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1. 发明授权

US5094539A Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same 失效
标题翻译：制造半导体集成电路的方法，图案检测方法和用于半导体对准的系统和减少的步进曝光在其中使用
公开(公告)号：US5094539A
公开(公告)日：1992-03-10
申请号：US313180
申请日：1989-02-21
申请人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
发明人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
IPC分类号： G03F9/00
CPC分类号： G03F9/70
摘要： According to the present invention, in making alignment between a semiconductor integrated circuit wafer and a mask or a reticle in light exposure of the wafer with a monochromatic light such as g-, i- or h- line of a mercury lamp, using a reduced stepping exposure system, light from a predetermined pattern on the wafer is taken out to an off-axis position and observed according to a through-the-lens method; in this case as a characteristic feature of the invention, the observation light is taken out from below the reticle and is passed through chromatic aberration correcting lenses, thereby permitting the use of a polychromatic or continuous spectrum light.
摘要翻译：根据本发明，在使用诸如水银灯的g-，i-或h-线的单色光在晶片的曝光中在半导体集成电路晶片和掩模或掩模版之间进行对准时，使用还原步进曝光系统，从晶片上的预定图案的光被取出到离轴位置，并根据透镜方法观察; 在这种情况下，作为本发明的特征，观察光从掩模版的下方取出并通过色像差校正透镜，从而允许使用多色或连续的光谱光。

2. 发明授权

US5432608A Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same 失效
标题翻译：制造半导体集成电路的方法，图案检测方法以及用于半导体对准的系统和减少的步进曝光用于其中
公开(公告)号：US5432608A
公开(公告)日：1995-07-11
申请号：US111310
申请日：1993-08-24
申请人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
发明人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
IPC分类号： G03F9/00 , H01L21/30
CPC分类号： G03F9/70
摘要： According to the present invention, in making alignment between a semiconductor integrated circuit wafer and a mask or a reticle in light exposure of the wafer with a monochromatic light such as g-, i- or h-line of a mercury lamp, using a reduced stepping exposure system, light from a predetermined pattern on the wafer is taken out to an off-axis position and observed according to Through-the-Lens method; in this case as a characteristic feature of the invention, the observation light taken out from below the reticle is passed through chromatic aberration correcting lenses, thereby permitting the use of a polychromatic or continuous spectrum light.
摘要翻译：根据本发明，在采用诸如水银灯的g-，i-或h-线的单色光的晶片的曝光中，在半导体集成电路晶片和掩模或掩模版之间进行对准时，使用还原步进曝光系统，从晶片上的预定图案的光线取出到离轴位置，并根据透镜法进行观察; 在这种情况下，作为本发明的特征，从掩模版下方取出的观察光通过色像差校正透镜，从而允许使用多色或连续光谱光。

3. 发明授权

US5260771A Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same 失效
标题翻译：制造半导体集成电路的方法，图案检测方法以及用于半导体对准的系统和减少的步进曝光用于其中
公开(公告)号：US5260771A
公开(公告)日：1993-11-09
申请号：US811059
申请日：1991-12-20
申请人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
发明人： Susumu Komoriya , Takao Kawanabe , Shinya Nakagawa , Takayoshi Oosakaya , Nobuyuki Iriki
IPC分类号： G03F9/00 , H01L21/30
CPC分类号： G03F9/70
摘要： According to the present invention, in making alignment between a semiconductor integrated circuit wafer and a mask or a reticle in light exposure of the wafer with a monochromatic light such as g-, i- or h-line of a mercury lamp, using a reduced stepping exposure system, light from a predetermined pattern on the wafer is taken out to an off-axis position and observed according to a through-the-lens method; in this case as a characteristic feature of the invention, the, observation light is taken out from below the reticle and is passed through chromatic aberration correcting lenses, thereby permitting the use of a polychromatic or continuous spectrum light.
摘要翻译：根据本发明，在采用诸如水银灯的g-，i-或h-线的单色光的晶片的曝光中，在半导体集成电路晶片和掩模或掩模版之间进行对准时，使用还原步进曝光系统，从晶片上的预定图案的光被取出到离轴位置，并根据透镜方法观察; 在这种情况下，作为本发明的特征，观察光从掩模版的下方取出并通过色像差校正透镜，从而允许使用多色或连续光谱光。

4. 发明授权

US4974018A Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US4974018A
公开(公告)日：1990-11-27
申请号：US288971
申请日：1988-12-23
申请人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
发明人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
IPC分类号： H01L21/30 , G03F7/20 , G03F7/207 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70241 , G03F7/70258 , G03F7/70883
摘要： The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.

5. 发明授权

US4699505A Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US4699505A
公开(公告)日：1987-10-13
申请号：US742786
申请日：1985-06-10
申请人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
发明人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
IPC分类号： H01L21/30 , G03F7/20 , G03F7/207 , H01L21/027 , G03B27/42
CPC分类号： G03F7/70933 , G03F7/70241 , G03F7/70258 , G03F7/70883
摘要： The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.
摘要翻译：本发明涉及一种检测放置曝光装置的大气压，温度和湿度等环境条件的曝光装置，并且基于检测值一直保持投影倍率恒定，从而可以再现图案恰恰。具体地，该装置包括检测光学投影系统的管温度，光学系统附近的湿度或大气压的至少一个的检测器，以及基于由检测器检测到的信号来控制光学特性的控制单元。也就是说，控制单元根据环境条件调节光学特性，从而调整投影倍率的变化和/或焦点位置的变化。因此，调整光学特性的变化以转印图案保持高精度。

6. 发明授权

US5025284A Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US5025284A
公开(公告)日：1991-06-18
申请号：US577632
申请日：1990-09-05
申请人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
发明人： Susumu Komoriya , Hiroshi Nishizuka , Shinya Nakagawa , Hisashi Maejima
IPC分类号： H01L21/30 , G03F7/20 , G03F7/207 , H01L21/027
CPC分类号： G03F7/70933 , G03F7/70241 , G03F7/70258 , G03F7/70883
摘要： The invention deals with an exposure apparatus which detects environmental conditions such as atmospheric pressure, temperature and humidity in which the exposure apparatus is placed, and which maintains the projected magnification constant at all times based upon the detected values, so that the pattern can be reproduced precisely. Concretely, the apparatus comprises a detector to detect at least one of the tube temperature of the optical projecting system, humidity or atmospheric pressure near the optical system, and a control unit which controls optical characteristics based upon the signals detected by the detector. Namely, the control unit adjusts the optical characteristics depending upon the environmental conditions thereby to adjust variation in the projecting magnification and/or variation in the focal position. Thus, variation in the optical characteristics is adjusted to transfer the pattern maintaining high precision.

7. 发明授权

US08321602B2 Device management apparatus, device management method and device management program 有权
标题翻译：设备管理装置，设备管理方法和设备管理程序
公开(公告)号：US08321602B2
公开(公告)日：2012-11-27
申请号：US12551124
申请日：2009-08-31
申请人： Shinya Nakagawa
发明人： Shinya Nakagawa
IPC分类号： G06F3/00 , G06F13/12
CPC分类号： G05B19/4185 , Y02P90/18 , Y02P90/205
摘要： A device management apparatus may include, but is not limited to, a device controller that controls a device, a communication controller, a management unit, and a monitoring unit. The communication controller controls a communication between the device and the device controller. The management unit manages the device controller and the communication controller. The monitoring unit is disposed between the device controller and the communication controller. The monitoring unit formats data that is transmitted between the device controller and the communication controller so as to create formatted data. The monitoring unit supplies the formatted data to the management unit.
摘要翻译：设备管理设备可以包括但不限于控制设备，通信控制器，管理单元和监视单元的设备控制器。通信控制器控制设备和设备控制器之间的通信。管理单元管理设备控制器和通信控制器。监视单元设置在设备控制器和通信控制器之间。监视单元格式化设备控制器和通信控制器之间传输的数据，以便创建格式化的数据。监视单元将格式化的数据提供给管理单元。

8. 发明授权

US09337599B2 Carbon brush for fuel pump and method for manufacturing same 有权
标题翻译：燃油泵碳刷及其制造方法
公开(公告)号：US09337599B2
公开(公告)日：2016-05-10
申请号：US13981172
申请日：2011-12-15
申请人： Makoto Nishio , Shinya Nakagawa , Kiyotoshi Oi , Youichi Murakami , Takashi Fukutsuka , Ryouichi Honbo
发明人： Makoto Nishio , Shinya Nakagawa , Kiyotoshi Oi , Youichi Murakami , Takashi Fukutsuka , Ryouichi Honbo
IPC分类号： H02K13/10 , H01R39/02 , H01R39/22 , H02K5/12 , H02K13/00
CPC分类号： H01R39/025 , H01R39/22 , H02K5/12 , H02K13/00
摘要： A carbon brush for a fuel pump includes a brush body and a lead wire connected to the brush body, and the brush body has carbon and polyether ether ketone as main components. Abnormal wear does not occur even if a fuel pump motor is operated at a high voltage.
摘要翻译：用于燃料泵的碳刷包括刷体和连接到刷体的引线，刷体具有碳和聚醚醚酮作为主要成分。即使燃油泵电机在高电压下工作，也不会发生异常磨损。

9. 发明授权

US09015308B2 Multilayer distributed processing system 有权
标题翻译：多层分布式处理系统
公开(公告)号：US09015308B2
公开(公告)日：2015-04-21
申请号：US12162979
申请日：2007-01-17
申请人： Qingjie Du , Shinya Nakagawa
发明人： Qingjie Du , Shinya Nakagawa
IPC分类号： G06F15/173 , G06F9/46 , G06F9/50
CPC分类号： G06F9/466 , G06F9/5055
摘要： The independencies of a plurality of layers executing dividingly a transaction can be easily enhanced. Anode (30) assigns to a transaction to anode (30) of a lower layer through a distributed transaction management section. The node (30) shares a predetermined transaction with the node (30) of the lower layer along with other nodes (30). The node (30) shared by the nodes (30) is a read-only node or a node to which data can be written by the characteristic of a function. Thus the node (30) searches for an unused node (30) in lower layers through the distributed transaction management section (34) when the node starts a new transaction. First, second, and third node hosts (3,4,5) check if each node (30) is used for which transaction or if each node (30) is used or not and store the results.
摘要翻译：可以容易地增强分开执行事务的多个层的独立性。阳极（30）通过分布式事务管理部分向下层的阳极（30）分配事务。节点（30）与其他节点（30）一起与下层的节点（30）共享预定的事务。由节点（30）共享的节点（30）是只读节点或能通过功能的特性写入数据的节点。因此，当节点开始新的事务时，节点（30）通过分布式事务管理部分（34）搜索较低层中的未使用的节点（30）。第一，第二和第三节点主机（3,4,5）检查每个节点（30）是否用于哪个事务，或者是否使用每个节点（30），并存储结果。

10. 发明授权

US08086175B2 Field device search system 有权
标题翻译：现场设备搜索系统
公开(公告)号：US08086175B2
公开(公告)日：2011-12-27
申请号：US12316080
申请日：2008-12-09
申请人： Shinya Nakagawa
发明人： Shinya Nakagawa
IPC分类号： H04B7/24 , G01S1/02
CPC分类号： G05B19/042 , G05B2219/25062
摘要： The field device search system is composed of a plurality of field devices having a wireless transmitting/receiving capability and an information terminal having a receiving capability to receive radio waves from a field device, wherein the information terminal includes a radio wave receiver, a CPU (arithmetic means), a display part, a memory, and member for identifying one of the plurality of field devices.
摘要翻译：现场设备搜索系统由具有无线发射/接收能力的多个现场设备和具有从现场设备接收无线电波的接收能力的信息终端组成，其中信息终端包括无线电波接收机，CPU（算术装置），显示部分，存储器和用于识别多个现场设备之一的构件。

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