会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明申请
    • Wafer inspection apparatus
    • 晶圆检查仪
    • US20030169916A1
    • 2003-09-11
    • US10361857
    • 2003-02-11
    • TOSHIBA CERAMICS CO., LTD.
    • Yoshinori HayashiHiroyuki NaraidateHiroaki YudaAtsushi TanabeHiromichi IsogaiKoji Izunome
    • G06K009/00
    • G01N21/9503
    • A wafer inspection apparatus has a supporting means (10) for rotatably supporting a wafer (W) formed of a disk, a circumferential edge imaging means (40) for imaging a circumferential edge (S) of the wafer (W) that is supported by the supporting means for rotation, a notch imaging means (50) for imaging a notch (N), a notch illumination part (52) for illuminating the notch (N), and a control means (70) for processing image data imaged by the circumferential edge imaging means (40) and the notch imaging means (50). The circumferential edge imaging means (40) has a plurality of imaging cameras (41) for imaging a plurality of different parts in a thickness direction of the circumferential edge of the wafer (W). The different parts of the circumferential edge (S) of the wafer (W) include an apex at right angles to a surface of the wafer (W) and a front side bevel and a back side bevel inclined relative to the apex. The notch imaging means (50) for the wafer (W) having the notch (N) has a plurality of imaging cameras (51) for imaging different parts in the thickness direction of the notch (N).
    • 晶片检查装置具有用于可旋转地支撑由盘形成的晶片(W)的支撑装置(10),用于对晶片(W)的周缘(S)进行成像的周边成像装置(40),所述周边边缘(S)由 用于旋转的支撑装置,用于对凹口(N)成像的凹口成像装置(50),用于照亮凹口(N)的凹口照明部分(52),以及用于处理由凹槽(N)成像的图像数据的控制装置 周缘成像装置(40)和切口成像装置(50)。 圆周边缘成像装置(40)具有多个成像摄像机(41),用于对晶片(W)的周缘的厚度方向上的多个不同部分进行成像。 晶片(W)的圆周边缘(S)的不同部分包括与晶片(W)的表面成直角的顶点和相对于顶点倾斜的前侧斜面和后侧斜面。 用于具有凹口(N)的晶片(W)的凹口成像装置(50)具有用于对凹口(N)的厚度方向上的不同部分成像的多个成像照相机(51)。
    • 2. 发明申请
    • Viscoelasticity measuring device
    • 粘弹性测量装置
    • US20020178795A1
    • 2002-12-05
    • US10055893
    • 2002-01-28
    • TOSHIBA CERAMICS CO., LTD.
    • Hiromichi IsogaiKatsuyoshi KojimaTakayuki Masunaga
    • G01N011/10
    • G01N3/56G01N2203/0071G01N2203/0085G01N2203/0094
    • The invention provides a viscoelasticity measuring device which is capable of imparting a desired displacement profile to a sample under conditions close to that of actual use. The viscoelasticity measuring device is composed of a presser to impart displacements to a sample; a rod to convey said displacements to said presser; a control jig kept in contact with an upper end portion of said rod and adapted to move to impart a desired displacement to said rod; a load cell which detects a load exerted to the sample to detect a stress generated in the sample; and a displacement sensor to detect the displacement in said sample; said displacements imparted of the sample being defined in accordance with a configuration and a moving speed of said control jig.
    • 本发明提供了一种粘弹性测量装置,该装置能够在接近于实际使用的条件下将样品赋予期望的位移曲线。 粘弹性测量装置由将压力赋予样品的压头构成; 用于将所述位移传送到所述压脚的杆; 控制夹具与所述杆的上端部分保持接触并且适于移动以赋予所述杆所需的位移; 负载传感器,其检测施加到样品的负载以检测在样品中产生的应力; 以及位移传感器,用于检测所述样品中的位移; 所述根据所述控制夹具的构造和移动速度限定样品的位移。