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    • 2. 发明授权
    • X-ray system and X-ray exposure apparatus
    • X射线系统和X射线曝光装置
    • US6009144A
    • 1999-12-28
    • US48126
    • 1998-03-26
    • Nobuaki OgushiTakayuki Hasegawa
    • Nobuaki OgushiTakayuki Hasegawa
    • G21K5/02G03F7/20G21F3/00G21K5/04H01L21/027H05H13/04G21K5/00
    • G21K5/04
    • An X-ray system includes a radiation source for producing a radiation beam containing X-rays, a mirror device for reflecting X-rays, a beam duct for introducing the X-rays reflected by the mirror device, to an irradiation zone where an object to be irradiated can be exposed, and a shutter capable of blocking the radiation beam. A protection wall is disposed downstream of the mirror device with respect to the radiation source, for blocking the radiation beam. When the protection wall has a thickness t, the beam duct passing through the protection wall has an opening size a, and the beam duct has a tilt angle .theta., there is a relation (t-t.sub.0) sin .theta..gtoreq.a, where t.sub.0 is a minimum thickness of the protection wall required to substantially block the radiation beam from a radiation source.
    • X射线系统包括用于产生包含X射线的辐射束的辐射源,用于反射X射线的反射镜装置,用于将由反射镜装置反射的X射线引入的光束管道, 可以被照射,以及能够阻挡辐射束的快门。 保护壁相对于辐射源设置在反射镜装置的下游,用于阻挡辐射束。 当保护壁具有厚度t时,通过保护壁的光束管道具有开口尺寸a,并且光束管道具有倾斜角度θ,存在关系(t-t0)sinθ> / = a,其中 t0是基本上阻挡来自辐射源的辐射束所需的保护壁的最小厚度。
    • 4. 发明申请
    • Optical unit and measuring apparatus having the same
    • 光学单元及其测量装置
    • US20050128478A1
    • 2005-06-16
    • US11002889
    • 2004-12-03
    • Takayuki HasegawaAkira Miyake
    • Takayuki HasegawaAkira Miyake
    • G01N23/22G01B11/30G01J3/28G01M11/00G01T1/36G01B11/24
    • G01B11/30G01J3/28
    • An optical unit includes a spectrometer that includes a diffraction grating for separating light, and a beam intensity sensor for detecting a light intensity of light emitted from the spectrometer, wherein the beam intensity sensor includes, in order from a light incident side to a light exit side, an aperture having a first opening that restricts a width of incident light, and a light receiving sensor that has a second opening for detecting part of light from the aperture, wherein the second opening in the light receiving sensor is wider than the first opening in the aperture in a spectral direction of the light from the spectrometer, and wherein the second opening in the light receiving sensor is narrower than the first opening in the aperture in a direction orthogonal to the spectral direction of the light from the spectrometer.
    • 光学单元包括:光谱仪,其包括用于分离光的衍射光栅;以及光束强度传感器,用于检测从光谱仪发射的光的光强度,其中光束强度传感器包括从光入射侧到光出射 具有限制入射光的宽度的第一开口的孔,以及具有用于检测来自所述孔的部分光的第二开口的光接收传感器,其中所述光接收传感器中的所述第二开口比所述第一开口宽 在来自光谱仪的光的光谱方向上的孔中,并且其中光接收传感器中的第二开口在与光谱仪的光的光谱方向正交的方向上比孔中的第一开口窄。
    • 5. 发明授权
    • Assembly and adjusting method of optical system, exposure apparatus having the optical system
    • 光学系统的装配和调整方法,具有光学系统的曝光装置
    • US07280184B2
    • 2007-10-09
    • US11123975
    • 2005-05-06
    • Takayuki HasegawaAkira Miyake
    • Takayuki HasegawaAkira Miyake
    • G03B27/42G03B27/32
    • G03F7/706G03F7/70258
    • An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.
    • 一种由多个光学元件组成的光学系统的调整方法,所述多个光学元件具有多层膜,所述调整方法包括对于每个光学元件获得EUV光(极紫外光)的相位分布之间的差异的第一测量步骤, 从所述光学元件反射并且从所述光学元件反射具有比所述EUV光更长的波长的光的相位分布,测量所述光通过所述光学系统的相位分布的第二测量步骤, 决定步骤,其基于由所述第一测量步骤获得的相位分布差和由所述第二测量步骤测量的相位分布,决定所述EUV光通过所述光学系统的相位分布;以及调整步骤, 基于由判定步骤决定的相位分布的光学元件的位置和姿势。
    • 6. 发明申请
    • Assembly and adjusting method of optical system, exposure apparatus having the optical system
    • 光学系统的装配和调整方法,具有光学系统的曝光装置
    • US20050264779A1
    • 2005-12-01
    • US11123975
    • 2005-05-06
    • Takayuki HasegawaAkira Miyake
    • Takayuki HasegawaAkira Miyake
    • G01M11/02G02B7/00G02B7/198G03F7/20H01L21/027G03B27/42
    • G03F7/706G03F7/70258
    • An adjusting method of an optical system composed plural optical elements each having a multilayer film, said adjusting method that includes a first measuring step that obtains, for each optical element, a difference between a phase distribution of which an EUV light (Extreme Ultraviolet light) is reflected from the optical element and a phase distribution of which a light with a wavelength that is longer than the EUV light is reflected from the optical element, a second measuring step that measures a phase distribution of which the light passes the optical system, a deciding step that decides a phase distribution of which the EUV light passes through the optical system based on the phase distribution difference obtained by the first measuring step and the phase distribution measured by the second measuring step, and an adjusting step that adjusts at least one of a position and a posture of the optical element based on the phase distribution decided by the deciding step.
    • 一种由多个光学元件组成的光学系统的调整方法,所述多个光学元件具有多层膜,所述调整方法包括对于每个光学元件获得EUV光(极紫外光)的相位分布之间的差异的第一测量步骤, 从所述光学元件反射并且从所述光学元件反射具有比所述EUV光更长的波长的光的相位分布,测量所述光通过所述光学系统的相位分布的第二测量步骤, 决定步骤,其基于由所述第一测量步骤获得的相位分布差和由所述第二测量步骤测量的相位分布,决定所述EUV光通过所述光学系统的相位分布;以及调整步骤, 基于由判定步骤决定的相位分布的光学元件的位置和姿势。