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    • 1. 发明授权
    • Film bulk acoustic wave resonator
    • 薄膜体声波谐振器
    • US07173361B2
    • 2007-02-06
    • US11028992
    • 2005-01-03
    • Hisatoshi SaitoTakao NoguchiKenji Inoue
    • Hisatoshi SaitoTakao NoguchiKenji Inoue
    • H01L41/08H03H9/54
    • H03H9/02094H03H9/175H03H9/176
    • A film bulk acoustic wave resonator of the invention includes a substrate; a resonant structure provided on the substrate constituted by a lower electrode, a piezoelectric film and an upper electrode; and an acoustic multilayer of a plurality of reflective films provided between the substrate and the resonant structure. At least one of the reflective films of the acoustic multilayer has a specified crystal plane orientation, and an X-ray rocking curve full width at half maximum that is preferably not greater than 10 degrees, and more preferably is not greater than 3 degrees. This makes it possible to obtain better resonance characteristics than in the case of the prior art, by increasing the efficiency with which bulk waves propagating towards the substrate are reflected.
    • 本发明的薄膜体声波谐振器包括:基板; 设置在由下电极,压电膜和上电极构成的基板上的谐振结构; 以及设置在所述基板和所述谐振结构之间的多个反射膜的声学多层。 声学多层反射膜中的至少一个具有特定的晶面取向,并且X射线摇摆曲线半峰全宽度优选不大于10度,更优选不大于3度。 这使得通过提高向衬底传播的体波的效率被反射,可以获得比现有技术的情况更好的谐振特性。
    • 4. 发明授权
    • Electronic device and method of fabricating the same
    • 电子装置及其制造方法
    • US07105880B2
    • 2006-09-12
    • US11069723
    • 2005-02-28
    • Takao NoguchiKenji InoueHisatoshi Saito
    • Takao NoguchiKenji InoueHisatoshi Saito
    • H01L29/76H01L29/94H01L31/062H01L31/113H01L31/119
    • H01L41/316H03H9/02149H03H9/174H03H9/175
    • The electronic device includes a substrate, a lower conductive film provided on the substrate, a functional film provided on the lower conductive film, and a crystallinity barrier film provided between the lower conductive film and the functional film. The present invention prevents the crystallinity of the functional film being affected by the crystallinity or the material selection of the lower conductive film, so it becomes possible to use a low-cost metal such as aluminum (Al) for the lower conductive film, and to use a low-cost method for forming the film, thereby making it possible to improve the crystallinity of the functional film without using a costly film-formation method such as epitaxial growth. For the crystallinity barrier film, there can be used a material having an amorphous structure.
    • 电子装置包括基板,设置在基板上的下导电膜,设置在下导电膜上的功能膜,以及设置在下导电膜和功能膜之间的结晶阻挡膜。 本发明防止功能膜的结晶性受到下导电膜的结晶性或材料选择的影响,因此可以使用低成本金属如铝(Al)作为下导电膜,以及 使用低成本的方法形成膜,从而可以在不使用诸如外延生长的昂贵的成膜方法的情况下提高功能膜的结晶度。 对于结晶阻挡膜,可以使用具有无定形结构的材料。