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1. 发明申请

US20080072413A1 Indirectly heated cathode clamp system and method 有权
标题翻译：间接加热阴极夹系统及方法
公开(公告)号：US20080072413A1
公开(公告)日：2008-03-27
申请号：US11194260
申请日：2005-08-01
申请人： Stephen Krause , Eric R. Cobb , Russell Low
发明人： Stephen Krause , Eric R. Cobb , Russell Low
IPC分类号： B23Q3/18 , H01J9/18 , H05H1/24
CPC分类号： H01J9/18 , Y10T29/49895 , Y10T29/49899 , Y10T29/53909
摘要： A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要翻译：公开了一种用于离子注入机系统的方法和夹紧系统，用于将阴极和细丝相对于彼此原位排列。本发明包括具有夹具的夹具系统，该夹具包括可分离地联接到第二夹紧构件的第一夹紧构件以及至少一个夹紧构件中的阴极和细丝之一的安装部分的开口。每个夹持构件包括与阴极和细丝之一的安装部分接合的表面。开口适于接收定位工具以通过在夹具被释放时移动安装部分来相对于彼此定位阴极和灯丝。安装部分可以包括工具接收构件以便于精确定位。

2. 发明授权

US07887034B2 Indirectly heated cathode clamp system and method 有权
标题翻译：间接加热阴极夹系统及方法
公开(公告)号：US07887034B2
公开(公告)日：2011-02-15
申请号：US11194260
申请日：2005-08-01
申请人： Stephen Krause , Eric R. Cobb , Russell Low
发明人： Stephen Krause , Eric R. Cobb , Russell Low
IPC分类号： B25B3/00
CPC分类号： H01J9/18 , Y10T29/49895 , Y10T29/49899 , Y10T29/53909
摘要： A method and clamp system for use on an ion implanter system for aligning a cathode and filament relative to one another in-situ are disclosed. The invention includes a clamp system having a clamp including a first clamp member separably coupled to a second clamp member, and an opening to a mount portion of one of the cathode and the filament in at least one of the clamp members. Each clamp member includes a surface to engage a mount portion of one of the cathode and the filament. The opening is adapted to receive a positioning tool to position the cathode and the filament relative to one another by moving the mount portion when the clamp is released. The mount portion may include a tool receiving member to facilitate accurate positioning.
摘要翻译：公开了一种用于离子注入机系统的方法和夹紧系统，用于将阴极和细丝相对于彼此原位排列。本发明包括具有夹具的夹具系统，该夹具包括可分离地联接到第二夹紧构件的第一夹紧构件以及至少一个夹紧构件中的阴极和细丝之一的安装部分的开口。每个夹持构件包括与阴极和细丝之一的安装部分接合的表面。开口适于接收定位工具以通过在夹具被释放时移动安装部分来相对于彼此定位阴极和灯丝。安装部分可以包括工具接收构件以便于精确定位。

3. 发明申请

US20070125955A1 TECHNIQUES FOR PREVENTING PARASITIC BEAMLETS FROM AFFECTING ION IMPLANTATION 有权
标题翻译：防止离子植入的PARASITIC BEAMLETS的技术
公开(公告)号：US20070125955A1
公开(公告)日：2007-06-07
申请号：US11567485
申请日：2006-12-06
申请人： Russell LOW , Jonathan England , Stephen Krause , Eric Hermanson
发明人： Russell LOW , Jonathan England , Stephen Krause , Eric Hermanson
IPC分类号： H01J3/14
CPC分类号： H01J37/3171 , H01J37/09 , H01J37/15 , H01J37/18 , H01J37/302 , H01J37/3023 , H01J2237/0455 , H01J2237/0458 , H01J2237/1503 , H01J2237/182 , H01J2237/188 , H01J2237/30488 , H01J2237/31705 , H01L21/266
摘要： Techniques for preventing parasitic beamlets from affecting ion implantation are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for preventing parasitic beamlets from affecting ion implantation. The apparatus may comprise a controller that is configured to scan a spot beam back and forth, thereby forming an ion beam spanning a predetermined width. The apparatus may also comprise an aperture mechanism that, if kept stationary, allows the spot beam to pass through. The apparatus may further comprise a synchronization mechanism, coupled to the controller and the aperture mechanism, that is configured to cause the aperture mechanism to move in synchronization with the scanned spot beam, allowing the scanned spot beam to pass through but blocking one or more parasitic beamlets associated with the spot beam.
摘要翻译：公开了用于防止寄生子束影响离子注入的技术。在一个特定的示例性实施例中，技术可以被实现为用于防止寄生子束影响离子注入的装置。该装置可以包括配置成来回扫描点波束的控制器，从而形成横跨预定宽度的离子束。该装置还可以包括孔机构，如果保持静止，则允许点束通过。该装置还可以包括耦合到控制器和孔机构的同步机构，其被配置为使得孔径机构与扫描的点光束同步地移动，允许扫描的光束穿过但阻挡一个或多个寄生与点光束相关的子束。

4. 发明申请

US20070125957A1 TECHNIQUES FOR REDUCING EFFECTS OF PHOTORESIST OUTGASSING 有权
标题翻译：降低光电导体效果的技术
公开(公告)号：US20070125957A1
公开(公告)日：2007-06-07
申请号：US11567522
申请日：2006-12-06
申请人： Russell Low , Jonathan England , Stephen Krause , Eric Hermanson
发明人： Russell Low , Jonathan England , Stephen Krause , Eric Hermanson
IPC分类号： G01K1/08 , H01J3/14
CPC分类号： H01J37/3171 , H01J37/09 , H01J37/15 , H01J37/18 , H01J37/302 , H01J37/3023 , H01J2237/0455 , H01J2237/0458 , H01J2237/1503 , H01J2237/182 , H01J2237/188 , H01J2237/30488 , H01J2237/31705 , H01L21/266
摘要： Techniques for reducing effects of photoresist outgassing are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for reducing effects of photoresist outgassing in an ion implanter. The apparatus may comprise a drift tube located between an end-station and an upstream beamline component. The apparatus may also comprise a first variable aperture between the drift tube and the end-station. The apparatus may further comprise a second variable aperture between the drift tube and the upstream beamline component. The first variable aperture and the second variable aperture can be adjusted to facilitate differential pumping.
摘要翻译：公开了减少光阻剂除气效果的技术。在一个特定的示例性实施例中，技术可以被实现为用于减少离子注入机中的光致抗蚀剂除气的影响的装置。该装置可以包括位于终端站和上游束线组件之间的漂移管。该装置还可以包括漂移管和终端站之间的第一可变孔径。该装置还可以包括漂移管和上游束线部件之间的第二可变孔径。可以调节第一可变孔径和第二可变孔径以促进差动泵送。

5. 发明申请

US20050025699A1 Methods of making a niobium metal oxide and oxygen reduced niobium oxides 有权
标题翻译：制造铌金属氧化物和氧还原铌氧化物的方法
公开(公告)号：US20050025699A1
公开(公告)日：2005-02-03
申请号：US10848970
申请日：2004-05-19
申请人： David Reed , Sridhar Venigalla , Ricky Kitchell , Stephen Krause , Heather Enman , Dorran Schultz , Jeffrey Kerchner
发明人： David Reed , Sridhar Venigalla , Ricky Kitchell , Stephen Krause , Heather Enman , Dorran Schultz , Jeffrey Kerchner
IPC分类号： C01G33/00
CPC分类号： C01G33/00 , C01P2004/03 , C01P2004/51 , C01P2004/61 , C01P2004/62 , C01P2006/12 , C01P2006/14 , C01P2006/17 , C01P2006/40 , Y10T428/2982
摘要： Methods to at least partially reduce a niobium oxide are described wherein the process includes mixing the niobium oxide and niobium powder to form a powder mixture that is then heat treated to form heat treated particles which then undergo reacting in an atmosphere which permits the transfer of oxygen atoms from the niobium oxide to the niobium powder, and at a temperature and for a time sufficient to form an oxygen reduced niobium oxide. Oxygen reduced niobium oxides having high porosity are also described as well as capacitors containing anodes made from the oxygen reduced niobium oxides.
摘要翻译：描述了至少部分地还原铌氧化物的方法，其中所述方法包括将铌氧化物和铌粉末混合以形成粉末混合物，然后进行热处理以形成热处理颗粒，然后在允许氧气转移的气氛中进行反应原子从氧化铌到铌粉末，并在足以形成氧还原铌氧化物的温度和时间下进行。还描述了具有高孔隙率的氧还原铌氧化物以及包含由氧还原铌氧化物制成的阳极的电容器。

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