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1. 发明授权

US6113705A High-speed rotational vapor deposition apparatus and high-speed rotational vapor deposition thin film method 有权
标题翻译：高速旋转蒸镀装置和高速旋转蒸镀薄膜法
公开(公告)号：US6113705A
公开(公告)日：2000-09-05
申请号：US137298
申请日：1998-08-20
申请人： Tadashi Ohashi , Katuhiro Chaki , Ping Xin , Tatsuo Fujii , Katsuyuki Iwata , Shinichi Mitani , Takaaki Honda , Yuusuke Sato
发明人： Tadashi Ohashi , Katuhiro Chaki , Ping Xin , Tatsuo Fujii , Katsuyuki Iwata , Shinichi Mitani , Takaaki Honda , Yuusuke Sato
IPC分类号： C30B25/14 , C23C16/44 , C23C16/455 , C23C16/458 , H01L21/205 , C23C16/00
CPC分类号： C23C16/45565 , C23C16/4401 , C23C16/455 , C23C16/4584
摘要： There is provided a vapor deposition apparatus for forming a thin film which includes plural reaction gas supply ports at the top portion of a hollow reactor, an exhaust port at the bottom of the reactor, a rotational substrate holder provided inside the reactor on which a wafer substrate is mounted. A straightening vane having plural gas holes formed therein is provided on an upper portion of the reactor. The reactor is partitioned into upper and lower portions which have different inside diameters, with the inner diameter of the upper portion being smaller than the inner diameter of lower portion. The lower end of the upper portion and the upper end of the lower portion are linked by a linking portion which has a predetermined shape to make continuous the hollow inside of the reactor. A thin film is formed on the surface of a wafer substrate, which is placed on the rotational substrate holder, by supplying a reaction gas into the reactor.
摘要翻译：提供了一种用于形成薄膜的气相沉积装置，该薄膜在中空反应器的顶部包括多个反应气体供给口，反应器底部的排气口，设置在反应器内部的旋转基板保持器，衬底安装。在反应器的上部设置有形成有多个气孔的矫直叶片。反应器被分隔成具有不同内径的上部和下部，上部的内径小于下部的内径。上部的下端和下部的上端通过具有预定形状的连接部连接以使反应器的中空内部连续。通过将反应气体供应到反应器中，在放置在旋转基板保持器上的晶片基板的表面上形成薄膜。

2. 发明申请

US20130036968A1 FILM-FORMING APPARATUS AND METHOD 有权
标题翻译：成膜装置和方法
公开(公告)号：US20130036968A1
公开(公告)日：2013-02-14
申请号：US13568872
申请日：2012-08-07
申请人： Kunihiko Suzuki , Shinichi Mitani , Yuusuke Sato
发明人： Kunihiko Suzuki , Shinichi Mitani , Yuusuke Sato
IPC分类号： C30B25/12 , C30B25/14 , C30B25/16 , C23C16/44 , C30B25/10
CPC分类号： C30B29/06 , C23C16/4411 , C23C16/45565 , C23C16/45589 , C30B25/12
摘要： A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas, a cylindrical shaped liner provided in the film-forming chamber, a straightening vane provided above the liner for the reaction gas to pass through, wherein the outside of the film-forming chamber connects the inside of the liner via a substrate transfer portion provided at the wall of the film-forming chamber by moving the straightening vane from the position that the straightening vane closes the upper opening of the liner. A substrate supporting portion provided in the liner, for supporting the substrate before the film-forming to move the substrate in a vertical direction, a substrate transfer unit capable of moving inside the film-forming chamber through the substrate transfer portion, wherein the substrate is transferred between the substrate supporting portion and the substrate transfer unit.
摘要翻译：一种成膜装置和方法，包括：用于提供反应气体的成膜室，设置在成膜室中的圆柱形衬垫，设置在衬套上方的用于反应气体通过的矫直叶片，其中外部成膜室通过从整形叶片封闭衬垫的上部开口的位置移动矫直叶片，通过设置在成膜室的壁处的衬底转移部分来连接衬里的内部。一种基板支撑部分，其设置在所述衬垫中，用于在成膜之前支撑所述基板以在垂直方向上移动所述基板;基板转移单元，其能够通过所述基板转移部分在所述成膜室内移动，其中所述基板为在衬底支撑部分和衬底转移单元之间转移。

3. 发明授权

US09194056B2 Film-forming apparatus and method 有权
标题翻译：成膜装置及方法
公开(公告)号：US09194056B2
公开(公告)日：2015-11-24
申请号：US13568872
申请日：2012-08-07
申请人： Kunihiko Suzuki , Shinichi Mitani , Yuusuke Sato
发明人： Kunihiko Suzuki , Shinichi Mitani , Yuusuke Sato
IPC分类号： C30B23/02 , C30B29/06 , C30B25/12 , C23C16/44 , C23C16/455
CPC分类号： C30B29/06 , C23C16/4411 , C23C16/45565 , C23C16/45589 , C30B25/12
摘要： A film-forming apparatus and method comprising a film-forming chamber for supplying a reaction gas, a cylindrical shaped liner provided in the film-forming chamber, a straightening vane provided above the liner for the reaction gas to pass through, wherein the outside of the film-forming chamber connects the inside of the liner via a substrate transfer portion provided at the wall of the film-forming chamber by moving the straightening vane from the position that the straightening vane closes the upper opening of the liner. A substrate supporting portion provided in the liner, for supporting the substrate before the film-forming to move the substrate in a vertical direction, a substrate transfer unit capable of moving inside the film-forming chamber through the substrate transfer portion, wherein the substrate is transferred between the substrate supporting portion and the substrate transfer unit.
摘要翻译：一种成膜装置和方法，包括：用于提供反应气体的成膜室，设置在成膜室中的圆柱形衬垫，设置在衬套上方的用于反应气体通过的矫直叶片，其中外部成膜室通过从整形叶片封闭衬垫的上部开口的位置移动矫直叶片，通过设置在成膜室的壁处的衬底转移部分来连接衬里的内部。一种基板支撑部分，其设置在所述衬垫中，用于在成膜之前支撑所述基板以在垂直方向上移动所述基板;基板转移单元，其能够通过所述基板转移部分在所述成膜室内移动，其中所述基板为在衬底支撑部分和衬底转移单元之间转移。

4. 发明授权

US5897710A Substrate processing apparatus and substrate processing method 失效
标题翻译：基板加工装置及基板处理方法
公开(公告)号：US5897710A
公开(公告)日：1999-04-27
申请号：US55996
申请日：1998-04-07
申请人： Yuusuke Sato , Toshimitsu Ohmine , Takaaki Honda
发明人： Yuusuke Sato , Toshimitsu Ohmine , Takaaki Honda
IPC分类号： C23C16/44 , C23C16/52 , C23C16/54 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67167 , C23C16/4412 , C23C16/52 , C23C16/54 , H01L21/67161 , H01L21/67184 , H01L21/67201 , H01L21/67242
摘要： A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.
摘要翻译：将诸如半导体晶片的衬底转移到多个处理室，以执行规定的处理。检查室与每个处理室气密地连接。检查室设置有加载和卸载基板的处理器。在每个处理室和检查室之间设置闸阀。通过该闸阀，每个室都气密地关闭。

5. 发明授权

US5766360A Substrate processing apparatus and substrate processing method 失效
公开(公告)号：US5766360A
公开(公告)日：1998-06-16
申请号：US36894
申请日：1993-03-25
申请人： Yuusuke Sato , Toshimitsu Ohmine , Takaaki Honda
发明人： Yuusuke Sato , Toshimitsu Ohmine , Takaaki Honda
IPC分类号： C23C16/44 , C23C16/52 , C23C16/54 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67167 , C23C16/4412 , C23C16/52 , C23C16/54 , H01L21/67161 , H01L21/67184 , H01L21/67201 , H01L21/67242
摘要： A substrate such as a semiconductor wafer is transferred to a plurality of process chambers so as to perform prescribed processes. An inspection chamber is air-tightly connected to each of the process chambers. The inspection chamber is provided with a handler which loads and unloads the substrate. A gate valve is disposed between each process chamber and the inspection chamber. By this gate valve, each chamber is air-tightly closed.

6. 发明授权

US07681760B2 Liquid cartridge 有权
标题翻译：液体盒
公开(公告)号：US07681760B2
公开(公告)日：2010-03-23
申请号：US12169999
申请日：2008-07-09
申请人： Atsushi Sadamoto , Yuusuke Sato , Eiichi Sakaue , Masato Akita
发明人： Atsushi Sadamoto , Yuusuke Sato , Eiichi Sakaue , Masato Akita
IPC分类号： H01M8/04 , B65D83/00 , B65D83/76 , G01F23/00
CPC分类号： H01M8/04
摘要： A liquid cartridge for supplying liquid to an external device connected therewith is provided with a casing, a partition member movably fitted in the casing, which partitions the casing into a first chamber and a second chamber, an outlet port communicating between the first chamber and the external device and a pressure unit housed in the second chamber, which presses the partition member so as to discharge the liquid out of the outlet port.
摘要翻译：用于将液体供应到与其连接的外部设备的液体盒设置有壳体，可移动地装配在壳体中的分隔构件，其将壳体分隔成第一室和第二室，在第一室和第二室之间连通的出口外部装置和容纳在第二室中的压力单元，其压紧分隔构件以将液体排出出口。

7. 发明申请

US20100025385A1 FLOW PATH STRUCTURE, PRODUCTION METHOD THEREOF AND FUEL CELL SYSTEM 审中-公开
标题翻译：流路结构及其生产方法及燃料电池系统
公开(公告)号：US20100025385A1
公开(公告)日：2010-02-04
申请号：US12577381
申请日：2009-10-12
申请人： Fuminobu Tezuka , Yuusuke Sato
发明人： Fuminobu Tezuka , Yuusuke Sato
IPC分类号： B23K26/20 , B23K31/02 , B23K20/10
CPC分类号： H01M8/0265 , H01M8/0206 , H01M8/021 , H01M8/0258 , H01M8/0263 , H01M8/0267 , Y02P70/56
摘要： A flow path structure is provided with: a first flow path member having a plurality of through grooves, the through grooves being disposed adjacent to each other; a second flow path member having a fitting portion, in the fitting portion the first flow path member being fitted; a third flow path member covering the fitting portion so as to be sealed, the third flow path member being provided on the second flow path member; an inflow port to receive a fluid; an outflow port to exhaust an exhaust fluid; and a flow path formed in the fitting portion along the first flow path member, the flow path linking the inflow port and the outflow port and running through the through grooves.
摘要翻译：流路结构具有：具有多个贯通槽的第一流路构件，所述贯通槽相邻配置; 具有嵌合部的第二流路构件，在所述嵌合部中嵌合有所述第一流路构件; 第三流路构件，其覆盖所述嵌合部以被密封，所述第三流路构件设置在所述第二流路构件上; 用于接收流体的流入口; 用于排出废气的流出口; 以及形成在沿着第一流路部件的装配部分中的流动路径，连接流入端口和流出端口并流过通孔的流动路径。

8. 发明申请

US20090162712A1 FUEL CELL 审中-公开
标题翻译：燃料电池
公开(公告)号：US20090162712A1
公开(公告)日：2009-06-25
申请号：US12342268
申请日：2008-12-23
申请人： Ryosuke YAGI , Yuusuke Sato , Yoshihiro Akasaka , Norihiro Tomimatsu , Naomi Shida
发明人： Ryosuke YAGI , Yuusuke Sato , Yoshihiro Akasaka , Norihiro Tomimatsu , Naomi Shida
IPC分类号： H01M8/04 , H01M8/10
CPC分类号： H01M8/0247 , H01M8/04171 , H01M8/04201 , H01M8/04365 , H01M8/04753 , H01M8/1011 , Y02E60/523
摘要： According to an aspect of the present invention, there is provided a fuel cell including: a membrane electrode assembly including: an electrolyte membrane; anode and cathode catalyst layers respectively disposed on the electrolyte membrane; and anode and cathode gas diffusion layers respectively disposed on the anode and cathode catalyst layers; a cathode porous body including a front face portion and a rear face portion and being disposed on the cathode gas diffusion layer at the front face portion, the front face portion having an electric conductivity higher than that of air and having a hydrophilicity higher than that of the rear face portion; an anode passage plate disposed on the anode gas diffusion layer; and an air supply apparatus that supplies air toward an end of the cathode porous body.
摘要翻译：根据本发明的一个方面，提供了一种燃料电池，其包括：膜电极组件，包括：电解质膜; 分别设置在电解质膜上的阳极和阴极催化剂层; 以及分别设置在阳极和阴极催化剂层上的阳极和阴极气体扩散层; 阴极多孔体，其具有正面部和背面部，并且设置在所述正面部的所述阴极气体扩散层上，所述正面部的导电率高于空气的导电性，其亲水性高于后表面部分; 设置在阳极气体扩散层上的阳极通道板; 以及向阴极多孔体的端部供给空气的空气供给装置。

9. 发明授权

US07479338B2 Fuel cell system 失效
标题翻译：燃料电池系统
公开(公告)号：US07479338B2
公开(公告)日：2009-01-20
申请号：US11073628
申请日：2005-03-08
申请人： Yuusuke Sato , Eiichi Sakaue , Kei Matsuoka , Kentaro Tomioka
发明人： Yuusuke Sato , Eiichi Sakaue , Kei Matsuoka , Kentaro Tomioka
IPC分类号： H01M8/04
CPC分类号： H01M8/04164 , H01M8/04007 , H01M8/04186 , H01M8/1011 , Y02E60/523
摘要： A fuel cell system is provided with a fuel cell stack composed of one or more fuel cells, a discharging flow path for conducting an exhaust from the fuel cells connected to the fuel cells and a radiator for cooling the exhaust to a controlled temperature.
摘要翻译：燃料电池系统设置有由一个或多个燃料电池组成的燃料电池堆，用于从连接到燃料电池的燃料电池进行排气的排放流路和用于将排气冷却到受控温度的散热器。

10. 发明申请

US20080233444A1 FUEL CELL SYSTEM 审中-公开
标题翻译：燃油电池系统
公开(公告)号：US20080233444A1
公开(公告)日：2008-09-25
申请号：US12051045
申请日：2008-03-19
申请人： Ryosuke Yagi , Yuusuke Sato , Yoshihiro Akasaka , Masato Akita
发明人： Ryosuke Yagi , Yuusuke Sato , Yoshihiro Akasaka , Masato Akita
IPC分类号： H01M8/04
CPC分类号： H01M8/1011 , H01M8/04186 , H01M8/04194 , H01M8/04197 , H01M8/04201 , Y02E60/523
摘要： A fuel cell system includes: a mixing tank storing a fuel solution; a power generator comprising a membrane electrode assembly having an electrolyte membrane, an anode electrode and a cathode electrode, generating power by reaction of the fuel solution with air; a fuel circulation unit circulating the fuel solution to the anode electrode; an air supply unit supplying air to the cathode electrode; and an air supply mechanism supply air to the anode electrode so as to discharge the fuel solution from the inside of the anode electrode to the mixing tank.
摘要翻译：燃料电池系统包括：储存燃料溶液的混合罐; 发电机，其具有由电解质膜，阳极电极和阴极电极构成的膜电极组件，通过燃料溶液与空气的反应产生电力; 燃料循环单元，将燃料溶液循环到阳极电极; 空气供给单元，向阴极供给空气; 空气供给机构向阳极电极供给空气，以将燃料溶液从阳极电极的内部排出到混合槽。

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