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    • 10. 发明申请
    • NITRIDE SEMICONDUCTOR DEVICE
    • 氮化物半导体器件
    • US20090146132A1
    • 2009-06-11
    • US12188698
    • 2008-08-08
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • H01L33/00
    • H01L33/32B82Y10/00B82Y20/00H01L33/06
    • There is provided a nitride semiconductor device including: an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and an active layer formed between the n-type and p-type nitride semiconductor layers, the active layer including a plurality of quantum well layers and at least one quantum barrier layer deposited alternately with each other, wherein the active layer includes a first quantum well layer, a second quantum well layer formed adjacent to the first quantum well layer toward the p-type nitride semiconductor layer and having a quantum level higher than a quantum level of the first quantum well layer, and a tunneling quantum barrier layer formed between the first and second quantum well layers and having a thickness enabling a carrier to be tunneled therethrough.
    • 提供了一种氮化物半导体器件,包括:n型氮化物半导体层; p型氮化物半导体层; 以及形成在所述n型和p型氮化物半导体层之间的有源层,所述有源层包括彼此交替沉积的多个量子阱层和至少一个量子势垒层,其中所述有源层包括第一量子阱 层,与第一量子阱层相邻形成朝向p型氮化物半导体层并且具有高于第一量子阱层的量子级的量子级的第二量子阱层,以及形成在第一量子阱层之间的隧穿量子势垒层 和第二量子阱层,并且具有能够使载体穿过其的厚度。