC分类号： C23C16/513 , H05H1/24 , C23C16/06
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising precursor particles dispersed in a carrying medium is activated in an activation chamber by application of an electric field to ionize at least a portion of the precursor mixture. The activated precursor mixture is then mixed with a combustible gas mixture to add thermal energy to the precursor particles, converting them to nanocrystals, which deposit on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。包含分散在携带介质中的前体颗粒的前体混合物通过施加电场在活化室中活化，以电离至少一部分前体混合物。然后将活化的前体混合物与可燃气体混合物混合，以向前体颗粒添加热能，将其转化成沉积在基材上的纳米晶体。当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。

5. 发明授权

US09272642B2 Vehicle seat 有权
标题翻译：车座
公开(公告)号：US09272642B2
公开(公告)日：2016-03-01
申请号：US14477272
申请日：2014-09-04
申请人： Hideki Kobayashi , Tetsuya Ishikawa , Kazuhisa Nishimura
发明人： Hideki Kobayashi , Tetsuya Ishikawa , Kazuhisa Nishimura
IPC分类号： B60N2/30 , B60N2/36 , B60N2/48
CPC分类号： B60N2/3065 , B60N2/3013 , B60N2/3088 , B60N2/36 , B60N2/859 , B60N2/874 , B60N2205/40
摘要： In a vehicle seat (car seat 1) including a first seat portion (seat cushion 10) movable between a use position and a retracted position, and a second seat portion (seat back 20) movable between a use position and a retracted position, an actuator mechanism is configured to cause the second seat portion to start moving toward its retracted position at a time when the first seat portion passes a predetermined intermediate position that is on a way from the use position toward the retracted position. In one embodiment, the actuator mechanism includes a biasing member (torsion spring 13, 23) configured to bias each of the seat cushion 10 and the seat back 20 from the use position toward the retracted position, a lock member (lock arm 42) configured to lock the seat back 20 in the use position, and an unlock device (cable 44, 42A) configured to release the lock member to cause the seat back 20 to start moving toward the retracted position, at a time when the seat cushion 10 passes the predetermined intermediate position that is on the way from a posture in which the seat cushion is ready for use toward a posture in which the seat cushion 10 is tipped up.
摘要翻译：在包括在使用位置和缩回位置之间可移动的第一座椅部分（座垫10）和可在使用位置和缩回位置之间移动的第二座椅部分（座椅靠背20）的车辆座椅（汽车座椅1）中，致动器机构构造成使得第二座椅部分在第一座椅部分经过从使用位置朝向缩回位置的途中经过的预定中间位置时开始向其缩回位置移动。在一个实施例中，致动器机构包括构造成将座垫10和座椅靠背20中的每一个从使用位置朝向缩回位置偏置的偏置构件（扭转弹簧13,23），配置在锁定构件将座椅靠背20锁定在使用位置，以及解锁装置（电缆44,42A），其构造成在座垫10通过时释放锁定构件以使座椅靠背20开始向缩回位置移动在从座垫准备好使用的姿势朝向座垫10倾斜的姿势的途中的预定中间位置。

6. 发明授权

US08651638B2 Inkjet printing apparatus 有权
标题翻译：喷墨打印设备
公开(公告)号：US08651638B2
公开(公告)日：2014-02-18
申请号：US13218626
申请日：2011-08-26
申请人： Tetsuya Ishikawa
发明人： Tetsuya Ishikawa
IPC分类号： B41J2/175
CPC分类号： B41J2/17509 , B41J2/175 , B41J2/17513 , B41J2/1752 , B41J2/17523 , B41J2/17553 , B41J2/17596
摘要： An inkjet printing apparatus comprises an ink tank including an ink accommodating unit, an ink leading-out mechanism for leading out the ink in the ink accommodating unit to an outside, and a housing, and an ink tank holder for removably retaining the ink tank, wherein a space is formed between the ink leading-out mechanism and the housing, and when the ink tank is mounted to the ink tank holder, an ink flow passage is formed by contact of an outer periphery of an ink leading-out needle in the ink tank holder with a sealing member in the ink leading-out mechanism, further comprising restriction means for restricting a position of the ink tank to the ink tank holder such that when removing the ink tank from the ink tank holder, the ink tank stops in a state where a tip end of the ink leading-out needle is in the space.
摘要翻译：一种喷墨打印设备包括一个墨盒，包括墨水容纳单元，用于将墨水容纳单元中的墨水引导到外部的墨水引出机构和外壳以及用于可拆卸地保持墨水盒的墨水盒保持器，其中在所述墨水引出机构和所述壳体之间形成空间，并且当所述墨水罐安装到所述墨水盒保持器时，墨水流动通道通过所述墨水引出针的外周部在墨水引出机构中具有密封构件的墨水盒保持器还包括限制装置，用于将墨水罐的位置限制到墨水盒保持器，使得当从墨水盒保持器移除墨水盒时，墨水罐停止墨水引出针的前端位于空间中的状态。

7. 发明申请

US20130320353A1 METHOD OF FORMING A GROUP III-NITRIDE CRYSTALLINE FILM ON A PATTERNED SUBSTRATE BY HYDRIDE VAPOR PHASE EPITAXY (HVPE) 审中-公开
标题翻译：通过氢化钙相层析（HVPE）在形成图案的基底上形成III族氮化物膜的方法
公开(公告)号：US20130320353A1
公开(公告)日：2013-12-05
申请号：US13959469
申请日：2013-08-05
申请人： Olga Kryiouk , Yuriy Mehnik , Hidehiro Kojiri , Tetsuya Ishikawa
发明人： Olga Kryiouk , Yuriy Mehnik , Hidehiro Kojiri , Tetsuya Ishikawa
IPC分类号： H01L29/04
CPC分类号： H01L29/045 , H01L21/0237 , H01L21/0242 , H01L21/0243 , H01L21/02433 , H01L21/02439 , H01L21/02458 , H01L21/02488 , H01L21/0254 , H01L21/0262 , H01L21/02639 , H01L21/02647 , H01L29/04 , H01L33/007 , H01L33/12 , H01L33/16 , H01L33/22
摘要： A method of depositing a high quality low defect single crystalline Group III-Nitride film. A patterned substrate having a plurality of features with inclined sidewalls separated by spaces is provided. A Group III-Nitride film is deposited by a hydride vapor phase epitaxy (HVPE) process over the patterned substrate. The HVPE deposition process forms a Group III-Nitride film having a first crystal orientation in the spaces between features and a second different crystal orientation on the inclined sidewalls. The first crystal orientation in the spaces subsequently overgrows the second crystal orientation on the sidewalls and in the process turns over and terminates treading dislocations formed in the first crystal orientation.
摘要翻译：沉积高品质低缺陷单晶III-III族氮化物膜的方法。提供具有多个特征的图案化衬底，其具有由空间分开的倾斜侧壁。通过在图案化衬底上的氢化物气相外延（HVPE）工艺沉积III-III族氮化物膜。 HVPE沉积工艺在特征之间的空间中形成具有第一晶体取向的III族氮化物膜，并且在倾斜侧壁上形成第二不同的晶体取向。空间中的第一晶体取向随后在侧壁上过度生长第二晶体取向，并且在该过程中翻转并终止在第一晶体取向中形成的重力位错。

8. 发明授权

US08568529B2 HVPE chamber hardware 有权
标题翻译： HVPE室硬件
公开(公告)号：US08568529B2
公开(公告)日：2013-10-29
申请号：US12637019
申请日：2009-12-14
申请人： Tetsuya Ishikawa , David H. Quach , Anzhong Chang , Olga Kryliouk , Yuriy Melnik , Harsukhdeep S. Ratia , Son T. Nguyen , Lily Pang
发明人： Tetsuya Ishikawa , David H. Quach , Anzhong Chang , Olga Kryliouk , Yuriy Melnik , Harsukhdeep S. Ratia , Son T. Nguyen , Lily Pang
IPC分类号： C30B21/02
CPC分类号： C30B29/403 , C23C16/34 , C23C16/4401 , C23C16/45565 , C23C16/46 , C30B25/02 , C30B29/406 , Y10T137/479 , Y10T137/4807 , Y10T137/4824 , Y10T137/7504 , Y10T137/8376
摘要： Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium nitride and aluminum nitride to be separately deposited onto a substrate in the same processing chamber. The nitrogen may be introduced to the processing chamber at a separate location from the gallium and the aluminum and at a lower temperature. The different temperatures causes the gases to mix together, react and deposit on the substrate with little or no deposition on the chamber walls.
摘要翻译：本文公开的实施例通常涉及HVPE室。腔室可以具有耦合到其上的两个分离的前体源，以允许沉积两个分开的层。例如，镓源和单独的铝源可以耦合到处理室以允许氮化镓和氮化铝分别沉积在相同处理室中的衬底上。氮可以在与镓和铝分开的位置和在较低温度下被引入处理室。不同的温度导致气体混合在一起，反应并沉积在基板上，而在室壁上很少或没有沉积。

9. 发明申请

US20130229678A1 OPERATION PANEL AND INFORMATION PROCESSING DEVICE 审中-公开
标题翻译：操作面板和信息处理设备
公开(公告)号：US20130229678A1
公开(公告)日：2013-09-05
申请号：US13781640
申请日：2013-02-28
申请人： Tetsuya Ishikawa , Masaki Kakutani
发明人： Tetsuya Ishikawa , Masaki Kakutani
IPC分类号： G06K15/00
CPC分类号： G06K15/002 , G06K15/4095
摘要： Disclosed is an operation panel including: an operating unit to receive an operation from a user; a detecting unit to detect whether the operation panel is attached to a predetermined device; a communication unit to be wirelessly communicable with the predetermined device; and a control unit to switch a function of the predetermined device, which can be operated from the operating unit, so that the operation relating to a first function of the predetermined device can be carried out from the operating unit and the operation relating to a second function of the predetermined device cannot be carried out from the operating unit when the operation panel is not attached to the predetermined device, and so that at least the operation relating to the second function can be carried out from the operating unit when the operation panel is attached to the predetermined device.
摘要翻译：公开了一种操作面板，包括：操作单元，用于从用户接收操作; 检测单元，用于检测操作面板是否附接到预定的设备; 通信单元，其与所述预定设备无线通信; 以及控制单元，用于切换可以从操作单元操作的预定设备的功能，使得可以从操作单元执行与预定设备的第一功能有关的操作，并且涉及第二当操作面板未安装到预定的装置时，不能从操作单元执行预定装置的功能，并且当操作面板为操作面板时，至少可以从操作单元执行与第二功能有关的操作连接到预定的装置。

10. 发明授权

US08491720B2 HVPE precursor source hardware 有权
标题翻译： HVPE前驱源硬件
公开(公告)号：US08491720B2
公开(公告)日：2013-07-23
申请号：US12637028
申请日：2009-12-14
申请人： Tetsuya Ishikawa , David H. Quach , Anzhong Chang , Olga Kryliouk , Yuriy Melnik , Harsukhdeep S. Ratia , Son T. Nguyen , Lily Pang
发明人： Tetsuya Ishikawa , David H. Quach , Anzhong Chang , Olga Kryliouk , Yuriy Melnik , Harsukhdeep S. Ratia , Son T. Nguyen , Lily Pang
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C22/02
CPC分类号： C30B29/403 , C23C16/34 , C23C16/4401 , C23C16/45565 , C23C16/46 , C30B25/02 , C30B29/406 , Y10T137/479 , Y10T137/4807 , Y10T137/4824 , Y10T137/7504 , Y10T137/8376
摘要： Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium nitride and aluminum nitride to be separately deposited onto a substrate in the same processing chamber. The nitrogen may be introduced to the processing chamber at a separate location from the gallium and the aluminum and at a lower temperature. The different temperatures causes the gases to mix together, react and deposit on the substrate with little or no deposition on the chamber walls.
摘要翻译：本文公开的实施例通常涉及HVPE室。腔室可以具有耦合到其上的两个分离的前体源，以允许沉积两个分开的层。例如，镓源和单独的铝源可以耦合到处理室以允许氮化镓和氮化铝分别沉积在相同处理室中的衬底上。氮可以在与镓和铝分开的位置和在较低温度下被引入处理室。不同的温度导致气体混合在一起，反应并沉积在基板上，在室壁上很少或没有沉积。

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