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    • 7. 发明申请
    • METHODS OF FORMING SEMICONDUCTOR DEVICE
    • 形成半导体器件的方法
    • US20100136763A1
    • 2010-06-03
    • US12627840
    • 2009-11-30
    • Tae-hee Lee
    • Tae-hee Lee
    • H01L21/336H01L21/22
    • H01L29/7841H01L27/108H01L27/10802
    • Provided are methods of forming a semiconductor device, the method including: forming an insulation region on a substrate region, and an active region on the insulation region; patterning the active region to form an active line pattern; forming a gate pattern to surround an upper portion and lateral portions of the active line pattern; separating the gate pattern into a plurality of sub-gate regions, and separating the active line pattern into a plurality of sub-active regions, in order to form a plurality of memory cells that are each formed of the sub-active region and the sub-gate region and that are separated from one another; and forming first and second impurity doping regions along both edges of the sub-active regions included in each of the plurality of the memory cells, wherein the forming of the first and second impurity doping regions comprises doping lateral portions of the sub-active regions via a space between the memory cells.
    • 提供形成半导体器件的方法,所述方法包括:在衬底区域上形成绝缘区域和在绝缘区域上形成有源区域; 图案化有源区域以形成有源线图案; 形成栅极图案以包围有源线图案的上部和侧部; 将栅极图案分离成多个子栅极区域,并将有源线图案分离成多个子有源区域,以便形成由子有源区域和子区域形成的多个存储单元 并且彼此分离; 以及沿着包括在所述多个所述存储单元中的每一个的所述子有源区域的两个边缘形成第一和第二杂质掺杂区域,其中所述第一和第二杂质掺杂区域的形成包括通过经由所述子有源区域的横向部分 存储单元之间的空间。
    • 9. 发明申请
    • Non-volatile memory devices and methods of operating non-volatile memory devices
    • 非易失性存储器件和操作非易失性存储器件的方法
    • US20090285027A1
    • 2009-11-19
    • US12318651
    • 2009-01-05
    • Tae-hee LeeWon-joo KimJune-mo KooTae-eung Yoon
    • Tae-hee LeeWon-joo KimJune-mo KooTae-eung Yoon
    • G11C16/04G11C16/06G11C7/00
    • G11C16/0483G11C16/10G11C16/3418G11C16/3427
    • A non-volatile memory device, which includes a plurality of memory transistors that are coupled with a plurality of bit lines and a plurality of word lines, and methods of operating a non-volatile memory device are provided. A selected bit line for programming and unselected bit lines for preventing programming are determined from the plurality of bit lines. An inhibiting voltage is applied to at least one inhibiting word line chosen from the plurality of word lines. The at least one inhibiting word line includes a word line positioned closest to a string selection line. A programming voltage is applied to a selected word line chosen from the plurality of word lines. Data is programmed into a memory transistor coupled with the selected word line and the selected bit line while preventing data from being programming into memory transistors coupled with the unselected bit line.
    • 提供了包括与多个位线和多个字线耦合的多个存储晶体管的非易失性存储器件以及操作非易失性存储器件的方法。 从多个位线确定用于编程的选择位线和用于防止编程的未选位线。 对从多个字线中选择的至少一个禁止字线施加抑制电压。 至少一个禁止字线包括最靠近字符串选择线定位的字线。 将编程电压施加到从多个字线中选择的选定字线。 数据被编程到与所选择的字线和所选择的位线耦合的存储晶体管中,同时防止数据被编程到与未选位线耦合的存储晶体管中。