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    • 2. 发明授权
    • Photomask material, photomask and methods for the production thereof
    • 光掩模材料,光掩模及其生产方法
    • US06303262B1
    • 2001-10-16
    • US09335176
    • 1999-06-17
    • Kazuchiyo TakaokaNoriyuki KawaiKenji Hyodo
    • Kazuchiyo TakaokaNoriyuki KawaiKenji Hyodo
    • G03C828
    • G03F1/54G03F7/07
    • Disclosed are a photomask material for preparing a photomask having excellent heat resistance, ultraviolet resistance and image strength, a photomask having the above properties and methods for the production thereof, and the present invention provides a photomask material, which comprises a glass substrate, a physical development nucleus layer and a photosensitive layer containing silver halide, the layers being consecutively formed on the transparent substrate, and a method for the production thereof, and a photomask, which comprises a transparent substrate, a physical development nucleus layer and a light shielding film formed of a predetermined pattern of a silver film derived from silver halide, the silver film being formed by the action of the physical development nucleus in said layer during development treatment, the physical development nucleus layer and the light shielding film being consecutively formed on the transparent substrate, and a method for the production thereof.
    • 公开了一种用于制备具有优异的耐热性,耐紫外线性和图像强度的光掩模的光掩模材料,具有上述性能的光掩模及其制备方法,本发明提供一种光掩模材料,其包括玻璃基板,物理显影 核层和含有卤化银的感光层,这些层连续地形成在透明基板上,以及其制造方法,以及光掩模,其包括透明基板,物理显影核心层和由 来自卤化银的银膜的预定图案,在显影处理期间在所述层中的物理显影核的作用形成银膜,物理显影核层和遮光膜连续地形成在透明基板上,以及 其制备方法。
    • 6. 发明授权
    • Electrophotographic photoreceptor with a carrier transport layer
containing a hydroquinone compound
    • 具有含氢氯化物化合物的载体运输层的电子照相光电子
    • US5171651A
    • 1992-12-15
    • US610578
    • 1990-11-08
    • Kazuchiyo TakaokaMakoto OkajiHideya Arisue
    • Kazuchiyo TakaokaMakoto OkajiHideya Arisue
    • C07D209/80C07D231/12G03G5/047G03G5/05G03G5/06
    • C07D209/80C07D231/12G03G5/047G03G5/0517G03G5/0521G03G5/067G03G5/0681
    • Disclosed is a double-layered type electrophotographic photoreceptor which comprises an electroconductive support and a carrier generation layer containing a pigment or a dye as a carrier generation material and a carrier transport layer which are provided on said support, wherein the carrier transport layer contains an organic low molecular weight carrier transport material, a binder resin, a hydroquinone compound represented by the following formula (II): ##STR1## wherein R.sup.7, R.sup.8, R.sup.9 and R.sup.10 each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, a carbamoyl group or an alkylthio group, and a compound represented by the following formula (III): ##STR2## wherein R.sup.11, R.sup.12, R.sup.13 and R.sup.14 each represents a hydrogen atom, a hydroxyl group, an alkyl group or an alkoxy group with a proviso that at least one of R.sup.11 -R.sup.14 is hydroxyl group, R.sup.15 and R.sup.16 each represents a hydrogen atom, an alkyl group or an alkenyl group and Z represents a group of atoms necessary to form a 2H-chromene skeleton, chroman skeleton or dihydrobenzofuran skeleton together with the benzene ring in the formula and the group of atoms may be further substituted.
    • 公开了一种双层型电子照相感光体,其包含导电性支持体和载体生成层,载体生成层含有作为载体生成材料的颜料或染料以及载体输送层,其载体输送层含有有机物 低分子载体转运材料,粘合剂树脂,下式(II)表示的氢醌化合物:其中R 7,R 8,R 9和R 10各自表示氢原子,卤素原子,烷基 ,芳基,烷氧基,氨基甲酰基或烷硫基,以及由下式(III)表示的化合物:其中R 11,R 12,R 13和R 14各自表示氢原子, 羟基,烷基或烷氧基,条件是R11-R14中的至少一个为羟基,R 15和R 16各自表示氢原子,烷基或烯基,Z表示 形成2H-色烯骨架所需的束,色醛骨架或二氢苯并呋喃骨架与式中的苯环和原子团可以进一步被取代。
    • 10. 发明授权
    • Photoreactive agent containing photoreactive semiconductor for removing harmful materials
    • 含光反应性半导体去除有害物质的光反应剂
    • US06346253B2
    • 2002-02-12
    • US08807701
    • 1997-02-28
    • Kazuchiyo TakaokaMichihiko SatoYoichiro AzumaYasuhiro Aizawa
    • Kazuchiyo TakaokaMichihiko SatoYoichiro AzumaYasuhiro Aizawa
    • A01N2500
    • A61L9/18A61L9/01B01D53/8678B01D2255/802B01J35/002B01J35/004B60H3/06B60H2003/0675B60H2003/0691
    • A photoreactive agent is provided for removing harmful materials which comprises a substrate and a layer containing a photoreactive semiconductor and organic fine particles coated with inorganic fine particles which is formed on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing organic fine particles coated with inorganic fine particles which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor and a layer containing film-forming inorganic fine particles and a water repellent which layers are formed in that order on at least one side of the substrate. A photoreactive agent is provided for removing harmful materials which comprises a substrate, a layer containing a photoreactive semiconductor, a layer containing film-forming inorganic fine particles and a layer containing a water repellent which layers are formed in that order on at least one side of the substrate. The photoreactive agents for removing harmful materials are excellent in ability to remove harmful materials such as malodor, are water-resistant, are not changed in characteristics over a long period of time, and can easily be produced.
    • 提供了一种光反应剂,用于去除有害材料,该有害材料包括基材和含有光反应性半导体的层和涂覆有无机细颗粒的有机细颗粒,其形成在基材的至少一侧上。 提供了一种光反应剂,用于除去有害材料,其包括基材,含有光反应性半导体的层和包含无机细颗粒的有机细颗粒层,该层在基材的至少一侧依次形成。 提供了一种光反应剂,用于除去基材,含有光反应性半导体的层和含有成膜无机细颗粒的层以及防水剂,该有害物质在基材的至少一侧依次形成。 提供了一种光反应剂,用于除去有害材料,该有害物质包括基材,含有光反应性半导体的层,含有成膜无机细颗粒的层和含有防水剂的层,该层在至少一个 底物。 用于除去有害物质的光反应性试剂在除去有害物质如恶臭的能力方面具有优异的性能,耐水性,长时间不变化的特性,并且可以容易地生产。