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    • 2. 发明申请
    • Flexible Printed Wiring Board and Semiconductor Device
    • 柔性印刷线路板和半导体器件
    • US20080174016A1
    • 2008-07-24
    • US11965404
    • 2007-12-27
    • Tetsuro SatoMakoto YamagataNoriaki Iwata
    • Tetsuro SatoMakoto YamagataNoriaki Iwata
    • H01L23/48B32B3/00
    • H05K1/0346H01L2924/0002H05K2201/0154H05K2201/0355Y10T428/24917H01L2924/00
    • A flexible printed wiring board is characterized by a laminate formed by directly laminating an electrodeposited copper foil having S side and M side, each of S side and M side having a different surface roughness, the surface roughness (Rzjis) of the deposition plain side being 1.0 μm or less, and the glossiness of the M side [Gs(60°)] being 400 or more, on a surface of an insulating layer being a substrate layer made of a resin having both of an imide structure and an amide structure in the molecule; and forming a wiring pattern by etching the electrodeposited copper foil. By using a resin having both of an imide structure and an amide structure in the molecule as the insulating layer, a flexible printed wiring board having excellent properties such as mechanical properties, heat resistance, alkali resistance and the like, especially a COF substrate is provided.
    • 柔性印刷电路板的特征在于,通过直接层叠具有S侧和M侧的电解铜箔,S面和M侧的每一面具有不同的表面粗糙度,沉积平面的表面粗糙度(Rzjis)为 1.0μm或更小,并且在作为由具有酰亚胺结构和酰胺结构的树脂制成的基材层的绝缘层的表面上,M侧[Gs(60°)]的光泽度为400以上 分子; 以及通过蚀刻所述电沉积铜箔形成布线图案。 通过在分子中使用具有酰亚胺结构和酰胺结构的树脂作为绝缘层,提供了具有优异性能如机械性能,耐热性,耐碱性等的柔性印刷线路板,特别是COF基材 。
    • 4. 发明申请
    • Wiring board and semiconductor device excellent in folding endurance
    • 接线板和半导体器件耐折性优异
    • US20080006441A1
    • 2008-01-10
    • US11825039
    • 2007-07-03
    • Makoto YamagataHiroaki KuriharaNaoya YasuiNoriaki Iwata
    • Makoto YamagataHiroaki KuriharaNaoya YasuiNoriaki Iwata
    • H05K1/16
    • H05K3/28H01L2224/16H01L2924/00011H01L2924/00014H01L2924/01019H01L2924/01078H01L2924/09701H05K1/032H05K1/09H05K2201/0154H05K2201/0191H05K2201/0355H05K2201/10674H01L2224/0401
    • A wiring board with folding endurance includes an insulating film and a copper-containing wiring pattern on a surface of the insulating film, and includes an insulating resin coating layer formed on the wiring pattern such that terminals are exposed. The wiring board has any of the constitutions (A), (B), (C) and (D) below. (A) The wiring pattern includes copper particles having a mean crystal particle diameter in the range of from 0.65 to 0.85 μm as determined by EBSP; not more than 1% of the volume of the wiring pattern is accounted for by copper crystal particles having a particle diameter of less than 1.0 μm as determined by EBSP; and copper crystal particles that are [100] oriented in the longitudinal direction of a lead of the wiring pattern account for from 10 to 20% of the volume of the wiring pattern as determined by EBSP. (B) The insulating film is formed of a polyimide film having a tensile strength within the range of from 450 to 600 MPa and a Young's modulus within the range of from 8500 to 9500 MPa. (C) The insulating film is formed of a polyimide film having a thickness of from 10 to 30 μm. (D) The insulating resin coating layer has a thickness of from 50 to 150% relative to the thickness of the insulating film.
    • 具有耐折性的布线板在绝缘膜的表面上包括绝缘膜和含铜布线图案,并且包括形成在布线图案上以使端子露出的绝缘树脂涂层。 布线板具有下述(A),(B),(C)和(D)中的任何一个。 (A)布线图案包括通过EBSP测定的平均结晶粒径在0.65至0.85μm范围内的铜颗粒; 通过EBSP测定,不超过1%的布线图案的体积由具有小于1.0μm的粒径的铜结晶粒子占据; 并且沿着布线图案的引线的纵向取向的铜结晶粒子占由EBSP确定的布线图案的体积的10至20%。 (B)绝缘膜由拉伸强度为450〜600MPa,杨氏模量为8500〜9500MPa的聚酰亚胺膜形成。 (C)绝缘膜由厚度为10〜30μm的聚酰亚胺膜形成。 (D)绝缘树脂被覆层的厚度相对于绝缘膜的厚度为50〜150%。