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    • 2. 发明授权
    • System and method for patterning a flexible substrate in a lithography tool
    • 在光刻工具中图案化柔性基板的系统和方法
    • US07292308B2
    • 2007-11-06
    • US11068165
    • 2005-03-01
    • Daniel N. GalburtStanley G. Janik
    • Daniel N. GalburtStanley G. Janik
    • G03B27/58G03B27/42
    • G03F7/707G03F7/70791H05K1/0393H05K3/0082
    • A system and method are used to feed a flexible substrate through a patterned beam to be exposed at target portions by the pattered beam. In one example, the flexible substrate is passed over a chuck (e.g., a vacuum chuck). In one example, the chuck can bias the flexible substrate against a chuck surface during alignment, focus, and exposure operations. By biasing the flexible substrate, the flexible substrate can continuously move while being held against the chuck. In one example, the flexible substrate is fed onto the vacuum chuck from a supply roller and fed off the chuck and wrapped on to a take-up roller. The supply and take-up rollers are rotated to follow the scanning motion, which minimizes or substantially eliminates tension on the flexible substrate during the exposure period.
    • 一种系统和方法用于通过图案化的束馈送柔性基板,以通过图案化的光束在目标部分处暴露。 在一个示例中,柔性基板通过卡盘(例如,真空卡盘)。 在一个示例中,卡盘可以在对准,聚焦和曝光操作期间将柔性基板偏置在卡盘表面上。 通过偏置柔性基板,柔性基板能够在被卡住的同时保持连续移动。 在一个示例中,将柔性基板从供应辊馈送到真空卡盘上并从卡盘送出并包裹到卷取辊上。 供应辊和卷取辊旋转以跟随扫描运动,这在曝光期间使柔性基板上的张力最小化或基本上消除。