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1. 发明申请

US20190076763A1 TREATMENT SOLUTION SUPPLY APPARATUS AND SUBSTRATE TREATMENT SYSTEM 审中-公开
公开(公告)号：US20190076763A1
公开(公告)日：2019-03-14
申请号：US16117664
申请日：2018-08-30
申请人： Tokyo Electron Limited
发明人： Katsunori ICHINO , Tsunenaga NAKASHIMA , Hideo FUNAKOSHI , Nobuaki MATSUOKA , Masayuki KAJIWARA
IPC分类号： B01D36/00 , B01D35/26 , B05C5/00 , B05C11/10 , G03F7/20
摘要： A treatment solution supply apparatus to supply a treatment solution to a treatment solution discharge unit via a supply path that is provided with a filter configured to remove foreign substances in the treatment solution and a tubephragm pump to send the treatment solution, the supply path has an opening/closing valve on an upstream side of the tubephragm pump and the filter, and a suck-back valve on a downstream side of the tubephragm pump and the filter, and includes a control unit to control at least the tubephragm pump, the opening/closing valve, and the suck-back valve, wherein the control unit performs: a control of stopping sending of the treatment solution from the tubephragm pump; and a control of suspending discharge of the treatment solution from the treatment solution discharge unit by operation of the suck-back valve, and then closing the opening/closing valve to stop the discharge.

2. 发明申请

US20150165458A1 LIQUID SUPPLYING APPARATUS 审中-公开
标题翻译：液体供应装置
公开(公告)号：US20150165458A1
公开(公告)日：2015-06-18
申请号：US14568490
申请日：2014-12-12
申请人： TOKYO ELECTRON LIMITED
发明人： Hideo FUNAKOSHI , Minoru KUBOTA
IPC分类号： B05B9/03 , B05B12/08 , B05B15/02
CPC分类号： B05B9/03 , B05B12/081 , B05B15/55 , H01L21/6715
摘要： An embodiment of a liquid supplying apparatus for supplying a processing liquid to a process object includes: a processing liquid cartridge including: a reservoir chamber for storing the processing liquid; an ejecting port for ejecting the processing liquid stored in the reservoir chamber; a pusher unit for pushing the processing liquid stored in the reservoir chamber outward through the ejecting port; and a replenishing port for replenishing the processing liquid into the reservoir chamber; a standby unit having a standby area where the processing liquid cartridge is standing-by; a transport mechanism that transports the processing liquid cartridge between the standby unit and a location where the processing liquid cartridge supplies the processing liquid to the process object; and an actuating mechanism provided in the transport mechanism that drives the pusher unit to push the processing liquid stored in the reservoir chamber.
摘要翻译：用于向处理对象物供给处理液的液体供给装置的一个实施例包括：处理液体盒，包括：储存室，用于储存处理液; 用于喷射存储在储存室中的处理液的排出口; 推动单元，用于通过所述排出口将存储在所述储存室中的处理液体向外推动; 以及用于将处理液体补充到储存室中的补充口; 备用单元，其具有待处理液体墨盒待机的区域; 运送机构，其将待处理液体盒与处理液盒向加工对象供给处理液体的位置之间运送; 以及驱动机构，其设置在所述输送机构中，其驱动所述推动器单元以推动储存在所述储存室中的处理液体。

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