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1. 发明申请

US20040044223A1 Benzimidazole derivatives, their production and use 失效
标题翻译：苯并咪唑衍生物，其生产和使用
公开(公告)号：US20040044223A1
公开(公告)日：2004-03-04
申请号：US10612984
申请日：2003-07-07
申请人： Takeda Chemical Industries, Ltd.
发明人： Takehiko Naka , Kohei Nishikawa , Takeshi Kato
IPC分类号： C07D43/02
CPC分类号： C07D235/02 , C07D235/26 , C07D235/28 , C07D235/30 , C07D403/04 , C07D403/10 , C07D405/14
摘要： A method for producing a compound represented by the formula: 1 wherein the ring A is a benzene ring which may be substituted in addition to the Rnull group; R1 is hydrogen or an optionally substituted hydrocarbon residue; X is a direct bond or a spacer having an atomic length or two or less between the phenylene group and the phenyl group; Y is nullOnull, nullS(O)m- or nullN(R4)null wherein m is an integer of 0, 1 or 2 and R4 is hydrogen or an optionally substituted alkyl group; Rnull is carboxyl, an ester thereof, an amide thereof or a group capable of forming an anion or a group convertible thereinto; n is an integer of 1 or 2; or a salt thereof, which comprises deprotecting a compound represented by the formula: 2 wherein R is triphenylmethyl, 2-tetrahydropyranyl, methoxymethyl or ethoxy methyl, the other symbols as defined above; or a salt thereof.
摘要翻译：一种制备由下式表示的化合物的方法：其中环A是除R'基之外可被取代的苯环; R 1是氢或任选取代的烃残基; X是在亚苯基和苯基之间具有原子长度或者两个或更少的直接键或间隔子; Y是-O - ， - S（O）m - 或-N（R 4） - ，其中m是0,1或2的整数，R 4是氢或任选取代的烷基; R'是羧基，其酯，其酰胺或能够形成阴离子的基团或可转化的基团; n为1或2的整数; 其包括使由下式表示的化合物脱保护：其中R是三苯甲基，2-四氢吡喃基，甲氧基甲基或乙氧基甲基，其它符号如上定义; 或其盐。

2. 发明申请

US20020151723A1 Benzimidazole derivatives, their production and use 失效
标题翻译：苯并咪唑衍生物，其生产和使用
公开(公告)号：US20020151723A1
公开(公告)日：2002-10-17
申请号：US10046189
申请日：2002-01-16
申请人： TAKEDA CHEMICAL INDUSTRIES, LTD.
发明人： Takehiko Naka , Kohei Nishikawa , Takeshi Kato
IPC分类号： C07D43/02
CPC分类号： C07D235/02 , C07D235/26 , C07D235/28 , C07D235/30 , C07D403/04 , C07D403/10 , C07D405/14
摘要： A method for producing a compound represented by the formula: 1 wherein the ring A is a benzene ring which may be substituted in addition to the Rnull group; R1 is hydrogen or an optionally substituted hydrocarbon residue; X is a direct bond or a spacer having an atomic length or two or less between the phenylene group and the phenyl group; Y is nullOnull, nullS(O)mnull or nullN(R4)null wherein m is an integer of 0, 1 or 2 and R4 is hydrogen or an optionally substituted alkyl group; Rnull is carboxyl, an ester thereof, an amide thereof or a group capable of forming an anion or a group convertible thereinto; n is an integer of 1 or 2; or a salt thereof, which comprises deprotecting a compound represented by the formula: 2 wherein R is triphenylmethyl, 2-tetrahydropyranyl, methoxymethyl or ethoxy methyl, the other symbols as defined above; or a salt thereof.
摘要翻译：一种制备由下式表示的化合物的方法：其中环A是除R'基之外可被取代的苯环; R1是氢或任选取代的烃残基; X是在亚苯基和苯基之间具有原子长度或者两个或更少的直接键或间隔子; Y是-O - ， - S（O）m - 或-N（R4） - ，其中m是0,1或2的整数，R4是氢或任选取代的烷基; R'是羧基，其酯，其酰胺或能够形成阴离子的基团或可转化的基团; n为1或2的整数; 其包括使由下式表示的化合物脱保护：其中R是三苯甲基，2-四氢吡喃基，甲氧基甲基或乙氧基甲基，其它符号如上定义; 或其盐

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