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    • 5. 发明授权
    • Method for fabricating thin-film interconnector
    • 制造薄膜互连器的方法
    • US5419038A
    • 1995-05-30
    • US78461
    • 1993-06-17
    • Wen-chou V. WangSolomon I. BeilinWilliam T. ChouDavid KudzumaMichael G. LeeMichael G. PetersJames J. RomanSom S. Swamy
    • Wen-chou V. WangSolomon I. BeilinWilliam T. ChouDavid KudzumaMichael G. LeeMichael G. PetersJames J. RomanSom S. Swamy
    • H05K1/11H05K1/14H05K3/00H05K3/46H05K3/36
    • H05K3/4691H05K2201/0394H05K3/002H05K3/0023H05K3/0041H05K3/467Y10T29/49124Y10T29/49126Y10T29/49165
    • A three dimensional thin-film interconnector is fabricated by depositing a dielectric layer onto the surface of a substrate, depositing a layer of conductive material onto the dielectric layer to form a signal plane, depositing a dielectric layer onto the surface of the signal plane, forming a plurality of through holes in the dielectric layer that extend to the signal plane, and filling the through holes with an electrically conductive material to form vias. The sequence of forming a signal plane, depositing a dielectric layer, forming a plurality of through holes, and filling the through holes is repeated until a predetermined number of signal planes and a predetermined arrangement of vias are obtained. The through holes are formed at locations in the dielectric layers corresponding to both predetermined electrical connections and the vias in a preceding dielectric layer. The signal planes are formed at different locations on the substrate. The sequence of signal planes and dielectric layers at the same location on the substrate form a signal plane set which defines a connector. Contact pads are deposited onto the surface of a final dielectric layer and electrically connect with each via. Wires are used to electrically connect the contact pads of one connector to corresponding contact pads of another connector. A portion of the substrate and dielectric layers not comprising a signal plane set is removed, forming electrical connectors flexibly attached by the plurality of wires.
    • 通过在衬底的表面上沉积介电层来制造三维薄膜互连器,在电介质层上沉积导电材料层以形成信号平面,在信号面的表面上沉积电介质层,形成 电介质层中的多个通孔延伸到信号平面,并用导电材料填充通孔以形成通孔。 重复形成信号平面,沉积介电层,形成多个通孔和填充通孔的顺序,直到获得预定数量的信号面和通孔的预定布置。 通孔形成在电介质层中对应于先前电介质层中的预定电连接和通路两者的位置处。 信号面形成在基板上的不同位置。 基板上相同位置处的信号平面和电介质层的顺序形成了限定连接器的信号平面组。 接触焊盘沉积在最终电介质层的表面上并与每个通孔电连接。 电线用于将一个连接器的接触焊盘电连接到另一个连接器的相应接触焊盘。 除去不包括信号平面组的衬底和电介质层的一部分,形成由多个电线柔性附接的电连接器。
    • 7. 发明授权
    • Environmentally friendly removal of photoresists used in wet etchable
polyimide processes
    • 用于湿法蚀刻聚酰亚胺工艺中的光刻胶的环保去除
    • US6159666A
    • 2000-12-12
    • US227238
    • 1999-01-08
    • David D. NgoSom S. Swamy
    • David D. NgoSom S. Swamy
    • G03F7/40G03F7/42
    • G03F7/40G03F7/425
    • Normally, a positive photoresist is developed with an alkaline aqueous solution to form patterns, and is subsequently stripped with an organic solvent after the photoresist has served its function. Such strippers are relatively toxic and damaging to the environment, and cannot be handled by standard (community) waste-water treatment facilities. These strippers cannot be easily neutralized, and must be disposed of in a highly specialized and relatively expensive manner. The present invention provides a method of treating positive and negative photoresists during their usage as photo masks such that the photoresists may be removed by less toxic chemicals which can be readily neutralized and handled by conventional waste water treatment facilities.
    • 通常,使用碱性水溶液显影正性光致抗蚀剂以形成图案,并且在光致抗蚀剂起作用之后随后用有机溶剂剥离。 这种剥离剂相对有毒,对环境有害,不能由标准(社区)废水处理设施处理。 这些脱模剂不能容易地中和,并且必须以高度专业化和相对昂贵的方式处理。 本发明提供了一种在使用期间将正性和负性光致抗蚀剂处理为光掩模的方法,使得光致抗蚀剂可以通过易于被常规废水处理设备中和和处理的毒性较小的化学品除去。