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    • 2. 发明授权
    • Automatic apparatus for analyzing metals
    • 用于分析金属的自动装置
    • US4456580A
    • 1984-06-26
    • US349664
    • 1982-02-17
    • Takeshi YamadaHideki OhashiMasahiro Tanimoto
    • Takeshi YamadaHideki OhashiMasahiro Tanimoto
    • B01L3/04G01N31/12G01N33/20G01N35/00G01N35/02G01N1/00G01N35/04
    • G01N33/20B01L3/04G01N31/12G01N35/00G01N35/026Y10T436/176921Y10T436/188Y10T436/23
    • An automatic apparatus for loading and feeding crucibles to and removing crucibles from a combustion furnace in which metals are burned for analyzing them. The apparatus has a part for automatically transporting crucibles to a sample weighing position one by one, a sample weighing device at the sample weighing position, and a supply device for placing the desired quantity of metal to be analyzed into crucibles at the sample weighing position. A storage device for automatically storing crucibles containing samples therein extends from the sample weighing position, and a device takes crucibles out of the storage device one by one and a further device automatically takes the crucibles from said taking out device and introduces them into a combustion furnace and removes the crucibles from the combustion furnace. A device then automatically dumps the crucibles removed from the combustion furnace after the completion of analysis. The storage device has a carrying trough for holding a line of crucibles, a stop at the downstream end of the carrying trough and movable into and out of engagement with the crucible at the downstream end of the carrying trough, and a pusher for pushing crucibles from the sample weighing position along the carrying trough and having a device for discontinuing the pushing action of said pusher when a crucible being pushed engages the stop or a crucible preceeding a crucible stopped by the stop.
    • 一种自动装置,用于将坩埚装载并从其中燃烧金属的燃烧炉中将坩埚从坩埚中取出并用于分析坩埚。 该装置具有将坩埚一个一个地自动运送到样品称重位置的部件,在样品称重位置的样品称重装置,以及用于将待分析的所需量的待分析金属放置在样品称重位置的坩埚中的供给装置。 用于自动存储含有样品的坩埚的存​​储装置从样品称重位置延伸,并且装置将坩埚逐个从存储装置中取出,并且另一装置自动从所述取出装置取出坩埚并将其引入燃烧炉 并从坩埚中取出坩埚。 完成分析后,一台设备自动将从燃烧炉中取出的坩埚倾倒。 存储装置具有用于保持一列坩埚的运送槽,在运送槽的下游端处的止动件,并且在运送槽的下游端可与坩埚接合和移出,以及用于将坩埚从 沿着承载槽的样品称重位置,并且具有用于在被推动的坩埚时停止所述推动器的推动作用的装置,该止动件或在由止动件停止的坩埚之前的坩埚接合。
    • 4. 发明授权
    • Gas doser
    • 燃气加药器
    • US4553423A
    • 1985-11-19
    • US619273
    • 1984-06-11
    • Masahiro Tanimoto
    • Masahiro Tanimoto
    • G01N33/00G01C17/38
    • G01N33/0006Y10T137/87161
    • A gas doser, including a gas input member, a gas output member and a charge-over rotor therebetween. The input member includes a gas input member having a carrier gas input port, a calibrating gas input port, a first chamber communicating with the carrier gas input port and a second chamber communicating with the calibrating gas input port. The output member has a carrier gas output port and a calibrating gas output port, respectively communicating with a third chamber and a fourth chamber. The rotor has a carrier gas ventilating conduit for providing communication between the first chamber and the third chamber, and calibrating gas measuring conduits for providing communication between the second chamber and the fourth chamber. Opposite ends of the ventilating conduit and the measuring conduits are mutually spaced from each other about the rotor axis at equal distances from the axis. The rotor is successively rotatable between a first position in which the second chamber communicates with the fourth chamber through the ventilating conduit, and second positions in which the first chamber communicates with the third chamber through a successively increasing number of the measuring conduits. With this structure, it is possible to selectively provide doses of calibrating gas in differing predetermined concentrations in a carrier gas simply by adjusting the rotational position of the rotor.
    • 气体加料器,包括气体输入构件,气体输出构件和其间的充电转子。 输入构件包括具有载气输入端口,校准气体输入端口,与载气输入端口连通的第一室和与校准气体输入端口连通的第二室的气体输入构件。 输出构件具有分别与第三室和第四室连通的载气输出端口和校准气体输出端口。 转子具有用于在第一室和第三室之间提供连通的载气通风管道,以及校准用于在第二室和第四室之间提供连通的气体测量管道。 通风管道和测量管道的相对端部围绕转子轴线相互间隔离轴线等距离。 转子可以在第二位置之间依次旋转,在第一位置,第二腔室通过通气导管与第四腔室连通,第二位置通过连续增加数量的测量导管与第三腔室连通。 利用这种结构,可以简单地通过调整转子的旋转位置来选择性地在载气中提供不同的预定浓度的校准气体的剂量。
    • 5. 发明授权
    • Electrode substrate for liquid crystal display device and liquid crystal
display device
    • 液晶显示装置用电极基板及液晶显示装置
    • US5645901A
    • 1997-07-08
    • US495666
    • 1995-07-27
    • Shunsei FukuchiMakoto IwamotoAkihiro KitabatakeMasahiro TanimotoMasaki MaekawaNaoki Shimoyama
    • Shunsei FukuchiMakoto IwamotoAkihiro KitabatakeMasahiro TanimotoMasaki MaekawaNaoki Shimoyama
    • B82B1/00G02F1/1333
    • G02F1/133345G02F1/133305Y10T428/1055Y10T428/31663Y10T428/31667
    • An electrode substrate for liquid crystal display devices is constructed with a resin substrate 4, a cured coating 3, a cured coating 2 and an ITO film 6 laminated in that order. The resin substrate 4 comprises a transparent resin which is a copolymer containing not less than 20% by weight of maleimide type monomer units, having a crosslinked structure and having a glass transition temperature of not lower than 160.degree. C. and not higher than 200.degree. C., and has a thickness of 0.1 to 0.8 mm. The cured coating 3 is a cured coating comprising a polyvinyl alcohol crosslinked with an epoxysilane represented by the formula R.sup.1 SiX.sub.3 wherein R.sup.1 is an organic group of 1 to 10 carbon atoms having a glycidyl group and X is a hydrolyzable group. The cured coating 2 is a siloxane type cured coating containing fine silica particles. The ITO film 6 is an ITO film having a grainy surface with grains of a diameter of not larger than 500 nm, formed at a substrate temperature of not higher than 100.degree. C., and having a thickness of 15 to 500 nm.
    • PCT No.PCT / JP94 / 02067 Sec。 371日期:1995年7月27日 102(e)日期1995年7月27日PCT 1994年12月8日PCT PCT。 WO95 / 16936 PCT出版物 日期:1995年6月22日。液晶显示装置用电极基板由树脂基板4,固化涂层3,固化涂层2和ITO膜6构成。 树脂基板4包括透明树脂,其是含有不少于20重量%马来酰亚胺型单体单元的共聚物,其具有交联结构并且玻璃化转变温度不低于160℃且不高于200℃ 厚度为0.1〜0.8mm。 固化涂层3是包含与由式R 1 SiX 3表示的环氧硅烷交联的聚乙烯醇的固化涂层,其中R1是具有缩水甘油基的1至10个碳原子的有机基团,X是可水解基团。 固化涂层2是含有二氧化硅微粒的硅氧烷型固化涂层。 ITO膜6是在基板温度不高于100℃,厚度为15〜500nm的条件下形成具有粒径不大于500nm的粒状的ITO膜。
    • 9. 发明授权
    • Automatic cleaning device for use in an extracting furnace of an
apparatus for analyzing gases in metals
    • 用于分析金属中的气体的装置的提取炉中的自动清洁装置
    • US4388722A
    • 1983-06-14
    • US274370
    • 1981-06-17
    • Masahiro Tanimoto
    • Masahiro Tanimoto
    • G01N1/22B08B1/04F27B17/02G01N27/38G01N33/20H05B3/00
    • B08B1/04B08B15/04F27B17/02G01N27/38G01N33/203
    • An automatic cleaning device is employed in an extracting furnace of an apparatus for analyzing gases in metals, the furnace including upper and lower electrodes relatively movable between a closed position, whereat a crucible containing a sample to be analyzed may be contacted and heated by the electrodes, and an open position, whereat the electrodes are spaced from each other. The automatic cleaning device cleans the upper and lower electrodes and includes a support bracket mounted for movement laterally of the electrodes. A cleaning unit is supported on the support bracket and is movable thereby between a first position located laterally of the electrodes and a second position located between the electrodes. The cleaning unit includes a crucible removal device to remove a spent crucible from the electrodes upon movement of the cleaning unit to the second position thereof. The cleaning unit includes upper and lower brushes rotatable to clean the upper and lower electrodes. The cleaning unit is mounted on the support bracket for vertical movement relative thereto. Thus, when the cleaning unit is in the second position thereof, relative movement between the upper and lower electrodes toward the closed position thereof causes the cleaning unit to be moved vertically until the upper and lower cleaning brushes are contacted with and clean the upper and lower electrodes.
    • 在用于分析金属中的气体的装置的提取炉中采用自动清洗装置,炉子包括上下两个电极,在关闭位置之间可相对移动,在该位置上,包含要分析的样品的坩埚可被电极接触和加热 ,以及打开位置,电极彼此间隔开。 自动清洁装置清洁上电极和下电极,并且包括安装成用于在电极横向移动的支撑支架。 清洁单元支撑在支撑托架上,并且能够在位于电极横向的第一位置与位于电极之间的第二位置之间移动。 清洁单元包括坩埚移除装置,以在清洁单元移动到其第二位置时从电极移除废坩埚。 清洁单元包括可旋转以清洁上部和下部电极的上部和下部电刷。 清洁单元安装在支撑支架上用于相对于其垂直移动。 因此,当清洁单元处于其第二位置时,上电极和下电极之间的关闭位置的相对运动使得清洁单元垂直移动,直到上清洁刷和下清洁刷接触并清洁上下 电极。