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    • 3. 发明授权
    • Magnetic ferrite film for magnetic devices
    • 用于磁性器件的磁性铁氧体膜
    • US06383626B1
    • 2002-05-07
    • US09548344
    • 2000-04-12
    • Yasutaka FukudaYoshihito Tachi
    • Yasutaka FukudaYoshihito Tachi
    • G11B566
    • H01F1/0027H01F41/16Y10S428/90Y10T428/26Y10T428/265
    • A magnetic ferrite paste is applied onto an Si substrate, and then sintered to form thereon a magnetic ferrite film having a mean composition that comprises from 40 to 50 mol % of Fe2O3, from 15 to 35 mol % of ZnO, from 0 to 20 mol % of CuO, and from 0 to 10 mol % of Bi2O3 with NiO and inevitable impurities as the balance. The magnetic ferrite film thus formed on an Si substrate is for magnetic devices, and it forms a region not containing CuO or having a CuO content of at most 5 mol % around its interface directly adjacent to the surface of the Si substrate. The adhesiveness of the magnetic ferrite film to the underlying Si substrate is high, and the reliability of the magnetic device having the magnetic film is therefore high.
    • 将磁性铁氧体浆料施加到Si基板上,然后烧结形成平均组成为Fe 2 O 3 40〜50摩尔%,ZnO为15〜35摩尔%,0〜20摩尔的磁性铁氧体膜 %的CuO和0〜10mol%的Bi2O3与NiO和不可避免的杂质作为平衡。 由此形成在Si基板上的磁性铁氧体膜用于磁性器件,并且在与Si衬底的表面直接相邻的界面周围形成不含有CuO或具有至多5mol%的CuO含量的区域。 磁性铁氧体膜与下面的Si衬底的粘合性高,因此具有磁性膜的磁性器件的可靠性高。
    • 4. 发明授权
    • Domain controlled piezoelectric single crystal and fabrication method therefor
    • 域控压电单晶及其制造方法
    • US06756238B2
    • 2004-06-29
    • US10246400
    • 2002-09-19
    • Toshio OgawaMitsuyoshi MatsushitaYoshihito Tachi
    • Toshio OgawaMitsuyoshi MatsushitaYoshihito Tachi
    • H01L2100
    • H01L41/257H01L41/1875
    • A domain controlled piezoelectnc single crystal is disclosed which uses a lateral vibration mode for an electromechanical coupling factor k31 not less than 70% and a piezoelectric constant −d31 not less than 1200 pC/N, with an electromechanical coupling factor k33 in the longitudinal vibration mode not less than 80% and a piezoelectric constant d33 not less than 800 pC/N. Also, a piezoelectric single crystal is disclosed which uses a high-performance longitudinal vibration mode with k31 not more than 30%. A fabrication method applies a DC electric field of 400 V/mm to 1500 V/mm for a maximum of two hours in a temperature range of 20° C. to 200° C. as polarization conditions in the thickness direction of the piezoelectric single crystal. The method can include cooling, or heating and cooling between temperature boundaries of rhombohedral and tetragonal crystals or between tetragonal and cubic crystals or within a cubic crystal temperature range.
    • 公开了一种领域控制的压电单体,其使用侧向振动模式用于不小于70%的机电耦合系数k31和不小于1200pC / N的压电常数-d31,纵向振动模式中的机电耦合系数k33 不小于80%,压电常数d33不低于800pC / N。 此外,公开了使用k31不高于30%的高性能纵向振动模式的压电单晶。 制造方法在20℃至200℃的温度范围内将400V / mm至1500V / mm的DC电场最大化为2小时,作为压电单晶的厚度方向的极化条件 。 该方法可以包括在菱方体晶体和四方晶体的温度边界之间或四方晶体和立方晶体之间或在立方晶体温度范围内的冷却或加热和冷却。