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1. 发明授权

US07235001B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US07235001B2
公开(公告)日：2007-06-26
申请号：US11392697
申请日：2006-03-30
申请人： Tadakazu Miyashita , Yoshikazu Nakamura , Yoshiyuki Nomura
发明人： Tadakazu Miyashita , Yoshikazu Nakamura , Yoshiyuki Nomura
IPC分类号： B24B49/00
CPC分类号： H01L21/68728 , B24B37/345 , H01L21/68735 , H01L21/68785
摘要： The polishing apparatus is capable of transferring a work piece to a top ring without moving the work piece from the center and capable of precisely polishing the work piece. The polishing apparatus has a transfer unit for transferring the work piece to the top ring. The transfer unit comprises: a guide member having a receiving section, which centers the work piece; a mounting table vertically moving with respect to the guide member, the mounting table having a mounting section, which receives the centered work piece; and a supporting mechanism supporting the mounting table and allowing the mounting table to move downward. The mounting table is relatively moved close to the top ring and presses the work piece onto the top ring so as to transfer the work piece to the top ring.
摘要翻译：抛光装置能够将工件传送到顶环而不将工件从中心移动并且能够精确地抛光工件。抛光装置具有用于将工件传送到顶环的转印单元。传送单元包括：引导构件，其具有使工件居中的接收部分; 相对于引导构件垂直移动的安装台，所述安装台具有容纳所述中心工件的安装部; 以及支撑安装台并使安装台向下移动的支撑机构。安装台相对移动靠近顶环，并将工件压在顶环上，以将工件传送到顶环。

2. 发明申请

US20060223421A1 POLISHING APPARATUS 有权
标题翻译：抛光装置
公开(公告)号：US20060223421A1
公开(公告)日：2006-10-05
申请号：US11392697
申请日：2006-03-30
申请人： Tadakazu Miyashita , Yoshikazu Nakamura , Yoshiyuki Nomura
发明人： Tadakazu Miyashita , Yoshikazu Nakamura , Yoshiyuki Nomura
IPC分类号： B24B51/00 , B24B29/00
CPC分类号： H01L21/68728 , B24B37/345 , H01L21/68735 , H01L21/68785
摘要： The polishing apparatus is capable of transferring a work piece to a top ring without moving the work piece from the center and capable of precisely polishing the work piece. The polishing apparatus has a transfer unit for transferring the work piece to the top ring. The transfer unit comprises: a guide member having a receiving section, which centers the work piece; a mounting table vertically moving with respect to the guide member, the mounting table having a mounting section, which receives the centered work piece; and a supporting mechanism supporting the mounting table and allowing the mounting table to move downward. The mounting table is relatively moved close to the top ring and presses the work piece onto the top ring so as to transfer the work piece to the top ring.
摘要翻译：抛光装置能够将工件传送到顶环而不将工件从中心移动并能够精确地抛光工件。抛光装置具有用于将工件传送到顶环的转印单元。传送单元包括：引导构件，其具有使工件居中的接收部分; 相对于引导构件垂直移动的安装台，所述安装台具有容纳所述中心工件的安装部; 以及支撑安装台并使安装台向下移动的支撑机构。安装台相对移动靠近顶环，并将工件压在顶环上，以将工件传送到顶环。

3. 发明申请

US20120184190A1 DOUBLE-SIDE POLISHING APPARATUS 有权
标题翻译：双面抛光装置
公开(公告)号：US20120184190A1
公开(公告)日：2012-07-19
申请号：US13290646
申请日：2011-11-07
申请人： Tadakazu Miyashita , Shogo Koyama
发明人： Tadakazu Miyashita , Shogo Koyama
IPC分类号： B24B47/02
CPC分类号： B24B37/28
摘要： In the double-side polishing apparatus, one end part of a slurry supply hole has a female-tapered face whose inner diameter is gradually increased toward a polishing face of a polishing plate. A pad hole, which corresponds to the slurry supply hole, is formed in a polishing pad covering the slurry supply hole. An edge of the pad hole is located in the slurry supply hole. A fixation pipe, in which a flange section facing the female-tapered face is formed at one end part, is fixed in the slurry supply hole. The edge of the pad hole is sandwiched and held between the female-tapered face of the slurry supply hole and the flange section of the fixation pipe.
摘要翻译：在双面抛光装置中，浆料供给孔的一端部具有内径逐渐朝研磨板的研磨面增大的阴锥面。对应于浆料供给孔的焊盘孔形成在覆盖浆料供给孔的抛光垫中。焊盘孔的边缘位于浆料供应孔中。在一个端部形成有面对阴锥面的凸缘部的固定管固定在浆料供给孔中。垫孔的边缘被夹持并保持在浆料供给孔的阴锥面与固定管的凸缘部之间。

4. 发明授权

US08454410B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US08454410B2
公开(公告)日：2013-06-04
申请号：US12449400
申请日：2008-01-29
申请人： Koji Kitagawa , Junichi Ueno , Syuichi Kobayashi , Hideo Kudo , Tadakazu Miyashita , Atsushi Kajikura , Yoshinobu Nishimoto
发明人： Koji Kitagawa , Junichi Ueno , Syuichi Kobayashi , Hideo Kudo , Tadakazu Miyashita , Atsushi Kajikura , Yoshinobu Nishimoto
IPC分类号： B24B29/00
CPC分类号： B24B37/015 , B24B37/08 , B24B55/06
摘要： Provided is a polishing apparatus comprising a lower stool (12), a motor (18a) and a speed reducer (19a) for driving the lower stool, and a box (17) for covering at least the portion of the lower stool below the working action face. The polishing apparatus polishes a wafer by forcing the wafer to contact the lower stool and by rotating the lower stool. The box has its inside separated by partitions (31a and 31b) into a plurality of regions, and the motor for driving the lower stool is arranged in a region other than the region containing the lower stool. The polishing apparatus can manufacture a wafer of a stable shape, irrespective of the time elapsed from the running start and the presence/absence of the stop of the polishing apparatus.
摘要翻译：本发明提供一种抛光装置，其包括下部凳子（12），用于驱动下部凳子的电动机（18a）和减速器（19a）以及用于至少覆盖下部工作部分的下部凳子的箱体（17）动作面。抛光装置通过迫使晶片接触下粪和旋转下粪来抛光晶片。箱体的内部由隔板（31a和31b）分隔成多个区域，并且用于驱动下部便器的电动机布置在除了包含下部凳子的区域以外的区域中。抛光装置可以制造具有稳定形状的晶片，而与运行开始所经过的时间和抛光装置的停止的存在/不存在无关。

5. 发明申请

US20100144249A1 POLISHING APPARATUS 有权
标题翻译：抛光装置
公开(公告)号：US20100144249A1
公开(公告)日：2010-06-10
申请号：US12449400
申请日：2008-01-29
申请人： Koji Kitagawa , Junichi Ueno , Syuichi Kobayashi , Hideo Kudo , Tadakazu Miyashita , Atsushi Kajikura , Yoshinobu Nishimoto
发明人： Koji Kitagawa , Junichi Ueno , Syuichi Kobayashi , Hideo Kudo , Tadakazu Miyashita , Atsushi Kajikura , Yoshinobu Nishimoto
IPC分类号： B24B7/17 , B24B7/20 , B24B41/06 , B24B55/00 , B24B47/00
CPC分类号： B24B37/015 , B24B37/08 , B24B55/06
摘要： Provided is a polishing apparatus comprising a lower stool (12), a motor (18a) and a speed reducer (19a) for driving the lower stool, and a box (17) for covering at least the portion of the lower stool below the working action face. The polishing apparatus polishes a wafer by forcing the wafer to contact the lower stool and by rotating the lower stool. The box has its inside separated by partitions (31a and 31b) into a plurality of regions, and the motor for driving the lower stool is arranged in a region other than the region containing the lower stool. The polishing apparatus can manufacture a wafer of a stable shape, irrespective of the time elapsed from the running start and the presence/absence of the stop of the polishing apparatus.
摘要翻译：本发明提供一种抛光装置，其包括下部凳子（12），用于驱动下部凳子的电动机（18a）和减速器（19a）以及用于至少覆盖下部工作部分的下部凳子的箱体（17）动作面。抛光装置通过迫使晶片接触下粪和旋转下粪来抛光晶片。箱体的内部由隔板（31a和31b）分隔成多个区域，并且用于驱动下部便器的电动机布置在除了包含下部凳子的区域以外的区域中。抛光装置可以制造具有稳定形状的晶片，而与运行开始所经过的时间和抛光装置的停止的存在/不存在无关。

6. 发明授权

US07247083B2 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US07247083B2
公开(公告)日：2007-07-24
申请号：US11088191
申请日：2005-03-23
申请人： Tadakazu Miyashita , Hiromi Kishida
发明人： Tadakazu Miyashita , Hiromi Kishida
IPC分类号： B24B1/00
CPC分类号： B24B49/16 , B24B37/30
摘要： The polishing apparatus is capable of precisely controlling polishing pressure, correctly positioning a press plate and uniformly polishing a workpiece. In the polishing apparatus, a holding head comprises: first pressing means for introducing a pressurized fluid into a first fluid chamber and pressing a main head section downward; second pressing means for introducing a pressurized fluid into a second fluid chamber and pressing a press plate downward; and third pressing means for introducing a pressurized fluid into a third fluid chamber and pressing the workpiece downward. With this structure, the workpiece is held on the lower side of an elastic sheet member, and the lower face of the workpiece can be polished by a polishing plate.
摘要翻译：抛光装置能够精确地控制抛光压力，正确定位压板并均匀抛光工件。在抛光装置中，保持头包括：第一加压装置，用于将加压流体引入第一流体室并向下按压主头部; 第二加压装置，用于将加压流体引入第二流体室并向下按压压板; 以及用于将加压流体引入第三流体室并向下按压工件的第三加压装置。利用这种结构，工件被保持在弹性片构件的下侧，并且工件的下表面可以通过抛光板进行抛光。

7. 发明申请

US20060035571A1 Polishing apparatus 有权
公开(公告)号：US20060035571A1
公开(公告)日：2006-02-16
申请号：US11201307
申请日：2005-08-11
申请人： Makoto Nakajima , Yoshio Nakamura , Tadakazu Miyashita
发明人： Makoto Nakajima , Yoshio Nakamura , Tadakazu Miyashita
IPC分类号： B24B29/00
CPC分类号： B24B37/08 , B24B41/007
摘要： An upper polishing plate is moved downward until facing a lower polishing plate to polish a work piece. The upper polishing plate is rotated in a horizontal plane together with a first elastic member, a second elastic member, an outer member and a connecting member. A pressure difference between a first pressing force pressing the outer member or an inner member upward and a second pressing force pressing the outer member or the inner member downward, which is produced in a first closed space by supplying a compressed fluid into and discharging the same from the first closed space, is adjusted, so that a third pressing force of the upper polishing plate, which presses a work piece, can be adjusted.

8. 发明授权

US08888562B2 Double-side polishing apparatus 有权
标题翻译：双面抛光装置
公开(公告)号：US08888562B2
公开(公告)日：2014-11-18
申请号：US13290646
申请日：2011-11-07
申请人： Tadakazu Miyashita , Shogo Koyama
发明人： Tadakazu Miyashita , Shogo Koyama
IPC分类号： B24B7/00 , B24B9/00 , B24B37/28
CPC分类号： B24B37/28
摘要： In the double-side polishing apparatus, one end part of a slurry supply hole has a female-tapered face whose inner diameter is gradually increased toward a polishing face of a polishing plate. A pad hole, which corresponds to the slurry supply hole, is formed in a polishing pad covering the slurry supply hole. An edge of the pad hole is located in the slurry supply hole. A fixation pipe, in which a flange section facing the female-tapered face is formed at one end part, is fixed in the slurry supply hole. The edge of the pad hole is sandwiched and held between the female-tapered face of the slurry supply hole and the flange section of the fixation pipe.
摘要翻译：在双面抛光装置中，浆料供给孔的一端部具有内径朝向研磨板的研磨面逐渐增大的阴锥面。对应于浆料供给孔的焊盘孔形成在覆盖浆料供给孔的抛光垫中。焊盘孔的边缘位于浆料供应孔中。在一个端部形成有面对阴锥面的凸缘部的固定管固定在浆料供给孔中。垫孔的边缘被夹持并保持在浆料供给孔的阴锥面与固定管的凸缘部之间。

9. 发明授权

US07524232B2 Workpiece centering apparatus and method of centering workpiece 有权
标题翻译：工件定心装置和工件对中方法
公开(公告)号：US07524232B2
公开(公告)日：2009-04-28
申请号：US11802867
申请日：2007-05-25
申请人： Tadakazu Miyashita , Yosuke Kanai
发明人： Tadakazu Miyashita , Yosuke Kanai
IPC分类号： B24B49/00 , H01L21/677
CPC分类号： H01L21/68714 , B24B37/345
摘要： The workpiece centering apparatus is capable of highly reducing damage of a workpiece. The workpiece centering apparatus comprises: a guide plate being provided in a tray and covering a water inlet so as to horizontally introduce water into the tray; and at least three overflow outlets for overflowing the water from the tray, the overflow outlets being formed in a peripheral wall of the tray and arranged in the circumferential direction at regular intervals. The workpiece, which is horizontally fed on a surface of the water stored in the tray, is received and floated by surface tension of the water. Then, the workpiece is centered in the tray by water flows radially overflowing from the tray via the overflow outlets.
摘要翻译：工件定心装置能够高度减少工件的损伤。工件定心装置包括：引导板设置在托盘中并覆盖水入口以将水水平地引入托盘; 以及至少三个用于从托盘溢出水的溢流出口，所述溢流口形成在所述托盘的周壁中并且以周期方向以规则的间隔布置。水平地供给在储存在托盘中的水的表面上的工件被水的表面张力接收并漂浮。然后，通过溢流出口从托盘径向溢出的水流将工件中心在托盘中。

10. 发明申请

US20060178094A1 Polishing apparatus 有权
标题翻译：抛光设备
公开(公告)号：US20060178094A1
公开(公告)日：2006-08-10
申请号：US11345406
申请日：2006-02-02
申请人： Tadakazu Miyashita , Harumichi Koyama , Mitsuhiro Nakamura
发明人： Tadakazu Miyashita , Harumichi Koyama , Mitsuhiro Nakamura
IPC分类号： B24B7/00
CPC分类号： B24B37/08 , F16H57/10 , Y10T74/19981
摘要： In polishing apparatus of the present invention, collars can be easily exchange. The polishing apparatus comprises: an outer pin gear having an inner gear section; an inner pin gear having an outer gear section; and a carrier having outer gear teeth, which are engaged with the inner gear section of the outer pin gear and the outer gear section of the inner pin gear so as to rotate and move the carrier around the inner pin gear. At least one of the inner gear section and the outer gear section includes gear teeth, each of which comprises: a pin proper being fixed to a pin ring and extended upward therefrom; a cylindrical collar rotatably covering and fitting the pin proper at a fitting section.
摘要翻译：在本发明的抛光装置中，可以容易地更换套环。抛光装置包括：具有内齿轮部分的外销齿轮; 具有外齿轮部分的内销齿轮; 以及具有外齿轮齿轮的载体，其与外销齿轮的内齿轮部分和内销齿轮的外齿轮部分接合，以使托架围绕内销齿轮旋转和移动。内齿轮部分和外齿轮部分中的至少一个包括齿轮齿，每个齿轮齿包括：销固定到销环并从其向上延伸的销; 一个圆柱形轴环可旋转地覆盖并适配在适配部分处的销。

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