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1. 发明申请

US20120177914A1 PRESS-MOLDING GLASS MATERIAL, METHOD OF MANUFACTURING PRESS MOLDING GLASS MATERIAL, AND METHOD OF MANUFACTURING OPTICAL ELEMENT 有权
标题翻译：压制玻璃材料，制造压制成型玻璃材料的方法和制造光学元件的方法
公开(公告)号：US20120177914A1
公开(公告)日：2012-07-12
申请号：US13203806
申请日：2010-12-16
申请人： Takashi Igari , Takeshi Ishimine
发明人： Takashi Igari , Takeshi Ishimine
IPC分类号： B32B17/06 , C03C17/23 , C23C14/34 , C03B23/03
CPC分类号： G02B1/10 , C03B11/08 , C03B40/00 , C03C3/21 , C03C17/245 , C03C2217/213 , Y02P40/57 , Y10T428/265 , Y10T428/31
摘要： An aspect of the present invention relates to a press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy as measured by a three-liquid method of equal to or lower than 75 mJ/m2. A further aspect of the present invention relates to a method of manufacturing a press-molding glass material comprising a core part comprised of optical glass and a silicon oxide film covering at least a portion of the core part to be an optically functional surface. The silicon oxide film is less than 15 nm in thickness, and film formation processing is conducted with a film-forming material comprised of SiO2 in an atmosphere with an oxygen content falling within a range of equal to or higher than 5 volume percent but less than 20 volume percent to form the silicon oxide film on the above portion of the core part.
摘要翻译：本发明的一个方面涉及一种压制成型玻璃材料，其包括由光学玻璃构成的芯部和厚度小于15nm的氧化硅膜，其覆盖芯部的至少一部分，该部分为作为光学功能表面，并且具有通过等于或低于75mJ / m 2的三液体方法测量的表面自由能。本发明的另一方面涉及一种制造压制成型玻璃材料的方法，该方法包括由光学玻璃构成的核心部分和覆盖芯部分的至少一部分以成为光学功能表面的氧化硅膜。氧化硅膜的厚度小于15nm，在氧气含量在5体积％以上但小于等于5体积％的范围的气氛中，由SiO 2组成的成膜材料进行成膜处理 20体积％以在芯部的上述部分上形成氧化硅膜。

2. 发明授权

US08993115B2 Press-molding glass material, method of manufacturing press-molding glass material, and method of manufacturing optical element 有权
标题翻译：压制成形玻璃材料，压制成形玻璃材料的制造方法以及光学元件的制造方法
公开(公告)号：US08993115B2
公开(公告)日：2015-03-31
申请号：US13203806
申请日：2010-12-16
申请人： Takashi Igari , Takeshi Ishimine
发明人： Takashi Igari , Takeshi Ishimine
IPC分类号： B32B17/06 , C23C14/34 , C03B23/00 , B32B7/02 , C23C14/10 , C03B40/00 , C03B11/08 , C03C3/21 , C03C17/245 , G02B1/10
CPC分类号： G02B1/10 , C03B11/08 , C03B40/00 , C03C3/21 , C03C17/245 , C03C2217/213 , Y02P40/57 , Y10T428/265 , Y10T428/31
摘要： An aspect of the present invention relates to a press-molding glass material, which comprises a core part comprised of optical glass and a silicon oxide film of less than 15 nm in thickness covering at least a portion of the core part, the portion being to be an optically functional surface, as well as has a surface free energy as measured by a three-liquid method of equal to or lower than 75 mJ/m2. A further aspect of the present invention relates to a method of manufacturing a press-molding glass material comprising a core part comprised of optical glass and a silicon oxide film covering at least a portion of the core part to be an optically functional surface. The silicon oxide film is less than 15 nm in thickness, and film formation processing is conducted with a film-forming material comprised of SiO2 in an atmosphere with an oxygen content falling within a range of equal to or higher than 5 volume percent but less than 20 volume percent to form the silicon oxide film on the above portion of the core part.
摘要翻译：本发明的一个方面涉及一种压制成型玻璃材料，其包括由光学玻璃构成的芯部和厚度小于15nm的氧化硅膜，其覆盖芯部的至少一部分，该部分为作为光学功能表面，并且具有通过等于或低于75mJ / m 2的三液体方法测量的表面自由能。本发明的另一方面涉及一种制造压制成型玻璃材料的方法，该方法包括由光学玻璃构成的核心部分和覆盖芯部分的至少一部分以成为光学功能表面的氧化硅膜。氧化硅膜的厚度小于15nm，在氧气含量在5体积％以上但小于等于5体积％的范围的气氛中，由SiO 2组成的成膜材料进行成膜处理 20体积％以在芯部的上述部分上形成氧化硅膜。

3. 发明授权

US08865314B2 Press molding glass material, manufacturing method thereof, and manufacturing method of optical element 有权
标题翻译：压制成形玻璃材料及其制造方法以及光学元件的制造方法
公开(公告)号：US08865314B2
公开(公告)日：2014-10-21
申请号：US13533129
申请日：2012-06-26
申请人： Takashi Igari , Kenya Abiko
发明人： Takashi Igari , Kenya Abiko
IPC分类号： B32B17/06 , C23C14/34 , C03B23/00 , B32B7/02 , C23C14/10 , C03B11/08 , C03C17/34 , C03B11/14 , C03C17/23
CPC分类号： C03B11/08 , C03B11/14 , C03B2215/49 , C03C17/23 , C03C17/3417 , C03C2217/212 , C03C2217/213 , C03C2217/216 , C03C2217/22 , C03C2217/228 , C03C2217/229 , Y02P40/57 , Y10T428/24975
摘要： A press molding glass material including: a core portion composed of optical glass; and a surface layer covering the core portion, wherein the surface layer includes an outermost layer contacting with a molding surface of a molding die in press molding and an intermediate layer adjacent to the outermost layer, the outermost layer is a silicon oxide film having a surface free energy measured by a three-solution method of equal to or less than 75 mJ/m2 and having a film thickness of less than 15 nm, and the intermediate layer is a film composed of a film material having a bond-radius difference from a silicon oxide based on a stoichiometric composition of more than 0.10 Å, wherein, in a case in which the bond-radius difference is more than 0.10 Å and equal to or less than 0.40 Å, a film thickness of the intermediate layer is equal to or less than 5 nm.
摘要翻译：一种压制成型玻璃材料，包括：由光学玻璃构成的芯部; 以及覆盖所述芯部的表面层，其中所述表面层包括与压模成型中的成型模具的成型面接触的最外层和与所述最外层相邻的中间层，所述最外层是具有表面的氧化硅膜通过等于或小于75mJ / m 2并且具有小于15nm的膜厚度的三溶液法测量的自由能，并且中间层是由具有与半导体层的键半径差的膜材料构成的膜基于大于0.10的化学计量组成的氧化硅，其中，在所述键半径差大于等于或小于0.40的情况下，所述中间层的膜厚等于或等于小于5nm。

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