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    • 3. 发明授权
    • Method of manufacturing a photovoltaic device
    • 制造光伏器件的方法
    • US06365431B1
    • 2002-04-02
    • US09722736
    • 2000-11-28
    • Nobuo HanehiraYoshinori WakamiyaHidekazu ShutoHiroyuki MoriMasayoshi OnoWataru ShinoharaYasuaki Yamamoto
    • Nobuo HanehiraYoshinori WakamiyaHidekazu ShutoHiroyuki MoriMasayoshi OnoWataru ShinoharaYasuaki Yamamoto
    • H01L2100
    • H01L31/022466H01L31/02164
    • This invention manufactures a photovoltaic device by the following process steps: a step to form a first electrode layer and a light-active semiconductor layer on an insulating surface of the substrate; a step to form a transparent conducting film over most of the insulating surface including the light-active semiconductor layer; a step to establish a patterned transparent protective layer on the transparent conducting film over power generating regions; and a step to irradiate ultraviolet laser light over most of the substrate to remove exposed portions of the transparent conducting film not masked by the pattered transparent protective layer and form a transparent conducting layer corresponding to the pattered transparent protective layer. The patterned transparent protective layer serves a dual purpose as masking material for removing the specified areas of the transparent conducting film by ultraviolet laser and as a transparent protective layer. Accordingly, material that is passed by visible light but not passed by ultraviolet light is used as the patterned transparent protective layer.
    • 本发明通过以下工艺步骤制造光伏器件:在衬底的绝缘表面上形成第一电极层和光活性半导体层的步骤; 在包括所述光活性半导体层的所述绝缘表面的大部分上形成透明导电膜的步骤; 在发光区域上的透明导电膜上形成图案化的透明保护层的步骤; 以及在大部分基板上照射紫外线激光的步骤,以去除未被图案透明保护层未掩蔽的透明导电膜的暴露部分,并形成对应于图案化的透明保护层的透明导电层。 图案化的透明保护层用作用于通过紫外线激光去除透明导电膜的指定区域并作为透明保护层的掩模材料的双重目的。 因此,使用通过可见光而不被紫外线通过的材料用作图案化的透明保护层。