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1. 发明授权

US5128922A Optical disk with glass substrate and method of producing same 失效
标题翻译：具有玻璃基板的光盘及其制造方法
公开(公告)号：US5128922A
公开(公告)日：1992-07-07
申请号：US687769
申请日：1991-04-18
申请人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号： B24B9/08 , G11B7/24 , G11B7/26 , G11B11/10 , G11B11/105
CPC分类号： G11B7/24 , G11B7/26
摘要： An optical disk with a substrate made of glass at least partially has its inner and outer peripheral surfaces polished to surface roughness of 5 .mu.m or less so as to reduce the amount of glass powder generated from these surfaces and to thereby improve the yield.
摘要翻译：具有由玻璃制成的基板的光盘至少部分地具有抛光的表面粗糙度为5μm以下的内周面和外周面，以减少由这些表面产生的玻璃粉末的量，从而提高成品率。

2. 发明授权

US5403683A Photo-mask 失效
公开(公告)号：US5403683A
公开(公告)日：1995-04-04
申请号：US102229
申请日：1993-08-05
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.

3. 发明授权

US5260150A Photo-mask with light shielding film buried in substrate 失效
标题翻译：光掩模与遮光膜埋在基板上
公开(公告)号：US5260150A
公开(公告)日：1993-11-09
申请号：US631277
申请日：1990-12-20
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48 , G11B7/26 , G03F9/00
CPC分类号： G03F1/48 , G11B7/261 , Y10T428/24868 , Y10T428/24917
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

4. 发明授权

US5079113A Photo-mask 失效
标题翻译：照片面具
公开(公告)号：US5079113A
公开(公告)日：1992-01-07
申请号：US450438
申请日：1989-12-14
申请人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
发明人： Kenji Ohta , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kazuo Van , Michinobu Mieda , Tetsuya Inui
IPC分类号： G03F1/48
CPC分类号： G03F1/48
摘要： A photo-mask comprises a light-permeable substrate, a plurality of light-shielding films that are disposed on the substrate, the light-shielding films forming a mask pattern, and a light-permeable protective film that is disposed over the surface of the substrate including the light-shielding films so as to protect the light-shielding films.
摘要翻译：光掩模包括透光基板，设置在基板上的多个遮光膜，形成掩模图案的遮光膜，以及设置在该基板的表面上的透光保护膜包括遮光膜的基板，以保护遮光膜。

5. 发明授权

US5112727A Method of and photomask for manufacturing optical memory element 失效
标题翻译：用于制造光学记忆元件的光电子学方法
公开(公告)号：US5112727A
公开(公告)日：1992-05-12
申请号：US527265
申请日：1990-05-23
申请人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号： G11B7/26
CPC分类号： G11B7/261 , Y10S428/913
摘要： A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion for forming pits of the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

6. 发明授权

US4946730A Method of and photomask for manufacturing optical memory element 失效
标题翻译：用于制造光学存储元件的光掩模的方法和光掩模
公开(公告)号：US4946730A
公开(公告)日：1990-08-07
申请号：US278378
申请日：1988-12-01
申请人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
发明人： Tetsuya Inui , Junji Hirokane , Akira Shibata , Yoshiyuki Nagahara , Kenji Ohta
IPC分类号： G11B7/26
CPC分类号： G11B7/261 , Y10S428/913
摘要： A method of and a photomask for manufacturing an optical memory element. The manufacturing method includes the steps of: subjecting a positive type photoresist coated on a glass substrate to exposure, by using the photomask capable of irradiating light onto a portion of the photoresist other than the remaining portion, for forming pits on the glass substrate such that the portion of the photoresist is solubilized against developing solution; developing the photoresist by using the developing solution so as to remove the portion of the photoresist; and etching the glass substrate so as to directly form, as convex portions, the pits on a surface of the glass substrate.

7. 发明授权

US5459711A Optical recording element and driving system 失效
标题翻译：光学记录元件和驱动系统
公开(公告)号：US5459711A
公开(公告)日：1995-10-17
申请号：US219253
申请日：1994-03-29
申请人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
发明人： Kenji Ohta , Tetsuya Inui , Hiroyuki Katayama , Akira Takahashi , Junji Hirokane , Yukinori Nishitani , Michinobu Mieda , Kazuo Van
IPC分类号： G11B7/0045 , G11B7/013 , G11B7/09 , G11B7/125 , G11B7/24 , G11B7/24085 , G11B11/105 , G11B19/02 , G11B3/78
CPC分类号： G11B7/0045 , G11B11/10528 , G11B11/10578 , G11B11/10595 , G11B19/02 , G11B7/0938 , G11B7/126 , G11B7/24 , G11B7/24085
摘要： An optical recording element comprising a recording medium which includes an information recording area formed at every unit in a non-continuous condition, the recording medium further including sample pits disposed at intervals of a fixed distance for providing basic information about the locations of the recording units in same track. Each sample pit comprises a plurality of pits disposed next to the sequence of the recording units so that the spacing between the pits differs from the spacing between the recording units. At least one of the plurality of pits is a long-sized inclined pit which is inclined at an angle in the range of 6.degree. to 80.degree. to a recording track. A driving system for driving the optical recording element for recording information in the non-continuous recording area or erasing information stored therein with a light beam the output of which is varied as required and checking whether said recording or erasing has been correctly performed, within a very short time in which the light beam passes through the non-continuous recording area. By using the optical recording element in combination with its driving system, the processing speed for reducing, erasing and verifying these functions can be greatly improved and the irradiating position of the light beam at every recording unit can be correctly controlled.
摘要翻译：一种光记录元件，包括记录介质，该记录介质包括在非连续状态下在每个单元处形成的信息记录区域，所述记录介质还包括以固定距离间隔设置的样品坑，以提供关于记录单元的位置的基本信息在同一轨道。每个采样坑包括靠近记录单元序列设置的多个凹坑，使得凹坑之间的间隔与记录单元之间的间隔不同。多个凹坑中的至少一个是相对于记录轨道以6°至80°的角度倾斜的长尺寸倾斜凹坑。一种驱动系统，用于驱动用于在非连续记录区域中记录信息的光学记录元件，或者用存储在其中的光束擦除信息，该光束的输出根据需要变化，并且检查是否正确地执行了所述记录或擦除光束通过非连续记录区域的非常短的时间。通过与其驱动系统结合使用光学记录元件，可以大大提高用于减少，擦除和验证这些功能的处理速度，并且可以正确地控制每个记录单元处的光束的照射位置。

8. 发明授权

US4839251A Photo-mask for use in manufacturing an optical memory disc, a method for making the photo-mask and a method for manufacturing the optical memory disc 失效
标题翻译：用于制造光存储盘的照相掩模，用于制造光掩模的方法和用于制造光存储盘的方法
公开(公告)号：US4839251A
公开(公告)日：1989-06-13
申请号：US36426
申请日：1987-04-09
申请人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Junji Hirokane , Hiroyuki Katayama
发明人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Junji Hirokane , Hiroyuki Katayama
IPC分类号： G11B7/26
CPC分类号： G11B7/261
摘要： A photo-mask for use in manufacturing an optical memory disc has a substrate having a disc shape and made of a transparent material, and a film deposited on the substrate and formed with a predetermined pattern of grooves extending spirally or concentrically to the center of the disc shaped substrate such as to leave a thin film at the bottom of the grooves, and a number of microscopic pits in the form of minute indentations with a predetermined spacing aligned along the grooves so as to substantially leave no film at the bottom of the indentations. Thus, a light which has passed through the thin film at grooves is weakened and a light which has passed through the indentations loses substantially no power, and a light applied elsewhere on the film is cut off. The photo-mask is made through the steps of depositing an opaque film on a substrate having a disc shape and made of a transparent material, impinging a first laser at places where the grooves are to be formed, and impinging a second laser at places where the pits are to be formed. The first laser is weaker in power than the second laser.
摘要翻译：用于制造光学存储盘的光掩模具有盘形状并由透明材料制成的基板，以及沉积在基板上并形成有螺旋状或同心地延伸到其中心的预定图案的凹槽的薄膜盘形基板，例如在凹槽的底部留下薄膜，并且具有沿着凹槽对准的预定间隔的微小凹痕形式的多个微凹坑，以便在凹痕的底部基本上不留下薄膜。因此，通过凹槽处的薄膜的光被削弱，并且已经穿过凹痕的光基本上不会损失功率，并且切断在膜上其他地方施加的光。光掩模是通过以下步骤制成的：通过在具有圆盘形状并由透明材料制成的衬底上沉积不透明膜，将第一激光照射到要形成凹槽的位置，并将第二激光照射在坑将形成。第一个激光器的功率比第二个激光器弱。

9. 发明授权

US4818648A Optical memory element 失效
标题翻译：光学存储元件
公开(公告)号：US4818648A
公开(公告)日：1989-04-04
申请号：US934718
申请日：1986-11-25
申请人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Hiroyuki Katayama , Junji Hirokane , Yoshiteru Murakami
发明人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Hiroyuki Katayama , Junji Hirokane , Yoshiteru Murakami
IPC分类号： G11B11/10 , C03C3/076 , C03C3/083 , C03C3/091 , C03C4/00 , C03C15/00 , G11B7/24 , G11B7/253 , G11B7/26 , G11B11/105 , G03C5/16 , G01D9/00 , G11B3/70
CPC分类号： G11B7/24 , C03C3/076 , C03C3/083 , C03C3/091 , G11B7/2531 , G11B7/261 , G11B2007/24304 , G11B7/2533 , Y10T428/24479 , Y10T428/2457
摘要： An optical memory element comprising a substrate with grooves functioning as grooves for, for example, controlling the position of a laser beam, wherein said substrate is composed of a glass containing SiO.sub.2 in the range of 51 to 71% by weight, Na.sub.2 O in the range of 10 to 18% by weight, K.sub.2 O in the range of 0 to 8% by weight, Al.sub.2 O.sub.3 in the range of 12 to 22% by weight, and B.sub.2 O.sub.3 in the range of 0 to 9% by weight.
摘要翻译：一种光学存储元件，包括具有用作例如控制激光束位置的凹槽的衬底，其中所述衬底由含有51至71重量％的SiO 2的玻璃组成，在该范围内的Na 2 O在该范围内为10〜18重量％，K 2 O为0〜8重量％，Al 2 O 3为12〜22重量％，B 2 O 3为0〜9重量％。

10. 发明授权

US4778747A Method of manufacturing optical memory element 失效
标题翻译：光学存储元件的制造方法
公开(公告)号：US4778747A
公开(公告)日：1988-10-18
申请号：US17456
申请日：1987-02-24
申请人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Junji Hirokane , Toshihisa Deguchi
发明人： Kenji Ohta , Akira Takahashi , Tetsuya Inui , Junji Hirokane , Toshihisa Deguchi
IPC分类号： G03F7/00 , G11B7/24 , G11B7/26 , G11B11/105 , G03C5/00 , G11B3/72
CPC分类号： G03F7/0035 , G11B11/10582 , G11B7/24 , G11B7/261 , Y10S430/146
摘要： A method of manufacturing an optical memory element, which includes the steps of applying a first photo-resist layer onto a glass substrate for an optical memory element, laying a mask plate on the glass substrate applied with the first photo-resist layer, with the mask plate being prepared by covering a surface of a transparent substrate with metallic layers formed into a guide pattern configuration, irradiating ultraviolet rays onto the first photo-resist layer through the mask plate, transferring the guide patterns of the mask plate onto the first photo-resist layer, and engraving the guide patterns in the glass substrate by etching after developing the first photo-resist layer.
摘要翻译：一种制造光学存储元件的方法，包括以下步骤：将第一光致抗蚀剂层施加到用于光学存储元件的玻璃基板上，在施加有第一光致抗蚀剂层的玻璃基板上铺设掩模板，通过用形成为引导图案构造的金属层覆盖透明基板的表面来制备掩模板，通过掩模板将紫外线照射到第一光致抗蚀剂层上，将掩模板的引导图案转印到第一光致抗蚀剂层上，抗蚀剂层，并且在显影第一光致抗蚀剂层之后通过蚀刻在玻璃基板中雕刻引导图案。

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