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    • 9. 发明授权
    • Method of manufacturing substrate for liquid crystal display device and method of manufacturing liquid crystal display device using same
    • 液晶显示装置用基板的制造方法及使用该液晶显示装置的液晶显示装置的制造方法
    • US07001714B2
    • 2006-02-21
    • US10830513
    • 2004-04-23
    • Takashi TakagiManabu Sawasaki
    • Takashi TakagiManabu Sawasaki
    • G02F1/1333
    • G02F1/1393G02F1/133555G02F1/133707G02F1/133753G02F1/13394G02F2001/136222
    • The present invention provides a method of manufacturing a substrate for MVA type or transreflective liquid crystal display device capable of obtaining a substrate for liquid crystal display device having a good display quality while simplifying the production process and a method of manufacturing a liquid crystal display device using same. A positive-working resist is spread over a glass substrate to form a resist layer thereon. The resist layer is exposed to light and developed to form a resist pattern having linear patterns. The linear pattern in the resist pattern is then irradiated with ultraviolet rays. The resist pattern is then subjected to heat treatment at a predetermined temperature to form a structure having a flat portion formed by the melt flow of the linear pattern irradiated with ultraviolet rays and a protrusion formed by the reflow of the linear pattern unirradiated with ultraviolet rays.
    • 本发明提供一种制造用于MVA型或透射型液晶显示装置的基板的方法,该方法能够在简化制造工艺的同时获得具有良好显示质量的液晶显示装置用基板,以及使用以下方法制造液晶显示装置的方法: 相同。 将正性抗蚀剂分散在玻璃基板上以在其上形成抗蚀剂层。 将抗蚀剂层曝光并显影以形成具有线性图案的抗蚀剂图案。 然后用紫外线照射抗蚀剂图案中的线性图案。 然后将抗蚀剂图案在预定温度下进行热处理,以形成具有通过用紫外线照射的线状图案的熔体流动形成的平坦部分的结构和由未经紫外线照射的线状图案的回流而形成的突起。