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    • 1. 发明授权
    • Two-photon absorption material and application thereof
    • 双光子吸收材料及其应用
    • US08207330B2
    • 2012-06-26
    • US12423475
    • 2009-04-14
    • Tatsuya TomuraTsutomu SatoTakeshi MikiMikiko TakadaHisamitsu Kamezaki
    • Tatsuya TomuraTsutomu SatoTakeshi MikiMikiko TakadaHisamitsu Kamezaki
    • C07B47/00C07D487/22
    • C07D487/22A61K41/008B82Y10/00C07D519/00G11B7/00455G11B7/248G11B7/2492G11B2007/0009G11B2007/24624
    • A two-photon absorption material represented by the following General Formula (I): where R1 to R8 each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkyl group; one to three of X1 to X4 each represent a substituted or unsubstituted amino group, a substituted or unsubstituted aminophenyl group, a substituted or unsubstituted dialkylaminophenyl group, a substituted or unsubstituted N,N-diphenyl-aminophenyl group, a substituted or unsubstituted indolyl group, or a substituted or unsubstituted azulenyl group, and the other represents or the others each represent hydrogen, halogen, a carboxyl group, a carboxylic acid ester group, a substituted or unsubstituted aryl group, a substituted or unsubstituted pyridinyl group, a substituted or unsubstituted alkyl group or a perhalogenoalkyl group; and M represents two hydrogen atoms or a divalent, trivalent or tetravalent metal atom which may have oxygen or halogen.
    • 由以下通式(I)表示的双光子吸收材料:其中R 1至R 8各自表示氢,卤素,羧基,羧酸酯基,取代或未取代的芳基或取代或未取代的烷基 ; 取代或未取代的氨基苯基,取代或未取代的二烷基氨基苯基,取代或未取代的N,N-二苯基 - 氨基苯基,取代或未取代的吲哚基, 或取代或未取代的薁基,另一个表示或者各自表示氢,卤素,羧基,羧酸酯基,取代或未取代的芳基,取代或未取代的吡啶基,取代或未取代的烷基 基团或全卤代烷基; M表示2个氢原子或可具有氧或卤素的二价,三价或四价金属原子。
    • 3. 发明授权
    • Material for multiphoton fluorescence microscope and multiphoton fluorescence microscope
    • 光敏复合材料,三维记忆材料和记录介质,光学功率限制材料和元素,光固化材料和立体光刻系统,以及用于多光子荧光显微镜和多光子荧光显微镜的荧光材料
    • US08192917B2
    • 2012-06-05
    • US12441490
    • 2008-06-12
    • Tatsuya TomuraTsutomu SatoTakeshi MikiMikiko TakadaMasaomi Sasaki
    • Tatsuya TomuraTsutomu SatoTakeshi MikiMikiko TakadaMasaomi Sasaki
    • G11B7/24G09B67/44B22F9/24C09B23/00
    • G11B7/251B33Y70/00B82Y10/00G11B7/2531G11B2007/24624
    • A photosensitized composite material and a material, an element, a device, and the like, which employ the photosensitized composite material, are provided. In the photosensitized composite material, multiphoton absorption compounds are highly sensitized for practical use by utilizing an enhanced plasmon field. The photosensitized composite material has a structure where the multiphoton absorption compounds are linked to the surface of a fine metal particle through linking groups. The fine metal particle generates an enhanced surface plasmon field in resonance with a multiphoton excitation wavelength. The multiphoton absorption compounds have a molecular structure enabling multiphoton absorption. The photosensitized composite material is contained in or used for, for example, a three-dimensional memory material and a three-dimensional recording medium, an optical power limiting material and an optical power limiting element, a photocuring material and a stereolithography system, and a fluorescent material for a multiphoton fluorescence microscope and a multiphoton fluorescence microscope.
    • 提供使用光敏复合材料的光敏复合材料和材料,元件,器件等。 在光敏复合材料中,通过利用增强的等离子体场,多光子吸收化合物对于实际应用高度致敏。 光敏复合材料具有其中多光子吸收化合物通过连接基团连接到细金属颗粒的表面的结构。 细金属颗粒在多光子激发波长共振时产生增强的表面等离子体场。 多光子吸收化合物具有能够进行多光子吸收的分子结构。 光敏复合材料被包含在或用于例如三维记忆材料和三维记录介质,光学功率限制材料和光学功率限制元件,光固化材料和立体光刻系统,以及 荧光材料用于多光子荧光显微镜和多光子荧光显微镜。