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    • 3. 发明申请
    • THERMOELECTRIC ELEMENT
    • 热电元件
    • US20130146114A1
    • 2013-06-13
    • US13610981
    • 2012-09-12
    • Moon Gyu JANG
    • Moon Gyu JANG
    • H01L35/28
    • H01L35/32
    • Disclosed is a thermoelectric element capable of being easily fabricated by employing a semiconductor CMOS process, and improving the thermoelectric efficiency by reducing thermal conductivity while improving electric conductivity between a heat absorption part and a heat emission unit. The thermoelectric element according to an exemplary embodiment of the present disclosure includes a common electrode configured to absorb heat; a first electrode and a second electrode formed on an identical plane to a plane of the common electrode and configured to emit heat; an N-leg connected between the common electrode and the first electrode and configured to supply electrons; and a P-leg connected between the common electrode and the second electrode and configured to supply holes, in which a barrier material for suppressing thermal conduction between the common electrode and the first and second electrodes is formed in the N-leg and the P-leg.
    • 公开了一种能够通过采用半导体CMOS工艺容易地制造的热电元件,并且通过降低热导率同时改善吸热部分和发热单元之间的导电性来提高热电效率。 根据本公开的示例性实施例的热电元件包括​​构造成吸收热量的公共电极; 第一电极和第二电极,形成在与公共电极的平面相同的平面上并且被配置为发热; 连接在所述公共电极和所述第一电极之间并被配置为提供电子的N脚; 以及连接在所述公共电极和所述第二电极之间并被配置为提供空穴的P腿,其中在所述N腿和所述P-腿中形成用于抑制所述公共电极与所述第一和第二电极之间的热传导的阻挡材料, 腿。
    • 4. 发明申请
    • SCHOTTKY BARRIER TUNNEL TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
    • 肖特基BARRIER隧道晶体管及其制造方法
    • US20090215232A1
    • 2009-08-27
    • US12434779
    • 2009-05-04
    • Yark Yeon KIMSeong Jae LEEMoon Gyu JANGChel Jong CHOIMyung Sim JUNByoung Chul PARK
    • Yark Yeon KIMSeong Jae LEEMoon Gyu JANGChel Jong CHOIMyung Sim JUNByoung Chul PARK
    • H01L21/338
    • H01L29/47H01L29/458H01L29/4908H01L29/66545H01L29/66772H01L29/7839
    • Provided are a Schottky barrier tunnel transistor and a method of manufacturing the same that are capable of minimizing leakage current caused by damage to a gate sidewall of the Schottky barrier tunnel transistor using a Schottky tunnel barrier naturally formed at a semiconductor-metal junction as a tunnel barrier. The method includes the steps of: forming a semiconductor channel layer on an insulating substrate; forming a dummy gate on the semiconductor channel layer; forming a source and a drain at both sides of the dummy gate on the insulating substrate; removing the dummy gate; forming an insulating layer on a sidewall from which the dummy gate is removed; and forming an actual gate in a space from which the dummy gate is removed. In manufacturing the Schottky barrier tunnel transistor using the dummy gate, it is possible to form a high-k dielectric gate insulating layer and a metal gate, and stable characteristics in silicidation of the metal layer having very strong reactivity can be obtained.
    • 提供了一种肖特基势垒隧道晶体管及其制造方法,该晶体管能够使用在半导体 - 金属结上自然形成的肖特基隧道势垒作为隧道来最小化对肖特基势垒隧道晶体管的栅极侧壁的损坏所造成的漏电流 屏障。 该方法包括以下步骤:在绝缘基板上形成半导体沟道层; 在半导体沟道层上形成虚拟栅极; 在绝缘基板上的虚拟栅极的两侧形成源极和漏极; 去除虚拟门; 在去除所述伪栅极的侧壁上形成绝缘层; 并且在从其中去除虚拟栅极的空间中形成实际栅极。 在使用伪栅极制造肖特基势垒隧道晶体管时,可以形成高k电介质栅极绝缘层和金属栅极,并且可以获得具有非常强反应性的金属层的硅化物的稳定特性。