专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20130017001A1 TONER REPLENISHING DEVICE AND IMAGE FORMING APPARATUS 有权
标题翻译：调色剂再现装置和图像形成装置
公开(公告)号：US20130017001A1
公开(公告)日：2013-01-17
申请号：US13545434
申请日：2012-07-10
申请人： Tatsuya Yamanaka
发明人： Tatsuya Yamanaka
IPC分类号： G03G15/08
CPC分类号： G03G15/0879
摘要： A toner replenishing device includes a toner conveying portion, a conveying member, a toner loosening member and a swinging member. The toner conveying portion has a vertical conveying portion for vertically conveying toner, and a horizontal conveying portion for horizontally conveying the toner. The conveying member is disposed in the horizontal conveying portion, and has a shaft member and a projecting portion formed around the shaft member. The toner loosening member is disposed in the vertical conveying portion to be swingable up and down. The swinging member is contactable with the conveying member and the toner loosening member. The swinging member swings up and down by a change in a contact portion with respect to the conveying member between the shaft member and the projecting portion, as the conveying member rotates. The toner loosening member swings up and down as the swinging member swings.
摘要翻译：调色剂补充装置包括调色剂传送部分，传送部件，调色剂松开部件和摆动部件。调色剂传送部分具有用于垂直传送调色剂的垂直传送部分和用于水平传送调色剂的水平传送部分。输送构件设置在水平输送部中，并且具有轴构件和形成在轴构件周围的突出部。调色剂松动构件设置在垂直传送部分中以便可上下摆动。摆动构件可与输送构件和调色剂松开构件接触。随着输送构件转动，摆动构件通过相对于轴构件和突出部分之间的输送构件的接触部分的变化而上下摆动。当摆动构件摆动时，调色剂松开构件上下摆动。

2. 发明授权

US08268403B2 Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation 有权
标题翻译：形成有机二氧化硅膜，有机二氧化硅膜，布线结构，半导体器件和成膜用组合物的方法
公开(公告)号：US08268403B2
公开(公告)日：2012-09-18
申请号：US11596295
申请日：2005-04-28
申请人： Masahiro Akiyama , Hisashi Nakagawa , Tatsuya Yamanaka , Atsushi Shiota , Takahiko Kurosawa
发明人： Masahiro Akiyama , Hisashi Nakagawa , Tatsuya Yamanaka , Atsushi Shiota , Takahiko Kurosawa
IPC分类号： B05D3/02
CPC分类号： H01L21/31058 , C08G77/60 , C08J3/28 , C08J2383/04 , C08J2383/16 , C08L83/04 , C08L83/14 , C09D183/14 , H01B3/46 , H01L21/02126 , H01L21/02211 , H01L21/02282 , H01L21/02348 , H01L21/31633 , Y10T428/265 , Y10T428/31663 , C08L83/00
摘要： A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH2—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.
摘要翻译：形成有机二氧化硅膜的方法包括在基材上形成包含具有-Si-O-Si-结构和-Si-CH2-Si-结构的硅化合物的涂层，加热涂层，并通过涂覆固化涂层紫外线辐射。

3. 发明授权

US08787795B2 Image reproduction apparatus including a waste toner assembly 有权
标题翻译：包括废调色剂组件的图像再现装置
公开(公告)号：US08787795B2
公开(公告)日：2014-07-22
申请号：US13337586
申请日：2011-12-27
申请人： Hirokazu Fujii , Daijiro Ueno , Hiroki Takahashi , Tatsuya Yamanaka
发明人： Hirokazu Fujii , Daijiro Ueno , Hiroki Takahashi , Tatsuya Yamanaka
IPC分类号： G03G15/00
CPC分类号： G03G21/1633 , G03G21/105 , G03G21/12 , G03G21/1647 , G03G21/1671 , G03G21/1842 , G03G2221/1654
摘要： What is provided is an image formation apparatus including: an image formation part provided inside a main body so that the image formation part may be attached to the main body and detached from the main body; a plurality of opening-closing parts which may be opened and closed to attach the image formation part to the main body or detach the image formation part from the main body; and a plurality of locking parts latching each of the plurality of opening-closing parts to the main body, wherein when one of the plurality of locking parts undergoes a releasing operation, an other one of the plurality of locking parts also undergoes a releasing operation.
摘要翻译：提供的图像形成装置包括：图像形成部，其设置在主体内部，使得图像形成部可以附接到主体并从主体分离; 可以打开和关闭多个打开 - 关闭部分，以将图像形成部分附接到主体或将图像形成部分从主体拆下; 以及多个锁定部件，其将所述多个打开 - 关闭部件中的每一个锁定到所述主体，其中当所述多个锁定部件中的一个处于释放操作时，所述多个锁定部件中的另一个也经历释放操作。

4. 发明申请

US20100007025A1 ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE 有权
标题翻译：有机硅膜及其形成方法，用于形成半导体器件绝缘膜的组合物及其制造方法，接线结构和半导体器件
公开(公告)号：US20100007025A1
公开(公告)日：2010-01-14
申请号：US12278224
申请日：2007-01-31
申请人： Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
发明人： Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
IPC分类号： H01L21/31 , H01L23/48 , C08G77/04
CPC分类号： C09D183/04 , C08G77/60 , C09D183/14 , H01B3/46 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3122 , H01L21/316 , C08L83/00
摘要： An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group.
摘要翻译：公开了一种用于半导体器件的绝缘膜形成组合物，其包含碳原子数为11至17原子％的有机硅溶胶和有机溶剂。有机硅溶胶包括水解缩合产物P1和水解缩合产物P2。水解缩合产物P1是通过在（C）碱性催化剂存在下（A）包含可水解基团的硅烷单体和（B）包含可水解基团的聚碳硅烷（A）和水解缩合产物P2 是通过水解和冷凝（D）包含可水解基团的硅烷单体获得的。

5. 发明申请

US20060216531A1 Laminate and method of forming the same, insulating film, and semiconductor device 有权
公开(公告)号：US20060216531A1
公开(公告)日：2006-09-28
申请号：US11410895
申请日：2006-04-26
申请人： Masahiro Akiyama , Seitaro Hattori , Takahiko Kurosawa , Manabu Sekiguchi , Terukazu Kokubo , Michihiro Mita , Tatsuya Yamanaka , Masaki Obi
发明人： Masahiro Akiyama , Seitaro Hattori , Takahiko Kurosawa , Manabu Sekiguchi , Terukazu Kokubo , Michihiro Mita , Tatsuya Yamanaka , Masaki Obi
IPC分类号： B32B27/00 , B32B9/04 , C08L83/04
CPC分类号： H01L21/02118 , C09D183/14 , H01L21/02126 , H01L21/022 , H01L21/02216 , H01L21/02282 , H01L21/3122 , H01L21/76801 , H01L21/76825 , H01L21/76828 , H01L21/76829 , H01L21/76832 , Y10T428/1014 , Y10T428/31663
摘要： A laminate including: a first silica-based film; a second silica-based film; and an organic film, wherein the second silica-based film includes an organic group containing a carbon-carbon double bond or a carbon-carbon triple bond. A method of forming the laminate includes: forming a first coating for a first silica-based film on a substrate; forming a second coating for a second silica-based film on the first coating, the second coating including an organic group containing a carbon-carbon double bond or a carbon-carbon triple bond; forming a third coating for an organic film on the second coating; and curing a multilayer film including the first to third coatings.

6. 发明授权

US08897678B2 Toner replenishing device having a coil spring and spherical member at end of coil spring for loosening toner and image forming apparatus provided therewith 有权
标题翻译：具有螺旋弹簧的调色剂补充装置和用于松开调色剂的螺旋弹簧的端部处的球形构件和具有该调色剂的图像形成装置
公开(公告)号：US08897678B2
公开(公告)日：2014-11-25
申请号：US13545434
申请日：2012-07-10
申请人： Tatsuya Yamanaka
发明人： Tatsuya Yamanaka
IPC分类号： G03G15/08
CPC分类号： G03G15/0879
摘要： A toner replenishing device includes a toner conveying portion, a conveying member, a toner loosening member and a swinging member. The toner conveying portion has a vertical conveying portion for vertically conveying toner, and a horizontal conveying portion for horizontally conveying the toner. The conveying member is disposed in the horizontal conveying portion, and has a shaft member and a projecting portion formed around the shaft member. The toner loosening member is disposed in the vertical conveying portion to be swingable up and down. The swinging member is contactable with the conveying member and the toner loosening member. The swinging member swings up and down by a change in a contact portion with respect to the conveying member between the shaft member and the projecting portion, as the conveying member rotates. The toner loosening member swings up and down as the swinging member swings.
摘要翻译：调色剂补充装置包括调色剂传送部分，传送部件，调色剂松开部件和摆动部件。调色剂传送部分具有用于垂直传送调色剂的垂直传送部分和用于水平传送调色剂的水平传送部分。输送构件设置在水平输送部中，并且具有轴构件和形成在轴构件周围的突出部。调色剂松动构件设置在垂直传送部分中以便可上下摆动。摆动构件可与输送构件和调色剂松开构件接触。随着输送构件转动，摆动构件通过相对于轴构件和突出部分之间的输送构件的接触部分的变化而上下摆动。当摆动构件摆动时，调色剂松开构件上下摆动。

7. 发明授权

US08513127B2 Chemical mechanical planarization processes for fabrication of FinFET devices 有权
标题翻译：用于制造FinFET器件的化学机械平面化工艺
公开(公告)号：US08513127B2
公开(公告)日：2013-08-20
申请号：US13012836
申请日：2011-01-25
申请人： Josephine B. Chang , Leslie Charns , Jason E. Cummings , Michael A. Guillorn , Lukasz J. Hupka , Dinesh R. Koli , Tomohisa Konno , Mahadevaiyer Krishnan , Michael F. Lofaro , Jakub W. Nalaskowski , Masahiro Noda , Dinesh K. Penigalapati , Tatsuya Yamanaka
发明人： Josephine B. Chang , Leslie Charns , Jason E. Cummings , Michael A. Guillorn , Lukasz J. Hupka , Dinesh R. Koli , Tomohisa Konno , Mahadevaiyer Krishnan , Michael F. Lofaro , Jakub W. Nalaskowski , Masahiro Noda , Dinesh K. Penigalapati , Tatsuya Yamanaka
IPC分类号： H01L21/302
CPC分类号： H01L21/31053 , H01L29/517 , H01L29/6653 , H01L29/66545
摘要： A planarization method includes planarizing a semiconductor wafer in a first chemical mechanical polish step to remove overburden and planarize a top layer leaving a thickness of top layer material over underlying layers. The top layer material is planarized in a second chemical mechanical polish step to further remove the top layer and expose underlying layers of a second material and a third material such that a selectivity of the top layer material to the second material to the third material is between about 1:1:1 to about 2:1:1 to provide a planar topography.
摘要翻译：平面化方法包括在第一化学机械抛光步骤中平坦化半导体晶片以去除覆盖层并平坦化顶层，从而在顶层之上留下厚度的顶层材料。顶层材料在第二化学机械抛光步骤中被平坦化，以进一步去除顶层并暴露第二材料和第三材料的下层，使得顶层材料对第二材料对第三材料的选择性在约1：1至约2：1：1，以提供平面形貌。

8. 发明申请

US20130005219A1 CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME 审中-公开
标题翻译：化学机械抛光水性分散体及化学机械抛光方法
公开(公告)号：US20130005219A1
公开(公告)日：2013-01-03
申请号：US13576418
申请日：2011-01-17
申请人： Akihiro Takemura , Kohei Yoshio , Tatsuya Yamanaka , Tomohisa Konno
发明人： Akihiro Takemura , Kohei Yoshio , Tatsuya Yamanaka , Tomohisa Konno
IPC分类号： C09K13/00 , B24B1/00
CPC分类号： B24B13/015 , B24B29/02 , B24B37/044 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A chemical mechanical polishing aqueous dispersion includes (A) silica particles that include at least one functional group selected from the group consisting of a sulfo group or salts thereof, and (B) an acidic compound.
摘要翻译：化学机械研磨水分散体包括（A）二氧化硅颗粒，其包含至少一种选自磺基或其盐的官能团，和（B）酸性化合物。

9. 发明申请

US20120083121A1 Fabrication of Replacement Metal Gate Devices 有权
标题翻译：替代金属门装置的制造
公开(公告)号：US20120083121A1
公开(公告)日：2012-04-05
申请号：US13012879
申请日：2011-01-25
申请人： Takashi Ando , Leslie Charns , Jason E. Cummings , Lukasz J. Hupka , Dinesh R. Koli , Tomohisa Konno , Mahadevaiyer Krishnan , Michael F. Lofaro , Jakub W. Nalaskowski , Masahiro Noda , Dinesh K. Penigalapati , Tatsuya Yamanaka
发明人： Takashi Ando , Leslie Charns , Jason E. Cummings , Lukasz J. Hupka , Dinesh R. Koli , Tomohisa Konno , Mahadevaiyer Krishnan , Michael F. Lofaro , Jakub W. Nalaskowski , Masahiro Noda , Dinesh K. Penigalapati , Tatsuya Yamanaka
IPC分类号： H01L21/463
CPC分类号： H01L21/31053 , H01L29/517 , H01L29/6653 , H01L29/66545
摘要： Methods for polishing multiple dielectric layers to form replacement metal gate structures include a first chemical mechanical polish step to remove overburden and planarize a top layer to leave a planarized thickness over a gate structure. A second chemical mechanical polish step includes removal of the thickness to expose an underlying covered surface of a dielectric of the gate structure with a slurry configured to polish the top layer and the underlying covered surface substantially equally to accomplish a planar topography. A third chemical mechanical polish step is employed to remove the dielectric of the gate structure and expose a gate conductor.
摘要翻译：用于抛光多个电介质层以形成替换金属栅极结构的方法包括第一化学机械抛光步骤，以去除覆盖层并平坦化顶层以在栅极结构上留下平坦化的厚度。第二化学机械抛光步骤包括去除厚度以暴露栅极结构的电介质的下面覆盖的表面，其中浆料被配置成基本上等同地抛光顶层和下面的被覆表面以实现平面形貌。采用第三种化学机械抛光步骤来去除栅极结构的电介质并露出栅极导体。

10. 发明授权

US07893538B2 Organic silica film and method for forming same, composition for forming insulating film of semiconductor device and method for producing same, wiring structure and semiconductor device 有权
标题翻译：有机二氧化硅膜及其形成方法，半导体装置用绝缘膜的成膜用组合物及其制造方法，配线结构及半导体装置
公开(公告)号：US07893538B2
公开(公告)日：2011-02-22
申请号：US12278224
申请日：2007-01-31
申请人： Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
发明人： Hisashi Nakagawa , Tatsuya Yamanaka , Masahiro Akiyama , Terukazu Kokubo , Youhei Nobe
IPC分类号： H01L23/48
CPC分类号： C09D183/04 , C08G77/60 , C09D183/14 , H01B3/46 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/02348 , H01L21/3122 , H01L21/316 , C08L83/00
摘要： An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group.
摘要翻译：公开了一种用于半导体器件的绝缘膜形成组合物，其包含碳原子数为11至17原子％的有机硅溶胶和有机溶剂。有机硅溶胶包括水解缩合产物P1和水解缩合产物P2。水解缩合产物P1是通过在（C）碱性催化剂存在下（A）包含可水解基团的硅烷单体和（B）包含可水解基团的聚碳硅烷（A）和水解缩合产物P2 是通过水解和冷凝（D）包含可水解基团的硅烷单体获得的。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式