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    • 1. 发明授权
    • Control system for vehicle and method for controlling in-vehicle apparatus
    • 车辆控制系统及车载装置控制方法
    • US08560166B2
    • 2013-10-15
    • US12762802
    • 2010-04-19
    • Takuya MoriTetsuya HaraNorio YamamotoKousuke HaraHirotoshi Iwasaki
    • Takuya MoriTetsuya HaraNorio YamamotoKousuke HaraHirotoshi Iwasaki
    • G01M17/00
    • B60W30/18054B60W10/30B60W2560/02
    • An obtaining unit obtains information about a condition where a vehicle is placed. A detection unit detects at least one of a voice and an action of an occupant of the vehicle. An estimation unit estimates an in-vehicle apparatus to be a controlled target according to the condition where the vehicle is placed. A determination unit determines an in-vehicle apparatus to be a controlled in-vehicle apparatus and determines a control content thereof in consideration of the at least one of a voice and an action. A notification unit notifies the occupant of the in-vehicle apparatus to be controlled and the control content thereof determined by the determination unit. A control unit controls the in-vehicle apparatus according to the determination of the determination unit when receiving a response to the notification of the notification unit from the occupant to permit the control of the in-vehicle apparatus.
    • 获取单元获取关于车辆被放置的状况的信息。 检测单元检测车辆的乘客的语音和动作中的至少一个。 估计单元根据放置车辆的状况将车载设备估计为受控对象。 确定单元将车载设备确定为受控车载设备,并且考虑到语音和动作中的至少一个来确定其控制内容。 通知单元向乘员通知要被控制的车载设备及其由确定单元确定的控制内容。 控制单元,当接收到来自乘员的通知单元的通知的响应,根据确定单元的确定来控制车载设备以允许对车载设备的控制。
    • 2. 发明申请
    • CONTROL SYSTEM FOR VEHICLE AND METHOD FOR CONTROLLING IN-VEHICLE APPARATUS
    • 车载控制系统及控制车载装置的方法
    • US20100268412A1
    • 2010-10-21
    • US12762802
    • 2010-04-19
    • Takuya MoriTetsuya HaraNorio YamamotoKousuke HaraHirotoshi Iwasaki
    • Takuya MoriTetsuya HaraNorio YamamotoKousuke HaraHirotoshi Iwasaki
    • G06F7/00
    • B60W30/18054B60W10/30B60W2560/02
    • An obtaining unit obtains information about a condition where a vehicle is placed. A detection unit detects at least one of a voice and an action of an occupant of the vehicle. An estimation unit estimates an in-vehicle apparatus to be a controlled target according to the condition where the vehicle is placed. A determination unit determines an in-vehicle apparatus to be a controlled in-vehicle apparatus and determines a control content thereof in consideration of the at least one of a voice and an action. A notification unit notifies the occupant of the in-vehicle apparatus to be controlled and the control content thereof determined by the determination unit. A control unit controls the in-vehicle apparatus according to the determination of the determination unit when receiving a response to the notification of the notification unit from the occupant to permit the control of the in-vehicle apparatus.
    • 获取单元获取关于车辆被放置的状况的信息。 检测单元检测车辆的乘员的声音和动作中的至少一个。 估计单元根据放置车辆的状况将车载设备估计为受控对象。 确定单元将车载设备确定为受控车载设备,并且考虑到语音和动作中的至少一个来确定其控制内容。 通知单元向乘员通知要被控制的车载设备及其由确定单元确定的控制内容。 控制单元,当接收到来自乘员的通知单元的通知的响应,根据确定单元的确定来控制车载设备以允许对车载设备的控制。
    • 5. 发明授权
    • Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method
    • 基板清洁装置,基板清洗方法和用于该方法的记录程序的介质
    • US07803230B2
    • 2010-09-28
    • US10593560
    • 2005-04-05
    • Masaru AmaiKenji SekiguchiTakehiko OriiHiroki OhnoSatoru TanakaTakuya Mori
    • Masaru AmaiKenji SekiguchiTakehiko OriiHiroki OhnoSatoru TanakaTakuya Mori
    • B08B7/00
    • H01L21/67051B08B1/04H01L21/67046
    • In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. A process fluid formed of liquid droplets and a gas is sprayed by a two-fluid nozzle 5 onto the substrate W, and a cleaning position Sn of the two-fluid nozzle 5 is moved relative to the substrate W from a center part of the substrate W toward a peripheral part thereof. During the movement of the cleaning position Sb of the brush 3 from the center part of the substrate W toward the peripheral part thereof, the cleaning position Sb of the two-fluid nozzle is positioned nearer to a center P0 than the cleaning position Sb of the brush 3. Since contaminations of the brush are prevented from adhering again to the wafer, it can be avoided that the wafer W is contaminated.
    • 在根据本发明的基板清洗方法和基板清洗方法中,刷子3在旋转基板W的同时与基板W接触,并且刷子3的清洁位置Sb相对于基板W从 衬底W的中心部分朝向其周边部分。 由液滴和气体形成的工艺流体由双流体喷嘴5喷射到基板W上,并且双流体喷嘴5的清洁位置Sn相对于基板W从基板的中心部分移动 W朝向其周边部分。 在将刷子3的清扫位置Sb从基板W的中央部朝向其周边部移动的过程中,双流体喷嘴的清洗位置Sb位于比清洗位置Sb更靠近中心P0的位置 由于刷子的污染被防止再次粘附到晶片,因此可以避免晶片W被污染。
    • 7. 发明申请
    • ETCHING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
    • 半导体器件的蚀刻方法和制造方法
    • US20090246965A1
    • 2009-10-01
    • US12410504
    • 2009-03-25
    • Takuya MoriMasahiko Takahashi
    • Takuya MoriMasahiko Takahashi
    • H01L21/3065
    • H01L21/32137H01J37/3222H01J37/32238
    • Provided is an etching method capable of increasing a selectivity of a polysilicon film with respect to a silicon oxide film and suppressing the formation of recesses in a silicon base material. A wafer includes a gate oxide film, a polysilicon film and a hard mask film having an opening sequentially formed on a silicon base material, and has a native oxide film in a trench of the polysilicon film corresponding to the opening formed thereon. The native oxide film is etched, so that the polysilicon film is exposed at a bottom portion of the trench. An ambient pressure is set to be 13.3 Pa, and O2 gas, HBr gas and Ar gas are supplied to a processing space, and a frequency of bias voltage is set to be 13.56 MHz, so that the polysilicon film is etched by the plasma generated from the HBr gas to be completely removed.
    • 提供了能够提高多晶硅膜相对于氧化硅膜的选择性并抑制硅基材料中的凹部的形成的蚀刻方法。 晶片包括栅极氧化膜,多晶硅膜和具有依次形成在硅基材料上的开口的硬掩模膜,并且在与其上形成的开口对应的多晶硅膜的沟槽中具有自然氧化膜。 蚀刻自然氧化膜,使得多晶硅膜暴露在沟槽的底部。 将环境压力设定为13.3Pa,向加工空间供给O 2气体,HBr气体和Ar气体,将偏置电压的频率设定为13.56MHz,由此产生多晶硅膜 从HBr气体中完全去除。
    • 8. 发明申请
    • MAINTENANCE SYSTEM, SUBSTRATE PROCESSING APPARATUS, REMOTE OPERATION UNIT AND COMMUNICATION METHOD
    • 维护系统,基板处理设备,远程操作单元和通信方法
    • US20090157214A1
    • 2009-06-18
    • US12372347
    • 2009-02-17
    • Takuya Mori
    • Takuya Mori
    • G06F19/00B05C11/00C23F1/08
    • H01L21/67276G03F7/70525G03F7/708G03F7/70975
    • An object of the present invention is to maintain a coating and developing system by remotely operating it more safely.The present invention is a maintenance system of a substrate processing apparatus, including a remote operation unit for operating the substrate processing apparatus from a remote place by transmitting a remote operation information to a side of the substrate processing apparatus through a communication network and providing the remote operation information to the substrate processing apparatus, and a communication control unit for receiving the remote operation information transmitted to the side of the substrate processing apparatus and providing the remote operation information to the substrate processing apparatus. The communication control unit provides the remote operation information to the substrate processing apparatus only when there is an allow setting for the remote operation by a worker in the side of the substrate processing apparatus.
    • 本发明的目的是通过更安全地远程操作来保持涂层和显影系统。 本发明是一种基板处理装置的维护系统,其包括:远程操作单元,用于通过通信网络将远程操作信息发送到基板处理设备的一侧,并从远程操作基板处理装置提供远程 操作信息提供给基板处理装置,以及通信控制单元,用于接收发送到基板处理装置一侧的远程操作信息,并将该远程操作信息提供给基板处理装置。 通信控制单元仅在基板处理装置侧的工作人员进行远程操作的允许设定时,向基板处理装置提供远程操作信息。