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    • 3. 发明申请
    • STORAGE ELEMENT, STORAGE DEVICE, METHOD OF MANUFACTURING STORAGE ELEMENT, AND MAGNETIC HEAD
    • 存储元件,存储器件,存储元件的制造方法和磁头
    • US20140367814A1
    • 2014-12-18
    • US14299228
    • 2014-06-09
    • Sony Corporation
    • Hiroyuki OHMORIMasanori HOSOMIKazuhiro BESSHOYutaka HIGOKazutaka YAMANEHiroyuki UCHIDA
    • H01L43/02H01L43/12
    • H01L43/12G11C11/161H01L27/228H01L43/08
    • A storage element includes a layer structure, which includes a storage layer including magnetization perpendicular to the film surface, in which the magnetization direction is changed corresponding to information; a magnetization fixing layer including magnetization perpendicular to the film surface that becomes a reference for information stored on the storage layer; a tunnel barrier layer made from an oxide provided between the storage layer and the magnetization fixing layer; and a spin barrier layer made from an oxide provided contacting the surface of the opposite side of the storage layer to the surface contacting the tunnel barrier layer. A low resistance region is formed in a portion of the spin barrier layer formed with a predetermined set film thickness value and information storage on the storage layer is performed by changing the magnetization direction of the storage layer by current flowing in the stacking direction of the layer structure.
    • 存储元件包括层结构,其包括包含垂直于膜表面的磁化的存储层,其中磁化方向根据信息而改变; 磁化固定层,其包括垂直于膜表面的磁化,其成为存储在存储层上的信息的参考; 由设置在所述存储层和所述磁化固定层之间的氧化物制成的隧道势垒层; 以及由与存储层的相反侧的表面接触的氧化物形成的自旋势垒层与与隧道势垒层接触的表面。 在以预定的设定膜厚度值形成的自旋阻挡层的一部分中形成低电阻区域,并且通过在层的层叠方向上流动的电流改变存储层的磁化方向来进行存储层上的信息存储 结构体。