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1. 发明申请

US20130134622A1 Resin Mold, Production Method Thereof, and Use Thereof 有权
标题翻译：树脂模具及其生产方法及其应用
公开(公告)号：US20130134622A1
公开(公告)日：2013-05-30
申请号：US13814310
申请日：2011-08-03
申请人： Satoshi Uehara , Takahide Mizawa
发明人： Satoshi Uehara , Takahide Mizawa
IPC分类号： B29C59/00
CPC分类号： B29C59/002 , B29C33/40 , B29C33/424 , B29C33/62 , B29C43/003 , B29C43/08 , B29C43/085 , B29C59/026 , B29C59/046 , B29C2043/023 , B29C2043/025 , B29C2059/023 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y99/00 , G03F7/0002
摘要： A resin mold includes a resin layer having a depressions and protrusions pattern formed in the surface thereof, and a release layer including a mold release agent and formed of uniform thickness on at least the depressions and protrusions pattern of the aforementioned resin layer. The aforementioned resin layer has a solvent soluble resin, and an additive that has bleeding ability with respect to the solvent soluble resin, has a substituent group capable of coupling with the aforementioned mold release agent, and has a substituent group having compatibility with the aforementioned solvent soluble resin. The aforementioned additive is localized in the vicinity of the aforementioned resin layer surface. The group of the additive capable of coupling with the mold release agent condenses with the aforementioned mold release agent so that the aforementioned resin layer and release layer are bonded together.
摘要翻译：树脂模具包括在其表面上形成有凹陷和突起图案的树脂层和至少在上述树脂层的凹凸部图案上形成均匀厚度的脱模剂的剥离层。上述树脂层具有溶剂可溶性树脂，并且相对于溶剂可溶性树脂具有渗透性的添加剂具有能够与上述脱模剂结合的取代基，并且具有与上述溶剂相容的取代基可溶性树脂。上述添加剂位于上述树脂层表面附近。能够与脱模剂结合的添加剂组与上述脱模剂凝结，使上述树脂层和剥离层结合在一起。

2. 发明授权

US09393737B2 Resin mold for nanoimprinting 有权
标题翻译：用于纳米压印的树脂模具
公开(公告)号：US09393737B2
公开(公告)日：2016-07-19
申请号：US13814298
申请日：2011-08-03
申请人： Satoshi Uehara , Takahide Mizawa
发明人： Satoshi Uehara , Takahide Mizawa
IPC分类号： B29C59/02 , B29C33/40 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C33/38
CPC分类号： B29C59/02 , B29C33/38 , B29C33/40 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Disclosed is a resin mold for nanoimprinting, which has a resin layer having fine depressions and protrusions formed on the surface, wherein the resin layer is formed from 1 to 49 parts by weight of a silicone-based macromonomer and/or a fluorine-based macromonomer and 99 to 51 parts by weight of at least one polymerizable monomer selected from the group consisting of a (meth)acrylic monomer, a styrene-based monomer, an epoxy-based monomer, an olefin-based monomer and a polycarbonate-based resin-forming monomer. The silicone-based macromonomer and/or the fluorine-based macromonomer has a molecular weight of 600 to 10000 and has, at an end of molecule, a reactive group copolymerizable with the polymerizable monomer, and when the reactive group is copolymerized with the polymerizable group, silicone-based units or fluorine-based units that constitute the macromonomer form side chains on a trunk polymer formed from the polymerizable monomer and the macromonomer.
摘要翻译：公开了一种用于纳米压印的树脂模具，其具有在表面上形成有细小凹陷和突起的树脂层，其中树脂层由1至49重量份的硅氧烷基大分子单体和/或氟基大分子单体形成和99〜51重量份的选自（甲基）丙烯酸单体，苯乙烯系单体，环氧类单体，烯烃系单体和聚碳酸酯系树脂组合物中的至少一种以上的聚合性单体，形成单体。硅氧烷类大分子单体和/或氟系大分子单体的分子量为600〜10000，在分子末端具有与可聚合单体共聚的反应性基团，当反应性基团与可聚合基团共聚时构成大分子单体的硅酮单元或氟系单体在由聚合性单体和大分子单体形成的树干聚合物上形成侧链。

3. 发明授权

US09354512B2 Resin mold for imprinting and method for producing the same 有权
标题翻译：用于压印的树脂模具及其制造方法
公开(公告)号：US09354512B2
公开(公告)日：2016-05-31
申请号：US13389138
申请日：2010-08-06
申请人： Takahide Mizawa , Satoshi Uehara
发明人： Takahide Mizawa , Satoshi Uehara
IPC分类号： B29C59/02 , G03F7/00 , B29C33/56 , B82Y10/00 , B82Y40/00 , G03F7/11 , B29C33/60 , B29C33/40 , B29C33/42
CPC分类号： G03F7/0002 , B29C33/40 , B29C33/424 , B29C33/56 , B29C33/60 , B82Y10/00 , B82Y40/00 , G03F7/11
摘要： Provided is a resin mold for imprinting which is free from transfer defects, has excellent releasability from a resin subjected to imprinting, and does not cause any defect by imprinting. The resin mold for imprinting includes a resin layer having a recessed and projected pattern surface, an inorganic material layer formed with a uniform thickness on at least the recessed and projected pattern surface of the resin layer, and a release agent layer formed with a uniform thickness on at least the recessed and projected pattern surface of the inorganic material layer.
摘要翻译：提供一种没有转印缺陷的用于压印的树脂模具，具有优良的脱模性，并且不会产生任何压印缺陷。用于压印的树脂模具包括具有凹凸投影图案表面的树脂层，至少在树脂层的凹凸图案表面上形成均匀厚度的无机材料层和形成均匀厚度的脱模剂层至少在无机材料层的凹入和突出的图案表面上。

4. 发明申请

US20120133077A1 Resin Mold for Imprinting and Method for Producing the Same 有权
标题翻译：用于印刷的树脂模具及其制造方法
公开(公告)号：US20120133077A1
公开(公告)日：2012-05-31
申请号：US13389138
申请日：2010-08-06
申请人： Takahide Mizawa , Satoshi Uehara
发明人： Takahide Mizawa , Satoshi Uehara
IPC分类号： B29C59/02 , B29C33/58
CPC分类号： G03F7/0002 , B29C33/40 , B29C33/424 , B29C33/56 , B29C33/60 , B82Y10/00 , B82Y40/00 , G03F7/11
摘要： Provided is a resin mold for imprinting which is free from transfer defects, has excellent releasability from a resin subjected to imprinting, and does not cause any defect by imprinting. The resin mold for imprinting includes a resin layer having a recessed and projected pattern surface, an inorganic material layer formed with a uniform thickness on at least the recessed and projected pattern surface of the resin layer, and a release agent layer formed with a uniform thickness on at least the recessed and projected pattern surface of the inorganic material layer.
摘要翻译：提供一种没有转印缺陷的用于压印的树脂模具，具有优良的脱模性，并且不会产生任何压印缺陷。用于压印的树脂模具包括具有凹凸投影图案表面的树脂层，至少在树脂层的凹凸图案表面上形成均匀厚度的无机材料层和形成均匀厚度的脱模剂层至少在无机材料层的凹入和突出的图案表面上。

5. 发明授权

US09511535B2 Resin mold, production method thereof, and use thereof 有权
标题翻译：树脂模具及其制造方法及其用途
公开(公告)号：US09511535B2
公开(公告)日：2016-12-06
申请号：US13814310
申请日：2011-08-03
申请人： Satoshi Uehara , Takahide Mizawa
发明人： Satoshi Uehara , Takahide Mizawa
IPC分类号： B29C59/02 , B29C33/42 , B29C33/44 , B29C33/62 , B29C59/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C43/08 , B29C43/02 , B29C43/00 , B29C59/04 , B82Y30/00 , B82Y99/00 , B29C33/40
CPC分类号： B29C59/002 , B29C33/40 , B29C33/424 , B29C33/62 , B29C43/003 , B29C43/08 , B29C43/085 , B29C59/026 , B29C59/046 , B29C2043/023 , B29C2043/025 , B29C2059/023 , B82Y10/00 , B82Y30/00 , B82Y40/00 , B82Y99/00 , G03F7/0002
摘要： A resin mold includes a resin layer having a depressions and protrusions pattern formed in the surface thereof, and a release layer including a mold release agent and formed of uniform thickness on at least the depressions and protrusions pattern of the aforementioned resin layer. The aforementioned resin layer has a solvent soluble resin, and an additive that has bleeding ability with respect to the solvent soluble resin, has a substituent group capable of coupling with the aforementioned mold release agent, and has a substituent group having compatibility with the aforementioned solvent soluble resin. The aforementioned additive is localized in the vicinity of the aforementioned resin layer surface. The group of the additive capable of coupling with the mold release agent condenses with the aforementioned mold release agent so that the aforementioned resin layer and release layer are bonded together.
摘要翻译：树脂模具包括在其表面上形成有凹陷和突起图案的树脂层和至少在上述树脂层的凹凸部图案上形成均匀厚度的脱模剂的剥离层。上述树脂层具有溶剂可溶性树脂，并且相对于溶剂可溶性树脂具有渗透性的添加剂具有能够与上述脱模剂结合的取代基，并且具有与上述溶剂相容的取代基可溶性树脂。上述添加剂位于上述树脂层表面附近。能够与脱模剂结合的添加剂组与上述脱模剂凝结，使上述树脂层和剥离层结合在一起。

6. 发明申请

US20130136818A1 Resin Mold for Nanoimprinting 有权
标题翻译：用于纳米压印的树脂模具
公开(公告)号：US20130136818A1
公开(公告)日：2013-05-30
申请号：US13814298
申请日：2011-08-03
申请人： Satoshi Uehara , Takahide Mizawa
发明人： Satoshi Uehara , Takahide Mizawa
IPC分类号： B29C59/02
CPC分类号： B29C59/02 , B29C33/38 , B29C33/40 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Disclosed is a resin mold for nanoimprinting, which has a resin layer having fine depressions and protrusions formed on the surface and is characterized in that the resin layer is formed from 1 to 49 parts by weight of a silicone-based macromonomer and/or a fluorine-based macromonomer and 99 to 51 parts by weight of at least one polymerizable monomer selected from the group consisting of a (meth)acrylic monomer, a styrene-based monomer, an epoxy-based monomer, an olefin-based monomer and a polycarbonate-based resin-forming monomer, the silicone-based macromonomer and/or the fluorine-based macromonomer has a molecular weight of 600 to 10000 and has, at an end of molecule, a reactive group copolymerizable with the polymerizable monomer, and when the reactive group is copolymerized with the polymerizable group, silicone-based units or fluorine-based units that constitute the macromonomer form side chains on a trunk polymer formed from the polymerizable monomer and the macromonomer.
摘要翻译：公开了一种用于纳米压印的树脂模具，其具有在表面上形成有细凹部和突起的树脂层，其特征在于，树脂层由1〜49重量份的硅氧烷系大分子单体和/或氟的至少一种选自（甲基）丙烯酸单体，苯乙烯类单体，环氧类单体，烯烃类单体和聚碳酸酯单体的至少一种可聚合单体，基于硅氧烷的树脂形成单体，所述硅氧烷类大分子单体和/或所述氟系大分子单体的分子量为600〜10000，在分子末端具有与所述聚合性单体共聚的反应性基团，与由可聚合单体和大分子单体形成的树干聚合物构成大分子单体形成侧链的可聚合基团，硅酮基单元或氟基单元共聚。

7. 发明申请

US20130127090A1 Resin Mold for Nanoimprinting and Production Method Thereof 有权
标题翻译：纳米压印用树脂模具及其制作方法
公开(公告)号：US20130127090A1
公开(公告)日：2013-05-23
申请号：US13814325
申请日：2011-08-03
申请人： Hiroko Yamada , Takahide Mizawa
发明人： Hiroko Yamada , Takahide Mizawa
IPC分类号： B29C59/00
CPC分类号： B29C59/005 , B29C33/40 , B29C33/424 , B29C33/56 , B29C2033/426 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin mold for nanoimprinting of the has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10−4 to 4.0×10−2.
摘要翻译：用于纳米压印的树脂模具具有基板，树脂层形成在基板上，并且在表面上具有凹凸和突起图案，在至少具有凹凸和突起图案的表面上形成均匀厚度的无机物质层树脂层和至少具有无机物层的凹凸的表面的均匀厚度形成的脱模剂层。树脂层的树脂包含相对于总构成单位为1〜50％的含环氧基的不饱和化合物的结构单元，环氧值为7.0×10 -4〜4.0×10 -2。

8. 发明授权

US09713900B2 Resin mold for nanoimprinting and production method thereof 有权
公开(公告)号：US09713900B2
公开(公告)日：2017-07-25
申请号：US13814325
申请日：2011-08-03
申请人： Hiroko Yamada , Takahide Mizawa
发明人： Hiroko Yamada , Takahide Mizawa
IPC分类号： B29C59/00 , B29C59/02 , B29C33/40 , B29C33/56 , B82Y10/00 , B82Y40/00 , G03F7/00 , B29C33/42
CPC分类号： B29C59/005 , B29C33/40 , B29C33/424 , B29C33/56 , B29C2033/426 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A resin mold for nanoimprinting has a substrate, a resin layer formed upon the substrate and having a depressions and protrusions pattern on a surface, an inorganic substance layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the resin layer, and a mold release agent layer formed of uniform thickness on at least the surface having the depressions and protrusions pattern of the inorganic substance layer. The resin of the resin layer includes constituent units derived from an epoxy group-containing unsaturated compound at a concentration of 1 to 50 percent relative to total constituent units, and the epoxy value is 7.0×10−4 to 4.0×10−2.

9. 发明申请

US20140099474A1 Nanoimprint Mold and Curved Surface Body 审中-公开
标题翻译：纳米压印模具和弯曲表面体
公开(公告)号：US20140099474A1
公开(公告)日：2014-04-10
申请号：US14118360
申请日：2012-05-15
申请人： Takanori Takahashi , Hiroko Yamada , Takahide Mizawa , Ryota Kojima
发明人： Takanori Takahashi , Hiroko Yamada , Takahide Mizawa , Ryota Kojima
IPC分类号： B29C33/42
CPC分类号： B29C33/424 , B29C33/405 , B29K2883/00 , G03F7/0002 , Y10T428/24479
摘要： A nanoimprint mold for a curved surface is provided and includes a silicone rubber elastic body having an Hs rubber hardness, in the case of a thickness of 250 μm, of 10 to 55 and includes fine depressions and protrusions formed on the surface. According to the nanoimprint mold for a curved surface, a nanoimprint can be formed even on a curved surface.
摘要翻译：提供了一种用于弯曲表面的纳米压印模具，并且包括在厚度为250μm的情况下具有Hs橡胶硬度的10-55的硅橡胶弹性体，并且包括在表面上形成的细小的凹凸和凸起。根据用于弯曲表面的纳米压印模具，甚至可以在弯曲表面上形成纳米压印。

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