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    • 6. 发明申请
    • METHOD OF MANUFACTURING ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY DEVICE
    • 制造液晶显示装置的阵列基板的方法
    • US20130109114A1
    • 2013-05-02
    • US13563917
    • 2012-08-01
    • Ju-Ran LeeJeong-Yun LeeHang-Sup ChoDoo-Hee Jang
    • Ju-Ran LeeJeong-Yun LeeHang-Sup ChoDoo-Hee Jang
    • H01L33/42
    • H01L27/124G02F1/134363
    • A method of manufacturing an array substrate for a liquid crystal display device includes forming gate and data lines crossing each other on a substrate; forming a thin film transistor connected to the gate and data lines; forming a passivation layer on the substrate having the gate lines, data lines and the thin film transistor; forming a first conductive material layer on the passivation layer and connected to a drain electrode of the thin film transistor; oxidizing a surface of the first conductive material layer; forming a second conductive material layer on the oxidized first conductive material layer; forming a photoresist pattern on the second conductive material layer; etching the first and second conductive material layers using the photoresist pattern to form pixel and common electrodes which are alternately arranged in the pixel region and produces an in-plane electric field; and removing the photoresist pattern.
    • 制造液晶显示装置用阵列基板的方法包括:在基板上形成彼此交叉的栅极和数据线; 形成连接到栅极和数据线的薄膜晶体管; 在具有栅极线,数据线和薄膜晶体管的衬底上形成钝化层; 在所述钝化层上形成第一导电材料层并连接到所述薄膜晶体管的漏电极; 氧化第一导电材料层的表面; 在氧化的第一导电材料层上形成第二导电材料层; 在所述第二导电材料层上形成光致抗蚀剂图案; 使用光致抗蚀剂图案蚀刻第一和第二导电材料层以形成交替排列在像素区域中并产生平面内电场的像素和公共电极; 并去除光致抗蚀剂图案。
    • 8. 发明授权
    • Method of manufacturing array substrate for liquid crystal display device
    • 制造液晶显示装置用阵列基板的方法
    • US08647902B2
    • 2014-02-11
    • US13563917
    • 2012-08-01
    • Ju-Ran LeeJeong-Yun LeeHang-Sup ChoDoo-Hee Jang
    • Ju-Ran LeeJeong-Yun LeeHang-Sup ChoDoo-Hee Jang
    • H01L21/00H01L21/84G02F1/1343H01J9/24H01L29/04H01L29/10
    • H01L27/124G02F1/134363
    • A method of manufacturing an array substrate for a liquid crystal display device includes forming gate and data lines crossing each other on a substrate; forming a thin film transistor connected to the gate and data lines; forming a passivation layer on the substrate having the gate lines, data lines and the thin film transistor; forming a first conductive material layer on the passivation layer and connected to a drain electrode of the thin film transistor; oxidizing a surface of the first conductive material layer; forming a second conductive material layer on the oxidized first conductive material layer; forming a photoresist pattern on the second conductive material layer; etching the first and second conductive material layers using the photoresist pattern to form pixel and common electrodes which are alternately arranged in the pixel region and produces an in-plane electric field; and removing the photoresist pattern.
    • 制造液晶显示装置用阵列基板的方法包括:在基板上形成彼此交叉的栅极和数据线; 形成连接到栅极和数据线的薄膜晶体管; 在具有栅极线,数据线和薄膜晶体管的衬底上形成钝化层; 在所述钝化层上形成第一导电材料层并连接到所述薄膜晶体管的漏电极; 氧化第一导电材料层的表面; 在氧化的第一导电材料层上形成第二导电材料层; 在所述第二导电材料层上形成光致抗蚀剂图案; 使用光致抗蚀剂图案蚀刻第一和第二导电材料层以形成交替排列在像素区域中并产生平面内电场的像素和公共电极; 并去除光致抗蚀剂图案。