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    • 3. 发明申请
    • OPTICAL SEMICONDUCTOR DEVICE
    • 光学半导体器件
    • US20090261441A1
    • 2009-10-22
    • US12400346
    • 2009-03-09
    • Hisatada YasukawaHironari TakeharaTakaki Iwai
    • Hisatada YasukawaHironari TakeharaTakaki Iwai
    • H01L31/02H01L31/112
    • H01L31/103G11B7/13G11B2007/0006
    • An optical semiconductor device includes a light-receiving element on a semiconductor substrate of a first conductivity type, the light-receiving element including a light-receiving portion for converting incident light to an electrical current signal and performing a current amplification. The light-receiving portion includes: a semiconductor layer formed on the semiconductor substrate and having an impurity concentration substantially equal to or less than that of the semiconductor substrate; a first semiconductor region of a second conductivity type formed on the semiconductor layer and having an impurity concentration higher than that of the semiconductor layer; and a second semiconductor region of the first conductivity type selectively formed between the semiconductor substrate and the semiconductor layer and having an impurity concentration higher than those of the semiconductor substrate and the semiconductor layer.
    • 光学半导体器件包括在第一导电类型的半导体衬底上的光接收元件,该光接收元件包括用于将入射光转换成电流信号并执行电流放大的光接收部分。 光接收部分包括:形成在半导体衬底上并具有基本上等于或小于半导体衬底的杂质浓度的杂质浓度的半导体层; 在所述半导体层上形成的杂质浓度高于所述半导体层的杂质浓度的第二导电类型的第一半导体区域; 以及第一导电类型的第二半导体区域,其选择性地形成在半导体衬底和半导体层之间,并且具有比半导体衬底和半导体层的杂质浓度更高的杂质浓度。
    • 8. 发明授权
    • Optical semiconductor device and method for manufacturing the same
    • 光半导体装置及其制造方法
    • US07538404B2
    • 2009-05-26
    • US11489577
    • 2006-07-20
    • Tsutomu MiyajimaTakaki IwaiHisatada Yasukawa
    • Tsutomu MiyajimaTakaki IwaiHisatada Yasukawa
    • H01L31/058
    • H01L31/02165H01L27/1462
    • An optical semiconductor device includes a first light receiving region and a second light receiving region provided on a substrate and the first and second light receiving regions include light receiving elements, respectively. A first anti-reflection film is formed in the first light receiving region of the substrate and a second anti-reflection film is formed in the second light receiving region of the substrate. The reflectance of the first anti-reflection film for a first wavelength range of light is lower than the reflectance of the second anti-reflection film for the first wavelength range of light and the reflectance of the second anti-reflection film for a second wavelength range of light which is different from the first wavelength range of light is lower than the reflectance of the first anti-reflection film for the second wavelength range of light.
    • 光学半导体器件包括第一光接收区域和设置在衬底上的第二光接收区域,并且第一和第二光接收区域分别包括光接收元件。 第一防反射膜形成在基板的第一光接收区域中,并且第二防反射膜形成在基板的第二光接收区域中。 用于第一波长范围的第一抗反射膜的反射率低于第一波长范围的第二防反射膜的反射率和第二波长范围的第二防反射膜的反射率 与第一波长范围的光不同的光低于第二波长范围的第一防反射膜的反射率。
    • 9. 发明申请
    • Optical semiconductor device and method for manufacturing the same
    • 光半导体装置及其制造方法
    • US20070023770A1
    • 2007-02-01
    • US11489577
    • 2006-07-20
    • Tsutomu MiyajimaTakaki IwaiHisatada Yasukawa
    • Tsutomu MiyajimaTakaki IwaiHisatada Yasukawa
    • H01L33/00H01L29/18H01L31/00H01L31/0232
    • H01L31/02165H01L27/1462
    • An optical semiconductor device includes a first light receiving region and a second light receiving region provided on a substrate and the first and second light receiving regions include light receiving elements, respectively. A first anti-reflection film is formed in the first light receiving region of the substrate and a second anti-reflection film is formed in the second light receiving region of the substrate. The reflectance of the first anti-reflection film for a first wavelength range of light is lower than the reflectance of the second anti-reflection film for the first wavelength range of light and the reflectance of the second anti-reflection film for a second wavelength range of light which is different from the first wavelength range of light is lower than the reflectance of the first anti-reflection film for the second wavelength range of light.
    • 光学半导体器件包括第一光接收区域和设置在衬底上的第二光接收区域,并且第一和第二光接收区域分别包括光接收元件。 第一防反射膜形成在基板的第一光接收区域中,并且第二防反射膜形成在基板的第二光接收区域中。 用于第一波长范围的第一抗反射膜的反射率低于第一波长范围的第二防反射膜的反射率和第二波长范围的第二防反射膜的反射率 与第一波长范围的光不同的光低于第二波长范围的第一防反射膜的反射率。