会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Solid-state imaging device, signal charge detection device, and camera
    • 固态成像装置,信号充电检测装置和相机
    • US07671386B2
    • 2010-03-02
    • US11617173
    • 2006-12-28
    • Toshihiro Kuriyama
    • Toshihiro Kuriyama
    • H01L27/148
    • H01L27/14831H01L29/76816H01L2924/0002H01L2924/00
    • The solid-state imaging device of the present invention includes: a floating diffusion capacity unit which is formed on a semiconductor substrate, and is operable to hold signal charges derived from incident light; an amplifier which is operable to convert the signal charges held in the floating diffusion capacity unit into a voltage; the first wire which connects the floating diffusion capacity unit to an input of the amplifier; and a second wire which is made of the same material as the first wire, formed in the same layer as the first wire, arranged around the first wire at least along long sides of the first wire, and electrically insulated from the first wire.
    • 本发明的固态成像装置包括:浮置扩散能量单元,其形成在半导体衬底上,并且可操作以保持源自入射光的信号电荷; 放大器,其可操作以将保持在所述浮动扩散容量单元中的信号电荷转换成电压; 将浮动扩散容量单元连接到放大器的输入端的第一线; 以及与第一线材相同的材料制成的第二线材,其形成在与第一线材相同的层中,至少沿着第一线材的长边布置在第一线材周围,并与第一线材电绝缘。
    • 4. 发明授权
    • Solid-state imaging device
    • 固态成像装置
    • US07473944B2
    • 2009-01-06
    • US11333924
    • 2006-01-18
    • Toshihiro Kuriyama
    • Toshihiro Kuriyama
    • H01L29/768
    • H01L27/1463H01L27/14636H01L27/14812
    • A solid-state imaging device includes a semiconductor substrate including: a plurality of light-receptive portions that are arranged one-dimensionally or two-dimensionally; a vertical transfer portion that transfers signal electric charge read out from the light-receptive portions in a vertical direction; a horizontal transfer portion that transfers the signal electric charge transferred by the vertical transfer portion in a horizontal direction; a barrier region adjacent to the horizontal transfer portion, the barrier region letting only surplus electric charge of the horizontal transfer portion pass therethough; a drain region adjacent to the barrier region, into which the surplus electric charge passing through the barrier region is discharged; and an insulation film adjacent to the drain region. A portion of the drain region is located beneath the insulation film.
    • 一种固态成像装置,包括:半导体基板,包括:一维或二维布置的多个光接收部分; 垂直传送部分,其沿垂直方向传送从光接收部分读出的信号电荷; 水平传送部,其在垂直方向上传送由垂直传送部传送的信号电荷; 与水平转印部分相邻的势垒区域,仅允许水平转印部分的剩余电荷的势垒区域通过; 与阻挡区域相邻的漏极区域,通过阻挡区域的剩余电荷被排出到该漏极区域; 以及与漏区相邻的绝缘膜。 漏极区域的一部分位于绝缘膜下方。
    • 8. 发明授权
    • Solid-state imaging device and manufacturing method therefor
    • US06351003B1
    • 2002-02-26
    • US09290122
    • 1999-04-12
    • Toshihiro Kuriyama
    • Toshihiro Kuriyama
    • H01L31103
    • H01L27/14689H01L27/14609
    • A solid-state imaging device comprises a plurality of pixels, each pixel comprising a semiconductor substrate of a first conductivity type; a photo-receiving portion of a second conductivity type formed in the semiconductor substrate; a detecting portion of the second conductivity type formed in the semiconductor substrate; an insulating film formed on the semiconductor substrate; a transfer gate electrode formed on the insulating film at lest between the photo-receiving portion and the detecting portion; and a read-out circuit, which is electrically connected to the detecting portion. A diffusion region of the same conductivity type as the detecting portion is formed in a region of the semiconductor substrate that is adjacent to an end of the detecting portion near the gate electrode and separate from the photo-receiving portion. An impurity concentration in the photo-receiving portion and an impurity concentration in the diffusion region are lower than an impurity concentration in the detecting portion. With this solid-state imaging device and with the method for producing the same, a solid-state imaging device is provided that reduces crystal defects in the photo-receiving portion and improves the output image quality.
    • 9. 发明授权
    • Spin-valve type thin film element and its manufacturing method
    • 旋转阀型薄膜元件及其制造方法
    • US06350487B1
    • 2002-02-26
    • US09515971
    • 2000-02-29
    • Naoya HasegawaToshihiro Kuriyama
    • Naoya HasegawaToshihiro Kuriyama
    • G11B566
    • B82Y25/00B82Y10/00B82Y40/00G01R33/093G11B5/3903G11B2005/3996H01F10/3268H01F41/302
    • A spin-valve type thin film element includes an antiferromagnetic layer, a pinned magnetic layer, a free magnetic layer, a non-magnetic electrically conductive layer, a bias layer, and an electrically conductive layer. The magnetization direction of the pinned magnetic layer in the end regions in relation to the track width is fixed in the direction of the leakage magnetic field from a recording medium, and the magnetization direction of the pinned magnetic layer in the central region is fixed in the direction inclined in relation to the direction of the leakage magnetic field from the recording medium. A method for manufacturing a spin-valve type thin film element includes the steps of forming a multi-layered film, magnetic annealing at a temperature T1, patterning the multi-layered film into a predetermined shape, forming a bias layer on both sides of the multi-layered film, magnetizing the bias layer, annealing without applying a magnetic field at a temperature T2, and magnetizing the bias layer.
    • 自旋阀型薄膜元件包括反铁磁层,钉扎磁性层,自由磁性层,非磁性导电层,偏置层和导电层。 端部区域中的钉扎磁性层相对于轨道宽度的磁化方向在来自记录介质的泄漏磁场的方向上固定,并且中心区域中的被钉扎磁性层的磁化方向固定在 相对于来自记录介质的泄漏磁场的方向倾斜的方向。 一种自旋阀型薄膜元件的制造方法包括以下步骤:在温度T1下形成多层膜,进行磁性退火,将多层膜图案化成预定的形状,在 多层膜,对偏置层进行磁化,在温度T2下不施加磁场进行退火,以及使偏置层磁化。