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    • 3. 发明授权
    • Holding tray for substrate, substrate alignment system using the same and method thereof
    • 用于基板的保持托盘,使用其的基板对准系统及其方法
    • US08166641B2
    • 2012-05-01
    • US11325575
    • 2006-01-05
    • Sang-Jin HanKwan-Seop SongHee-Cheol KangSeok-Heon Jeong
    • Sang-Jin HanKwan-Seop SongHee-Cheol KangSeok-Heon Jeong
    • H01L21/68
    • H01L21/68728H01L21/68735H01L21/68778Y10S414/136Y10S414/141Y10T29/53265
    • Disclosed are a holding tray, a substrate alignment system using the same and a method thereof. More specifically, the present invention relates to a holding tray for substrate capable of accomplishing high-precision alignment and conducting a stable deposition. A holding means is included in at least one side of the substrate to hold and support the substrate in a manner that the substrate is vertically held and supported on a flat surface of the holding tray during a vacuum process.The holding tray according to the present invention, the substrate alignment system using the same, and the method thereof include a substrate on which a deposition is made, a frame formed to receive the substrate, a tray formed to receive the frame, and at least one holding means formed to hold the substrate on the frame.The holding tray for substrate according to the present invention, the substrate alignment system using the same, and the method thereof are useful to accomplish high-precision alignment and conduct a stable deposition process due to the stable vertical arrangement of the substrate during the deposition process.
    • 公开了一种保持托盘,使用其的基板对准系统及其方法。 更具体地,本发明涉及一种能够实现高精度对准并进行稳定沉积的基板用保持托盘。 保持装置包括在基板的至少一侧,以在真空过程中将基板竖直保持并支撑在保持托盘的平坦表面上以保持和支撑基板。 根据本发明的保持托盘,使用其的基板对准系统及其方法包括其上形成沉积物的基板,形成为接收基板的框架,形成为接收框架的托盘,并且至少 一个保持装置被形成为将基板保持在框架上。 根据本发明的基板用保持托盘,使用其的基板对准系统及其方法可用于实现高精度对准并且由于在沉积工艺期间基板的稳定垂直排列而进行稳定的沉积工艺 。
    • 8. 发明申请
    • Holding tray for substrate, substrate alignment system using the same and method thereof
    • 用于基板的保持托盘,使用其的基板对准系统及其方法
    • US20060144738A1
    • 2006-07-06
    • US11325575
    • 2006-01-05
    • Sang-Jin HanKwan-Seop SongHee-Cheol KangSeok-Heon Jeong
    • Sang-Jin HanKwan-Seop SongHee-Cheol KangSeok-Heon Jeong
    • B65D85/48
    • H01L21/68728H01L21/68735H01L21/68778Y10S414/136Y10S414/141Y10T29/53265
    • Disclosed are a holding tray, a substrate alignment system using the same and a method thereof. More specifically, the present invention relates to a holding tray for substrate capable of accomplishing high-precision alignment and conducting a stable deposition. A holding means is included in at least one side of the substrate to hold and support the substrate in a manner that the substrate is vertically held and supported on a flat surface of the holding tray during a vacuum process. The holding tray according to the present invention, the substrate alignment system using the same, and the method thereof include a substrate on which a deposition is made, a frame formed to receive the substrate, a tray formed to receive the frame, and at least one holding means formed to hold the substrate on the frame. The holding tray for substrate according to the present invention, the substrate alignment system using the same, and the method thereof are useful to accomplish high-precision alignment and conduct a stable deposition process due to the stable vertical arrangement of the substrate during the deposition process.
    • 公开了一种保持托盘,使用其的基板对准系统及其方法。 更具体地,本发明涉及一种能够实现高精度对准并进行稳定沉积的基板用保持托盘。 保持装置包括在基板的至少一侧,以在真空过程中将基板竖直保持并支撑在保持托盘的平坦表面上以保持和支撑基板。 根据本发明的保持托盘,使用其的基板对准系统及其方法包括其上形成沉积物的基板,形成为接收基板的框架,形成为接收框架的托盘,并且至少 一个保持装置被形成为将基板保持在框架上。 根据本发明的基板用保持托盘,使用其的基板对准系统及其方法可用于实现高精度对准并且由于在沉积工艺期间基板的稳定垂直排列而进行稳定的沉积工艺 。