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    • 6. 发明申请
    • Composite Wafer Semiconductor
    • 复合晶片半导体
    • US20130307095A1
    • 2013-11-21
    • US13957875
    • 2013-08-02
    • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    • Bruce C.S. Chou
    • B81B7/00
    • B81B7/0032B81B2201/025B81C1/00246B81C2203/0109B81C2203/0714H01L2224/83805
    • A composite wafer semiconductor device includes a first wafer and a second wafer. The first wafer has a first side and a second side, and the second side is substantially opposite the first side. The composite wafer semiconductor device also includes an isolation set is formed on the first side of the first wafer and a free space is etched in the isolation set. The second wafer is bonded to the isolation set. A floating structure, such as an inertia sensing device, is formed in the second wafer over the free space. In an embodiment, a surface mount pad is formed on the second side of the first wafer. Then, the floating structure is electrically coupled to the surface mount pad using a through silicon via (TSV) conductor.
    • 复合晶片半导体器件包括第一晶片和第二晶片。 第一晶片具有第一侧和第二侧,第二侧基本上与第一侧相对。 复合晶片半导体器件还包括在第一晶片的第一侧上形成隔离组件,并且在隔离组件中蚀刻自由空间。 第二个晶片结合到隔离组件上。 在自由空间中的第二晶片中形成诸如惯性感测装置的浮动结构。 在一个实施例中,表面安装焊盘形成在第一晶片的第二侧上。 然后,使用硅通孔(TSV)导体将浮动结构电耦合到表面安装焊盘。