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    • 1. 发明申请
    • SUBSTRATE PROCESSING APPARATUS, METHOD FOR MODIFYING SUBSTRATE PROCESSING CONDITIONS AND STORAGE MEDIUM
    • 基板处理设备,修改基板处理条件和存储介质的方法
    • US20110224818A1
    • 2011-09-15
    • US13115673
    • 2011-05-25
    • Takeshi YOKOUCHIFumiko Yagi
    • Takeshi YOKOUCHIFumiko Yagi
    • G06F17/00
    • H01L21/67288
    • A substrate processing apparatus includes a setting unit for setting substrate processing conditions for a substrate in a substrate processing unit for performing a process on the substrate; a detection unit for detecting an abnormality of the substrate processing unit while the substrate processing unit performs the process on the substrate under the substrate processing conditions; a stopping unit for stopping the process on the substrate of the substrate processing unit if the abnormality is detected; and a modifying unit for modifying the substrate processing conditions for a substrate on which the process is stopped to be performed by the stopping unit. Further, a method for modifying substrate processing conditions includes the steps of setting processing conditions; detecting an abnormality of the substrate processing unit; stopping the process if the abnormality is detected; and modifying the processing conditions for a substrate on which the process is stopped.
    • 基板处理装置包括:设置单元,用于在基板处理单元中设置基板的基板处理条件,以在基板上进行处理; 检测单元,用于在基板处理单元在基板处理条件下对基板执行处理时检测基板处理单元的异常; 停止单元,如果检测到异常,则停止基板处理单元的基板上的处理; 以及修改单元,用于修改由停止单元执行该处理停止的基板的基板处理条件。 此外,用于修改基板处理条件的方法包括设置处理条件的步骤; 检测所述基板处理单元的异常; 如果检测到异常,停止该过程; 以及修改处理停止的基板的处理条件。