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    • 6. 发明申请
    • METHOD FOR MANUFACTURING TFT SUBSTRATE
    • 制造TFT基板的方法
    • US20090104737A1
    • 2009-04-23
    • US12251486
    • 2008-10-15
    • Takeshi SatoYoshiaki Toyota
    • Takeshi SatoYoshiaki Toyota
    • H01L21/84
    • H01L27/1288H01L27/1255H01L29/4908
    • To provide a method for manufacturing a TFT substrate in which a channel length can be stably formed while the number of masks is reduced, and a method for manufacturing a TFT substrate which can individually control impurity concentrations for channels of an n-type TFT and a p-type TFT without increasing the number of masks. A method for manufacturing a TFT substrate includes processing a gate of the n-type TFT, a gate of the p-type TFT, and an upper capacitor electrode by using a half-tone mask instead of some of normal masks to reduce the number of masks, and changing impurity concentrations of semiconductor films located in regions which become a channel of the n-type TFT, a source and a drain of the n-type TFT, a channel of the p-type TFT, a source and a drain of the p-type TFT, and an lower capacitor electrode, by using a pattern of the half-tone mask and a normal mask.
    • 为了提供一种制造可以稳定地形成通道长度并减少掩模数量的TFT基板的方法,以及可单独地控制n型TFT和 p型TFT,而不增加掩模数量。 一种TFT基板的制造方法,其特征在于,使用半色调掩模而不是一般的掩模来对n型TFT的栅极,p型TFT的栅极和上层电容电极进行处理,以减少 掩模和改变位于成为n型TFT的沟道的区域中的半导体膜的杂质浓度,n型TFT的源极和漏极,p型TFT的沟道,源极和漏极 p型TFT和下电容器电极,通过使用半色调掩模和正常掩模的图案。
    • 9. 发明授权
    • Manufacturing method for display device
    • 显示装置的制造方法
    • US07642141B2
    • 2010-01-05
    • US12155204
    • 2008-05-30
    • Yoshiaki ToyotaTakeshi Sato
    • Yoshiaki ToyotaTakeshi Sato
    • H01L21/786
    • H01L27/1251H01L27/1214H01L27/1288
    • A manufacturing method for a display device having a first conductive type thin film transistor and a second conductive type thin film transistor, comprising the steps of: in formation regions for a first conductive type thin film transistor and a second conductive type thin film transistor forming a semiconductor layer, a first insulating film covering the semiconductor layer and a gate electrode disposed on the first insulating film so as to intersect the semiconductor layer, on substrate having first conductive type impurity regions on both outer sides of a channel region of the semiconductor layer below the gate electrode forming a second insulating film, in the second insulating film and the first insulating film forming a contact hole for a drain electrode and a source electrode, in the formation region for the second conductive type thin film transistor forming electrodes and a second conductive type impurity region.
    • 一种具有第一导电型薄膜晶体管和第二导电型薄膜晶体管的显示装置的制造方法,包括以下步骤:在第一导电型薄膜晶体管和第二导电型薄膜晶体管的形成区域中形成 半导体层的半导体层的沟道区域的两个外侧的具有第一导电型杂质区域的基板上,覆盖半导体层的第一绝缘膜和设置在第一绝缘膜上的栅电极,以与半导体层相交; 所述栅电极在所述第二绝缘膜和所述第一绝缘膜中形成第二绝缘膜,所述第一绝缘膜在所述第二导电型薄膜晶体管形成电极的形成区域中形成用于漏极和源电极的接触孔,并且所述第二导电 型杂质区。
    • 10. 发明授权
    • Display device
    • 显示设备
    • US08242505B2
    • 2012-08-14
    • US12003462
    • 2007-12-26
    • Tetsufumi KawamuraTakeshi SatoMutsuko HatanoYoshiaki Toyota
    • Tetsufumi KawamuraTakeshi SatoMutsuko HatanoYoshiaki Toyota
    • H01L29/04H01L31/036
    • H01L27/127H01L27/12H01L27/1225H01L27/124H01L29/7869
    • A display device for improving an aperture ratio of the pixel is provided. In the display device, a transparent oxide layer, an insulating film, and a conductive layer are sequentially stacked on a pixel region on a substrate, the conductive layer has a gate electrode of a thin film transistor connected to a gate signal line, and a region of the transparent oxide layer other than at least a channel region portion directly below the gate electrode is converted into an electrically conductive region, and a source signal line, a source region portion of the thin film transistor connected to the source signal line, a pixel electrode, and a drain region portion of the thin film transistor connected to the pixel electrode are formed from the conductive region.
    • 提供了一种用于提高像素的开口率的显示装置。 在显示装置中,透明氧化物层,绝缘膜和导电层依次层叠在基板上的像素区域上,导电层具有与栅极信号线连接的薄膜晶体管的栅电极, 透明氧化物层的除了栅电极正下方的沟道区域以外的透明氧化物层的区域被转换为导电区域,源极信号线,连接到源极信号线的薄膜晶体管的源极区域部分 像素电极和连接到像素电极的薄膜晶体管的漏区部分由导电区域形成。