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1. 发明申请

US20110215256A1 Focused ion beam apparatus 审中-公开
标题翻译：聚焦离子束装置
公开(公告)号：US20110215256A1
公开(公告)日：2011-09-08
申请号：US12931987
申请日：2011-02-15
申请人： Takashi Ogawa , Kenichi Nishinaka , Yasuhiko Sugiyama
发明人： Takashi Ogawa , Kenichi Nishinaka , Yasuhiko Sugiyama
IPC分类号： H01J3/14 , H01J3/26
CPC分类号： H01J3/14 , H01J3/26
摘要： A focused ion beam apparatus includes an ion gun unit having an emitter tip, a gas supply unit including an ion source gas nozzle configured to supply gas to the tip and an ion source gas supply source. An extracting electrode ionizes the gas adsorbed onto the surface of the tip and extracts ions by applying a voltage between the extracting electrode and the tip. A cathode electrode accelerates the ions toward a sample, and a gun alignment electrode positioned on the side of the sample with respect to the ion gun unit and adjusts the direction of irradiation of the ion beam ejected from the ion gun unit. A lens system includes a focusing lens electrode and an objective lens electrode to focus the ion beam onto the sample.
摘要翻译：聚焦离子束装置包括具有发射极尖端的离子枪单元，气体供给单元，其包括被配置为向尖端供应气体的离子源气体喷嘴和离子源气体供给源。提取电极通过在提取电极和尖端之间施加电压使吸附在尖端表面上的气体电离并提取离子。阴极电极将离子朝向样品加速，并且枪对准电极相对于离子枪单元位于样品侧，并调节从离子枪单元喷射的离子束的照射方向。透镜系统包括聚焦透镜电极和用于将离子束聚焦到样品上的物镜电极。

2. 发明授权

US08274063B2 Composite focused ion beam device, process observation method using the same, and processing method 有权
标题翻译：复合聚焦离子束装置，工艺观察方法采用相同的加工方法
公开(公告)号：US08274063B2
公开(公告)日：2012-09-25
申请号：US12733091
申请日：2008-08-06
申请人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J49/00
CPC分类号： H01J37/08 , G01N1/04 , G01N1/06 , H01J37/3005 , H01J37/3056 , H01J2237/0807 , H01J2237/0817 , H01J2237/31745
摘要： A composite focused ion beam device has a first ion beam irradiation system that irradiates a first ion beam for processing a sample and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a plasma type gas ion source that generates first ions for forming the first ion beam, each of the first ions having a first mass. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. Each of the second ions has a second mass smaller than that of the first mass.
摘要翻译：复合聚焦离子束装置具有照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束用于处理或观察样品的第二离子束照射系统。第一离子束照射系统具有产生用于形成第一离子束的第一离子的等离子体型气体离子源，每个第一离子具有第一质量。第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。每个第二离子具有比第一质量小的第二质量。

3. 发明申请

US20100176296A1 COMPOSITE FOCUSED ION BEAM DEVICE, AND PROCESSING OBSERVATION METHOD AND PROCESSING METHOD USING THE SAME 有权
标题翻译：复合聚焦离子束装置和处理观测方法及其处理方法
公开(公告)号：US20100176296A1
公开(公告)日：2010-07-15
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/30 , H01J27/02 , H01J37/08 , H01J37/26
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metal ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion, and a beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is less than that of the first ion beam 10A emitted from the first ion beam irradiation system 10.
摘要翻译：复合聚焦离子束装置包括：第一离子束照射系统10，其包括用于产生第一离子的液态金属离子源;以及第二离子束照射系统20，其包括用于产生第二离子的气体场离子源，从第二离子束照射系统20发射的第二离子束20A的距离小于从第一离子束照射系统10发射的第一离子束10A的离子束。

4. 发明授权

US08269194B2 Composite focused ion beam device, and processing observation method and processing method using the same 有权
标题翻译：复合聚焦离子束装置及其加工方法及处理方法
公开(公告)号：US08269194B2
公开(公告)日：2012-09-18
申请号：US12733089
申请日：2008-08-06
申请人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Junichi Tashiro , Yasuhiko Sugiyama , Kouji Iwasaki , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J49/00
CPC分类号： H01J37/3056 , G01N1/286 , G01N1/32 , G03F1/74 , G03F1/84 , H01J37/08 , H01J37/3005 , H01J2237/0805 , H01J2237/0807 , H01J2237/31745
摘要： A composite focused ion beam device has a sample stage for supporting a sample, a first ion beam irradiation system that irradiates a first ion beam for processing the sample, and a second ion beam irradiation system that irradiates a second ion beam for processing or observing the sample. The first ion beam irradiation system has a liquid metal ion source that generates first ions for forming the first ion beam. The second ion beam irradiation system has a gas field ion source that generates second ions for forming the second ion beam. The first ion beam irradiated by the first ion beam irradiation system has a first beam diameter and the second ion beam irradiated by the second ion beam irradiation system has a second beam diameter smaller than the first beam diameter. The first and second ion beam irradiation systems are disposed relative to the sample stage so that axes of the first and second ion beams are orthogonal to a tilt axis of the sample stage.
摘要翻译：复合聚焦离子束装置具有用于支撑样品的样品台，照射用于处理样品的第一离子束的第一离子束照射系统和照射第二离子束以用于处理或观察样品的第二离子束照射系统样品。第一离子束照射系统具有产生用于形成第一离子束的第一离子的液态金属离子源。第二离子束照射系统具有产生用于形成第二离子束的第二离子的气体场离子源。由第一离子束照射系统照射的第一离子束具有第一光束直径，并且由第二离子束照射系统照射的第二离子束具有小于第一光束直径的第二光束直径。第一和第二离子束照射系统相对于样品台设置，使得第一和第二离子束的轴线垂直于样品台的倾斜轴。

5. 发明申请

US20100288924A1 COMPOSITE FOCUSED ION BEAM DEVICE, PROCESS OBSERVATION METHOD USING THE SAME,AND PROCESSING METHOD 有权
标题翻译：复合聚焦离子束装置，使用该方法的方法观察方法和处理方法
公开(公告)号：US20100288924A1
公开(公告)日：2010-11-18
申请号：US12733091
申请日：2008-08-06
申请人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
发明人： Takashi Kaito , Yoshitomo Nakagawa , Junichi Tashiro , Yasuhiko Sugiyama , Toshiaki Fujii , Kazuo Aita , Takashi Ogawa
IPC分类号： H01J37/26 , H01J37/30 , H01J37/08
CPC分类号： H01J37/08 , G01N1/04 , G01N1/06 , H01J37/3005 , H01J37/3056 , H01J2237/0807 , H01J2237/0817 , H01J2237/31745
摘要： A composite focused ion beam device includes a first ion beam irradiation system 10 including a liquid metallic ion source for generating a first ion, and a second ion beam irradiation system 20 including a gas field ion source for generating a second ion. A beam diameter of the second ion beam 20A emitted from the second ion beam irradiation system 20 is smaller than that of the first ion beam 10A emitted from the first ion beam irradiation system 1
摘要翻译：复合聚焦离子束装置包括包括用于产生第一离子的液体金属离子源的第一离子束照射系统10和包括用于产生第二离子的气体离子源的第二离子束照射系统20。从第二离子束照射系统20发射的第二离子束20A的光束直径小于从第一离子束照射系统1发射的第一离子束10A的光束直径

6. 发明授权

US07297944B2 Ion beam device and ion beam processing method, and holder member 有权
标题翻译：离子束装置和离子束处理方法，以及支架构件
公开(公告)号：US07297944B2
公开(公告)日：2007-11-20
申请号：US10520982
申请日：2003-07-09
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fuji , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fuji , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： H01J37/30 , H01J37/317 , G01N1/28 , H01J37/20
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： An apparatus has a holder member (21) which holds a sample (3), and a removing beam source (13) which irradiates an inert ion beam onto a cross section (4) of the sample (3) held by a holder member (21) and removes a fracture layer on the cross section (4). Then, the removing beam source (13) is disposed on the holding end side of the sample (3) with respect to the normal L of the cross section (4) so that the irradiating direction of the inert ion beam is tilted at the tilt angle θ to the normal L with respect to the cross section (4).
摘要翻译：一种装置具有保持样品（3）的保持器构件（21）和将惰性离子束照射到由保持器构件保持的样品（3）的横截面（4）上的去除束源（13） 21）并且去除横截面（4）上的断裂层。然后，移除光束源（13）相对于截面（4）的法线L配置在样品（3）的保持端侧，使得惰性离子束的照射方向倾斜相对于横截面（4）的角度θ相对于法线L。

7. 发明授权

US07172839B2 Photomask correction method using composite charged particle beam, and device used in the correction method 有权
标题翻译：使用复合带电粒子束的光掩模校正方法，以及在校正方法中使用的装置
公开(公告)号：US07172839B2
公开(公告)日：2007-02-06
申请号：US10721522
申请日：2003-11-24
申请人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
发明人： Yasuhiko Sugiyama , Junichi Tashiro , Anto Yasaka
IPC分类号： G03F9/00 , C03C15/00 , G01L21/30
CPC分类号： G03F1/74
摘要： The object of the present invention is to provide a method for solving the problem of surface damage due to gallium ion irradiation that poses a problem when carrying out mask repair using currently established FIB techniques, and the problem of residual gallium, and to provide a device realizing this method. The device of the present invention has an electron beam lens barrel that can carry out processing, as well as an FIB lens barrel, provided inside the same sample chamber, which means that a mask repair method of the present invention, in correction processing to remove redundant sections such as a mask opaque defect, phase shift film bump defect or a glass substrate cut remnant defect, comprises a step of coarse correction by etching using a focused ion beam and a step of finishing processing using an electron beam, to remove surface damage due to gallium irradiation, and residual gallium.
摘要翻译：本发明的目的是提供一种解决由于镓离子照射引起的表面损伤的问题的方法，当使用当前建立的FIB技术进行掩模修复时存在问题，并且存在残留镓的问题，并提供一种装置实现这个方法。本发明的装置具有能够进行处理的电子束透镜镜筒以及设置在同一样品室内的FIB镜筒，这意味着本发明的掩模修复方法在校正处理中去除冗余部分如掩模不透明缺陷，相移膜凸起缺陷或玻璃衬底切割残余缺陷包括通过使用聚焦离子束的蚀刻进行粗略校正的步骤和使用电子束进行精加工的步骤以去除表面损伤由于镓照射和残留的镓。

8. 发明授权

US06838685B1 Ion beam apparatus, ion beam processing method and sample holder member 失效
标题翻译：离子束装置，离子束处理方法和样品架构件
公开(公告)号：US06838685B1
公开(公告)日：2005-01-04
申请号：US10629217
申请日：2003-07-29
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： G01N1/28 , G01N1/32 , H01J37/26 , H01J37/305 , H01J37/31 , H01J37/317
CPC分类号： H01J37/3056 , G01N1/32 , H01J2237/2007 , H01J2237/20214 , H01J2237/31745 , H01J2237/31749
摘要： An ion beam processing device has a sample holder for fixing a sample on which a section has been formed by irradiation of a specified focused ion beam from a surface side, and gas ion beam irradiation device for irradiating a gas ion beam to a region of the sample fixing using the holder member that contains the section to remove a damage layer on the section. The gas ion beam from the gas ion beam irradiation device irradiates the section from a rear surface side of the sample at a specified incident angle.

9. 发明授权

US06437330B1 Method and apparatus for adjusting a charged particle beam of a beam optical system 有权
标题翻译：用于调整光束光学系统的带电粒子束的方法和装置
公开(公告)号：US06437330B1
公开(公告)日：2002-08-20
申请号：US09360338
申请日：1999-07-26
申请人： Yasuhiko Sugiyama
发明人： Yasuhiko Sugiyama
IPC分类号： H01J3726
CPC分类号： H01J37/28 , H01J37/21 , H01J2237/216
摘要： A method and apparatus for obtaining an observational image of a sample surface by scanning a charged particle beam to detect secondary charged particles given off from the sample surface. Charged particle beam focusing and astigmatism correction are performed by comparing scanning images: one image obtained from an initial adjusting value, and other images obtained from a ±&Dgr; of the initial adjusting value, wherein &Dgr; is a known predetermined selected value. The clearest image of the images is selected, and the adjusting value of the clearest image is then set as the new initial adjusting value. The entire scanning, comparison, and adjusting process is repeated until an optimal satisfactory image is obtained.
摘要翻译：一种用于通过扫描带电粒子束来获得样品表面的观察图像以检测从样品表面排出的二次带电粒子的方法和装置。通过比较扫描图像来执行带电粒子束聚焦和像散校正：从初始调整值获得的一个图像和从初始调整值的±DELTA获得的其他图像，其中DELTA是已知的预定选择值。选择图像的最清晰的图像，然后将最清晰的图像的调整值设置为新的初始调整值。重复整个扫描，比较和调整过程，直到获得最佳令人满意的图像。

10. 发明授权

US5438197A Focused ion beam apparatus 失效
标题翻译：聚焦离子束装置
公开(公告)号：US5438197A
公开(公告)日：1995-08-01
申请号：US272545
申请日：1994-07-11
申请人： Toshiaki Fujii , Yasuhiko Sugiyama
发明人： Toshiaki Fujii , Yasuhiko Sugiyama
IPC分类号： G01Q90/00 , H01J37/244 , H01J37/30 , H01J37/28
CPC分类号： H01J37/244 , H01J37/3005 , H01J2237/2448
摘要： A focussed ion-beam apparatus, to realize the simultaneous observation of both the brighter area and the darker area on the sample, which are generated because of the difference in the generation efficiency of the secondary charged particle due to the ion-beam irradiation. According to the result in the comparison of the output signal from the secondary charged particle detector with the reference voltage, to optimize the signal above as the input signal for the image display. To realize the simultaneous observation of both the brighter area and the darker area of the sample.
摘要翻译：一种聚焦离子束装置，用于实现由于离子束照射引起的二次带电粒子的产生效率的差异而产生的样品上较亮区域和较暗区域的同时观察。根据将二次带电粒子检测器的输出信号与参考电压进行比较的结果，优化上述作为图像显示输入信号的信号。实现同时观察样品的较亮区域和较暗区域。

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