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    • 3. 发明申请
    • FUEL CELL
    • 燃料电池
    • US20090081486A1
    • 2009-03-26
    • US11915631
    • 2006-05-26
    • Shinya HigashiYasutada NakagawaTakahiro TeradaYuuichi Yoshida
    • Shinya HigashiYasutada NakagawaTakahiro TeradaYuuichi Yoshida
    • H01M8/00
    • H01M8/04201H01M8/023H01M8/0258H01M8/0263H01M8/04186H01M8/1011Y02E60/523
    • A fuel cell according to the invention includes: a fuel supply section including a diffusion section configured to diffuse fuel supplied from a fuel supply port in an in-plane direction and an aperture plate having a plurality of apertures configured to emit the fuel from the diffusion section; an oxygen introducing section configured to introduce oxygen from outside; and a power generating section configured to generate electric power by the fuel supplied from the fuel supply section and oxygen supplied from the oxygen introducing section. Aperture ratio of the plurality of apertures provided in the aperture plate has a substantially radial distribution in the in-plane direction such that the aperture ratio is small near the fuel supply port and increases with distance from the fuel supply port. This enables provision of a fuel cell of the spontaneous respiration type where fuel can be uniformly supplied to achieve efficient power generation.
    • 根据本发明的燃料电池包括:燃料供应部分,其包括扩散部分,其被配置为扩散从燃料供给口在面内方向供应的燃料;以及孔板,其具有多个孔,其被配置为从所述扩散发射燃料 部分; 氧气引入部,其构造成从外部引入氧; 以及发电部,被配置为通过从所述燃料供给部供给的燃料和从所述氧气导入部供给的氧来发电。 设置在孔板中的多个孔的孔径比在面内方向上具有基本上径向的分布,使得在燃料供给口附近开口率小,并且随着与燃料供给口的距离而增加。 这能够提供能够均匀地供应燃料以实现有效发电的自发呼吸型燃料电池。
    • 6. 发明申请
    • GRADATED PHOTOMASK AND ITS FABRICATION PROCESS
    • 分级光电及其制造工艺
    • US20090220867A1
    • 2009-09-03
    • US12066203
    • 2006-09-19
    • Junji FujikawaShu ShimadaYuuichi YoshidaShiho SasakiTsuyoshi AmanoKimio ItoNobuhito ToyamaHiroshi Mohri
    • Junji FujikawaShu ShimadaYuuichi YoshidaShiho SasakiTsuyoshi AmanoKimio ItoNobuhito ToyamaHiroshi Mohri
    • G03F1/00
    • G03F1/46G03F1/50
    • The invention provides a gradated photomask for reducing photolithography steps and its fabrication process, which make use of a generally available photomask blank, prevents the reflectance of a light shield film from growing high, makes alignment easy during the formation of a semitransparent film, and enables the semitransparent film on a light shield pattern with good step coverage. A photomask (100) comprises a mixture of a light shield area including a light shield film (114) having a desired pattern on a transparent substrate wherein a film forming the pattern is substantially opaque to photolithographic light, a semitransparent film (113) that transmits the photolithographic light at a desired transmittance, and the light shield film (114) and the semitransparent film (113) are stacked on the transparent substrate (101) in that order; a semi-transparent area wherein there is only the semitransparent film (113); and a transmissive area there is neither the light shield film (114) nor the semitransparent film (113), and is characterized in that the semitransparent film (113) has an antireflection function with respect to the photolithographic light.
    • 本发明提供了一种用于减少光刻步骤的渐变光掩模及其制造工艺,其使用通常可获得的光掩模坯料防止遮光膜的反射率增长,使得在形成半透明膜期间容易对准,并且使得能够 半透明薄膜在遮光罩上具有良好的台阶覆盖率。 光掩模(100)包括在透明基板上包括具有期望图案的遮光膜(114)的遮光区域的混合物,其中形成图案的膜对光刻光基本上不透明;透射膜(113),透射膜 所述透光性的光刻光以及遮光膜(114)和半透明膜(113)依次层叠在透明基板(101)上; 半透明区域,其中仅有半透明膜(113); 透光区域既不存在遮光膜(114)也不存在半透明膜(113),其特征在于,半透明膜(113)相对于光刻光具有防反射功能。
    • 9. 发明授权
    • Gradated photomask and its fabrication process
    • 分级光掩模及其制造工艺
    • US08124301B2
    • 2012-02-28
    • US12066203
    • 2006-09-19
    • Junji FujikawaShu ShimadaYuuichi YoshidaShiho SasakiTsuyoshi AmanoKimio ItoNobuhito ToyamaHiroshi Mohri
    • Junji FujikawaShu ShimadaYuuichi YoshidaShiho SasakiTsuyoshi AmanoKimio ItoNobuhito ToyamaHiroshi Mohri
    • G03F1/00G03F9/00
    • G03F1/46G03F1/50
    • The invention provides a gradated photomask for reducing photolithography steps and its fabrication process, which make use of a generally available photomask blank, prevents the reflectance of a light shield film from growing high, makes alignment easy during the formation of a semitransparent film, and enables the semi-transparent film on a light shield pattern with good step coverage. A photomask (100) comprises a mixture of a light shield area including a light shield film (114) having a desired pattern on a transparent substrate wherein a film forming the pattern is substantially opaque to photolithographic light, a semitransparent film (113) that transmits the photolithographic light at a desired transmittance, and the light shield film (114) and the semitransparent film (113) are stacked on the transparent substrate (101) in that order; a semi-transparent area wherein there is only the semitransparent film (113); and a transmissive area there is neither the light shield film (114) nor the semitransparent film (113), and is characterized in that the semitransparent film (113) has an antireflection function with respect to the photolithographic light.
    • 本发明提供了一种用于减少光刻步骤的渐变光掩模及其制造工艺,其使用通常可获得的光掩模坯料防止遮光膜的反射率增长,使得在形成半透明膜期间容易对准,并且使得能够 半透明薄膜在遮光罩上具有良好的台阶覆盖率。 光掩模(100)包括在透明基板上包括具有期望图案的遮光膜(114)的遮光区域的混合物,其中形成图案的膜对光刻光基本上不透明;透射膜(113),透射膜 所述透光性的光刻光以及遮光膜(114)和半透明膜(113)依次层叠在透明基板(101)上; 半透明区域,其中仅有半透明膜(113); 透光区域既不存在遮光膜(114)也不存在半透明膜(113),其特征在于,半透明膜(113)相对于光刻光具有防反射功能。