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1. 发明申请

US20050010319A1 System and method for validating and visualizing APC assisted semiconductor manufacturing processes 审中-公开
标题翻译：用于验证和可视化APC辅助半导体制造工艺的系统和方法
公开(公告)号：US20050010319A1
公开(公告)日：2005-01-13
申请号：US10617919
申请日：2003-07-09
申请人： Sukesh Patel , Raj Raheja
发明人： Sukesh Patel , Raj Raheja
IPC分类号： G05B13/04 , H01L21/00 , G06F19/00
CPC分类号： G05B13/048 , H01L21/67276
摘要： A system and/or methodology that facilitates verifying and/or validating an APC assisted process via simulation is provided. The system comprises a film stack representation and a canonical model. The canonical model can predict process rates based at least in part upon an exposed material in the film stack representation. A solver component can also be provided to generate an updated recipe set-point according inputs and outputs of the canonical model.
摘要翻译：提供了一种有助于通过仿真验证和/或验证APC辅助过程的系统和/或方法。该系统包括胶片堆叠表示和规范模型。规范模型可以至少部分地基于薄膜堆叠表示中暴露的材料来预测过程速率。还可以提供解算器组件以根据规范模型的输入和输出生成更新的配方设定点。

2. 发明申请

US20080297667A1 PROJECTION APPARATUS WITH DIRECT ATTACHMENT OF EXTERNAL STORAGE MEDIA 审中-公开
标题翻译：直接连接外部存储介质的投影设备
公开(公告)号：US20080297667A1
公开(公告)日：2008-12-04
申请号：US11756812
申请日：2007-06-01
申请人： Sukesh Patel , Manika Kaushal
发明人： Sukesh Patel , Manika Kaushal
IPC分类号： H04N5/64
CPC分类号： H04N9/3141 , H04N21/485
摘要： The subject invention provides systems and methodologies for projecting data from storage media directly attached to a projector. In one embodiment, a projector unit is provided that comprises an input port attached to the projector unit that receives input data from storage media connected to the input port; an embedded computer within the projector unit that utilizes an operating system and has applications stored thereon operable to render input data received from the storage media connected to the input port as a video signal; at least one of a local display screen attached to the projector and a projection lens within the projector for displaying a video signal rendered by the embedded computer; and a control input device attached to the projector unit that facilitates the communication of control input to the projector unit.
摘要翻译：本发明提供了用于从直接附接到投影仪的存储介质投影数据的系统和方法。在一个实施例中，提供一种投影仪单元，其包括附接到投影仪单元的输入端口，其从连接到输入端口的存储介质接收输入数据; 投影仪单元内的嵌入式计算机，其利用操作系统并且具有存储在其上的应用，可操作以将从连接到输入端口的存储介质接收的输入数据作为视频信号; 连接到投影仪的局部显示屏幕中的至少一个和投影仪内的用于显示由嵌入式计算机呈现的视频信号的投影透镜; 以及附接到投影仪单元的控制输入装置，其有助于将控制输入通向投影仪单元。

3. 发明申请

US20080190446A1 CONTROL OF DRY CLEAN PROCESS IN WAFER PROCESSING 审中-公开
标题翻译：干法处理干燥过程控制
公开(公告)号：US20080190446A1
公开(公告)日：2008-08-14
申请号：US11674218
申请日：2007-02-13
申请人： Rajiv M. Ranade , Subhash B. Kulkarni , Ole Krogh , Sukesh Patel
发明人： Rajiv M. Ranade , Subhash B. Kulkarni , Ole Krogh , Sukesh Patel
IPC分类号： B08B6/00
CPC分类号： H01L21/6833 , H01L21/67028 , H01L21/67051
摘要： A “wafer-less” etch chamber cleaning method varies the capacitance applied to radio frequency components of the chuck that is within the etch chamber (varies impedance of the chuck) so as to cause electric field lines within the etch chamber to terminate (bend) away from the chuck. Then the etch chamber can be cleaned using a very aggressive etch chemistry (e.g., NF3) that would otherwise damage the chuck; however, the electric field lines protect the chuck from the etch chemistry. The capacitance is varied according to a pre-established model. Further, the process evaluates the effectiveness of the pre-established model to produce feedback and constantly adjusts the pre-established model to increase the effectiveness of the cleaning process (according to the feedback).
摘要翻译： “无晶圆”蚀刻室清洁方法改变施加到蚀刻室内的卡盘的射频分量（改变卡盘的阻抗）的电容，以使蚀刻室内的电场线终止（弯曲）远离卡盘然后可以使用非常有侵蚀性的蚀刻化学品（例如，NF 3 3）清洁蚀刻室，否则会损坏卡盘; 然而，电场线路保护卡盘免受蚀刻化学物质的影响。电容根据预先建立的模型而变化。此外，该过程评估预先建立的模型的有效性以产生反馈并且不断调整预先建立的模型以增加清洁过程的有效性（根据反馈）。

4. 发明授权

US06834212B1 Method and apparatus for APC solver engine and heuristic 失效
标题翻译： APC求解器引擎和启发式方法和设备
公开(公告)号：US06834212B1
公开(公告)日：2004-12-21
申请号：US10189931
申请日：2002-07-03
申请人： Sukesh Patel , Mark Freeland
发明人： Sukesh Patel , Mark Freeland
IPC分类号： G06F1900
CPC分类号： G05B13/048 , G05B13/042
摘要： Systems and methodologies are provided that adapt and control desired fabrication processes by utilizing a control model based solution. A suitable control model is obtained or derived from one or more other control models. A formulaic description is then obtained that predicts one or more desired outputs based on various process settings and inputs. A suitable solution to the description that achieves the desired outputs and is relatively close to ideal processing conditions is obtained utilizing a heuristic. The solution includes process control parameters or settings that are employed to control and/or modify a fabrication process.
摘要翻译：提供了通过利用基于控制模型的解决方案来适应和控制期望的制造过程的系统和方法。从一个或多个其他控制模型获得或导出合适的控制模型。然后获得根据各种过程设置和输入来预测一个或多个所需输出的公式描述。利用启发式获得对实现期望输出并且相对接近理想处理条件的描述的合适解决方案。该解决方案包括用于控制和/或修改制造过程的过程控制参数或设置。

5. 发明授权

US07035696B1 Method and apparatus for poly gate CD control 失效
标题翻译：多门CD控制方法和装置
公开(公告)号：US07035696B1
公开(公告)日：2006-04-25
申请号：US10189930
申请日：2002-07-03
申请人： Ali Sadeghi , Sukesh Patel , Mark Freeland , Ole Krogh
发明人： Ali Sadeghi , Sukesh Patel , Mark Freeland , Ole Krogh
IPC分类号： G06F19/00
CPC分类号： G05B17/02
摘要： Systems and methods are provided that facilitate semiconductor processing, including etch processes. The invention provides real-time two-dimensional etch rate control. Prior to starting an etch process, a control model is selected that relates to the etch process. A formula or function description is developed from the model and solved to obtain process parameter values that are predicted to produce the desired etch rates. During the fabrication etch process, critical dimension measurements of a polysilicon gate are obtained. From these measurements, the etch process is modified so as to achieve a desired horizontal etch rate and a desired vertical etch rate. The etch process results in a polysilicon gate having a desired rectangular profile.
摘要翻译：提供了促进半导体处理（包括蚀刻工艺）的系统和方法。本发明提供实时二维蚀刻速率控制。在开始蚀刻工艺之前，选择与蚀刻工艺相关的控制模型。公式或函数描述是从模型开发出来的，并被解决以获得被预测产生期望的蚀刻速率的工艺参数值。在制造蚀刻工艺期间，获得多晶硅栅极的临界尺寸测量。从这些测量中，蚀刻工艺被修改以便实现期望的水平蚀刻速率和期望的垂直蚀刻速率。蚀刻工艺导致具有期望的矩形轮廓的多晶硅栅极。

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