会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • SYSTEM AND METHODS OF ALTERING A VERY SMALL SURFACE AREA
    • 改变非常小的表面区域的系统和方法
    • US20050016954A1
    • 2005-01-27
    • US10604487
    • 2003-07-25
    • Hendrik HamannSteven HerschbeinHerschel MarchmanChad RueMichael Sievers
    • Hendrik HamannSteven HerschbeinHerschel MarchmanChad RueMichael Sievers
    • H01L21/00C23F1/00
    • H01L21/6708H01L21/67069
    • Very small scale altering of features of an existing pattern, such as of an IC or photomask can be edited wherein a chemical reactant and/or activating energy is localized to the site of the target feature. In this manner, the alteration can be contained in a highly localized area such that other portions of the pattern remain substantially unaffected. The activating energy may be delivered by far-field and/or near field techniques. In one embodiment, the energy is converted into thermal energy at the site by interaction with the apex of a probe where the apex is proximate to the site. In another embodiment, the energy is converted to a plasma by spaced electrodes at the apex of the probe in combination with activating energy of at least two specifically selected wavelengths. The method can be applied to the repair and/or metrology of very small features of densely patterned substrates, e.g., an integrated circuit, package, photomask, etc.
    • 可以编辑诸如IC或光掩模的现有图案的特征的非常小规模的改变,其中化学反应物和/或活化能量被定位到目标特征的位点。 以这种方式,改变可以包含在高度局部化的区域中,使得图案的其它部分基本上不受影响。 激活能量可以通过远场和/或近场技术传递。 在一个实施方案中,通过与顶点接近该位点的探针的顶点相互作用,能量在该位置被转换成热能。 在另一个实施例中,能量通过探针顶点处的间隔开的电极与至少两个特定选择波长的激活能量结合而转换成等离子体。 该方法可以应用于密集图案化衬底(例如集成电路,封装,光掩模等)的非常小的特征的修复和/或计量。
    • 3. 发明申请
    • SYSTEM AND METHOD OF ALTERING A VERY SMALL SURFACE AREA BY MULTIPLE CHANNEL PROBE
    • 通过多通道探针改变非常小的表面区域的系统和方法
    • US20050016952A1
    • 2005-01-27
    • US10604486
    • 2003-07-25
    • Hendrik HamannSteven HerschbeinHerschel MarchmanChad RueMichael Sievers
    • Hendrik HamannSteven HerschbeinHerschel MarchmanChad RueMichael Sievers
    • B44C1/22C03C15/00C03C25/68C23F1/00H01L21/00
    • H01L21/6715
    • A system and method are provided for altering a very small surface area of a feature of a substrate. The disclosed system includes a localized chemical delivery probe (LCDP) having a plurality of channels, in which each channel is adapted to carry a material through the probe to exit at an apex of the probe. The system further includes a way to maneuver the apex of the probe to a site proximate to the target feature on the surface. A first channel of the probe is preferably coupled to a source of chemical to assist in a reaction, and a second channel of the probe is preferably coupled to a second chemical, a diluting fluid, an expulsion gas, and/or suction to provide the same through the probe apex. In a preferred embodiment, a first chemical is delivered by a first channel of the probe to assist in an exothermic reaction to etch a low-K organic dielectric, and a diluting fluid or suction is provided by a second channel to confine the effect of the reaction.
    • 提供了一种用于改变基板特征的非常小的表面积的系统和方法。 所公开的系统包括具有多个通道的局部化学物质传送探针(LCDP),其中每个通道适于承载穿过探针的材料以在探针的顶点离开。 该系统还包括一种将探针的顶点操纵到靠近表面上的目标特征的位置的方法。 探针的第一通道优选地连接到化学源以辅助反应,并且探针的第二通道优选地连接到第二化学物质,稀释液体,排出气体和/或吸力以提供 通过探针顶点相同。 在优选的实施方案中,第一化学品通过探针的第一通道传递以辅助放热反应来蚀刻低K有机电介质,并且稀释流体或抽吸由第二通道提供以限制 反应。
    • 4. 发明申请
    • SAMPLE MOUNT FOR PERFORMING SPUTTER-DEPOSITION IN A FOCUSED ION BEAM (FIB) TOOL
    • 用于在聚焦离子束(FIB)工具中进行溅射沉积的样品装置
    • US20050006231A1
    • 2005-01-13
    • US10604272
    • 2003-07-08
    • Lawrence FischerSteven HerschbeinChad Rue
    • Lawrence FischerSteven HerschbeinChad Rue
    • C23C14/46C23C14/50H01J37/20H01J37/305C25B9/00C25B11/00C25B13/00
    • H01J37/20C23C14/46C23C14/50H01J37/3056
    • A method and structure for a sample processing apparatus that uses a vacuum enclosure is disclosed. A focused ion beam tool, sputter target, movable stage, and hinged mount are all included within the vacuum enclosure. The hinged mount includes a sample mounting portion, for holding a sample being processed in the vacuum enclosure, and a counterweight portion. The counterweight portion is connected to the sample mounting portion at an approximate right angle to the sample mounting portion. More specifically, one end of the sample mounting portion is connected to one end of the counterweight portion, such that the sample mounting portion and the counterweight portion form an approximate right angle. There is also an axis around which the mount rotates. The axis passes through the sample mounting portion and the counterweight portion at a location where the sample mounting portion and the counterweight portion connect to one another.
    • 公开了一种使用真空外壳的样品处理设备的方法和结构。 聚焦离子束工具,溅射靶,活动台和铰接安装座都包括在真空外壳内。 铰链安装件包括用于保持在真空外壳中处理的样品的样品安装部分和配重部分。 配重部分以与样品安装部分成直角的角度连接到样品安装部分。 更具体地,样品安装部分的一端连接到配重部分的一端,使得样品安装部分和配重部分形成近似的直角。 另外还有一个安装座旋转的轴。 轴在样品安装部分和对重部分彼此连接的位置处通过样品安装部分和配重部分。