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    • 1. 发明授权
    • Silver halide photographic material
    • 卤化银照相材料
    • US06372419B1
    • 2002-04-16
    • US09614454
    • 2000-07-12
    • Tadashi InabaTadanobu SatoKohzaburoh YamadaTakahiro Matsuno
    • Tadashi InabaTadanobu SatoKohzaburoh YamadaTakahiro Matsuno
    • G03C1035
    • G03C1/08G03C1/0051G03C7/30G03C2001/0055G03C2001/0056Y10S430/137
    • A silver halide photographic material comprising a support having provided thereon at least a silver halide emulsion layer, wherein the material contains at least one metal complex contained in any of groups A, B and C: group A: an optically active metal complex; group B: a metal complex comprising a metal ion selected from the group consisting of transition metallic elements belonging to period 4 to 6 and group III to XI of the Periodic Table, and typical metallic elements belonging to period 4 to 6 and group XII to XIV of the Periodic Table, and at least one ligand represented by the following formula (I): wherein Z represents an atomic group to form a 5- or 6-membered ring; A represents a carbon atom or a nitrogen atom; X represents O31, S31 , NR1R2 or COO−; R1 and R2 each represents a hydrogen atom or an alkyl group; R represents a substituent; and n represents 0 or an integer of from 1 to 6; group C: a metal complex selected from a porphyrin complex, a porphycene complex, a phthalocyanine complex, a chlorin complex, and a bacteriochlorin complex.
    • 一种卤化银照相材料,其包含至少提供有卤化银乳剂层的载体,其中所述材料包含至少一种包含在A,B和C组中的任何一种金属络合物:A组:光学活性金属络合物; B族 :金属络合物,其包含选自属于周期表4至6和第III至XI族的过渡金属元素的金属离子,以及属于第4至6周期的典型金属元素和第Ⅳ〜ⅩⅣ族的金属元素 周期表和由下式(I)表示的至少一种配体:其中Z表示形成5-或6-元环的原子团; A表示碳原子或氮原子; X表示O31,S31,NR1R2或COO-; R1和R2各自表示氢原子或烷基; R表示取代基; n表示0或1〜6的整数; C组:选自卟啉络合物,卟吩络合物,酞菁络合物,二氢卟酚络合物和细菌菌素复合物的金属络合物。
    • 8. 发明申请
    • Polishing liquid for metals
    • 金属抛光液
    • US20070200089A1
    • 2007-08-30
    • US11648618
    • 2007-01-03
    • Tadashi InabaTakahiro MatsunoMakoto Kikuchi
    • Tadashi InabaTakahiro MatsunoMakoto Kikuchi
    • C09K13/00C09K13/06
    • C23F3/06C09G1/02C09K3/1472C23F3/04H01L21/3212
    • A liquid for polishing metals, which is used in the chemical and/or mechanical flattening of a semiconductor device, the polishing liquid being characterized in that it comprises at least one member selected from the group consisting of tetrazoles or triazoles represented by any one of the following general formulas (I) to (III): wherein, Ra represents at least one substituent selected from the group consisting of a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; Rb represents at least one substituent selected from the group consisting of a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; and Lb represents a divalent connecting group; and Rc and Rd each independently represent a hydrogen atom or a substituent, and at least one of Rc and Rd represent a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group or a group: -La-Re; wherein La represents a divalent connecting group; Re represents a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl or a sulfonamide group; R and R′ each independently represent a group selected from the group consisting of a hydrogen atom, alkyl groups and aryl groups; and R″ independently represents a group selected from the group consisting of alkyl groups and aryl groups.
    • 一种用于抛光金属的液体,其用于半导体器件的化学和/或机械平整化,抛光液的特征在于,其包含至少一种选自由以下任何一种表示的四唑或三唑的成员: 按照通式(I)至(III):其中R a表示至少一个选自磺基,氨基,膦酰基,氨基甲酰基,氨基甲酰基,氨磺酰基 ,和磺酰胺基; R b表示至少一个选自羟基,羧基,磺基,氨基,膦酰基,氨基甲酰基,氨基甲酰基,氨磺酰基和磺酰胺基的取代基。 且L b表示二价连接基团; 和R d和R d各自独立地表示氢原子或取代基,R 1d和R dd中的至少一个 代表羟基,羧基,磺基,氨基,膦酰基,氨基甲酰基,氨基甲酰基,氨磺酰基和磺酰胺基或基团:-L < SUP> e ; 其中L a a表示二价连接基团; R e表示羟基,羧基,磺基,氨基,膦酰基,氨基甲酰基,氨基甲酰基,氨磺酰基或磺酰胺基; R和R'各自独立地表示选自氢原子,烷基和芳基的基团; 和R“独立地表示选自烷基和芳基的基团。