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1. 发明授权

US08094290B2 Illumination optical apparatus, exposure apparatus, and device manufacturing method 有权
标题翻译：照明光学装置，曝光装置和装置的制造方法
公开(公告)号：US08094290B2
公开(公告)日：2012-01-10
申请号：US12266321
申请日：2008-11-06
申请人： Soichi Owa , Osamu Tanitsu , Hirohisa Tanaka
发明人： Soichi Owa , Osamu Tanitsu , Hirohisa Tanaka
IPC分类号： G03B27/54 , G03B27/72 , G03B27/32
CPC分类号： G02B27/0905 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116 , G03F7/70583 , Y10T29/49826
摘要： An illumination optical system with a simple structure reduces the effects of illumination variations caused by a spatial coherency of illumination light, while maintaining a high usage efficiency of illumination light that is emitted in pulses. The illumination optical system illuminates an irradiated plane with pulse-emitted illumination light and includes a spatial light modulator including a plurality of mirror elements each of which spatially modulates the illumination light in accordance with an incident position of the illumination light. A modulation control unit controls the mirror elements, whenever at least one pulse of illumination light is emitted, in a manner such that the optical elements spatially modulate the pulses of illumination light differently from one another and form substantially the same intensity distribution for the pulses of illumination light on a predetermined plane.
摘要翻译：具有简单结构的照明光学系统降低了由照明光的空间相干性引起的照明变化的影响，同时保持以脉冲发射的照明光的高使用效率。照明光学系统用脉冲发射的照明光照射被照射的平面，并且包括空间光调制器，其包括多个反射镜元件，每个反射镜元件根据照明光的入射位置对照明光进行空间调制。每当发射照明光的至少一个脉冲时，调制控制单元控制镜元件，使得光学元件彼此空间地调制照明光的脉冲，并且形成基本相同的强度分布，用于脉冲的在预定平面上的照明光。

2. 发明申请

US20090115990A1 ILLUMINATION OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：照明光学装置，曝光装置和装置制造方法
公开(公告)号：US20090115990A1
公开(公告)日：2009-05-07
申请号：US12266321
申请日：2008-11-06
申请人： Soichi Owa , Osamu Tanitsu , Hirohisa Tanaka
发明人： Soichi Owa , Osamu Tanitsu , Hirohisa Tanaka
IPC分类号： G03B27/72 , G03B27/54 , G01J1/32 , B23P11/00
CPC分类号： G02B27/0905 , G02B26/0833 , G02B27/0927 , G03F7/70075 , G03F7/70116 , G03F7/70583 , Y10T29/49826
摘要： An illumination optical system with a simple structure reduces the effects of illumination variations caused by a spatial coherency of illumination light, while maintaining a high usage efficiency of illumination light that is emitted in pulses. The illumination optical system illuminates an irradiated plane with pulse-emitted illumination light and includes a spatial light modulator including a plurality of mirror elements each of which spatially modulates the illumination light in accordance with an incident position of the illumination light. A modulation control unit controls the mirror elements, whenever at least one pulse light is emitted, in a manner that the optical elements spatially modulate the illumination light differently from one another manner and forms substantially the same intensity distribution for the illumination light on a predetermined plane.
摘要翻译：具有简单结构的照明光学系统降低了由照明光的空间相干性引起的照明变化的影响，同时保持以脉冲发射的照明光的高使用效率。照明光学系统用脉冲发射的照明光照射被照射的平面，并且包括空间光调制器，其包括多个反射镜元件，每个反射镜元件根据照明光的入射位置对照明光进行空间调制。每当发射至少一个脉冲光时，调制控制单元控制镜元件，使得光学元件以不同的方式空间地调制照明光，并且在预定平面上对于照明光形成基本相同的强度分布。

3. 发明授权

US07515247B2 Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device 失效
标题翻译：照明光学系统，曝光装置和具有极化状态波动校正装置的曝光方法
公开(公告)号：US07515247B2
公开(公告)日：2009-04-07
申请号：US11979516
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

4. 发明申请

US20060171138A1 Illuminating optical system, exposure system and exposure method 审中-公开
标题翻译：照明光学系统，曝光系统和曝光方法
公开(公告)号：US20060171138A1
公开(公告)日：2006-08-03
申请号：US10565412
申请日：2004-06-29
申请人： Kenichi Muramatsu , Norio Komine , Osamu Tanitsu , Hirohisa Tanaka
发明人： Kenichi Muramatsu , Norio Komine , Osamu Tanitsu , Hirohisa Tanaka
IPC分类号： G01D11/28
CPC分类号： G03F7/70566
摘要： An illuminating optical system capable of preventing a change in the polarized status of a linearly polarized light passing through a light transmitting member formed of a cubic-system crystal material such as fluorite. An illuminating optical system comprising a light source unit (1) for suppling a linearly polarized light to illuminate surfaces (M, W) to be illuminated with a light from the light source unit. The system is provided with a polarized status switching means (10, 20) disposed on a light path between the light source unit and the surfaces to be illuminated, for switching the polarized status of a light, that illuminates the surfaces to be illuminated, between a linearly polarized status and a non-linearly polarized status. The polarized status switching means has a phase member (10) for changing the polarization surface of an incident linearly polarized light as needed, and a depolarizer (20) for depolarizing an incident linearly polarized light as needed. A phase advancing axis direction in association with the double refraction variation of a light transmitting member formed of fluorite is so set as to almost agree with or cross almost perpendicularly to the field vibration direction of a linearly polarized light incident to a light transmitting member.
摘要翻译：一种照明光学系统，其能够防止通过由诸如萤石的立方晶系晶体材料形成的透光构件的线偏振光的偏振状态的变化。一种照明光学系统，包括用于提供线性偏振光以照射要被来自光源单元的光照射的表面（M，W）的光源单元（1）。该系统设置有偏光状态切换装置（10,20），该偏振状态切换装置设置在光源单元和被照射表面之间的光路上，用于将照亮被照射的表面的光的偏振状态线性极化状态和非线性极化状态。极化状态切换装置具有用于根据需要改变入射的线偏振光的偏振面的相位构件（10）和根据需要对入射的线偏振光进行去偏振的消偏振器（20）。与萤石形成的透光构件的双折射变化相关的相位推进轴方向设定为几乎与入射到透光构件的线偏振光的场振动方向一致或几乎垂直。

5. 发明申请

US20060055834A1 Illumination optical system, exposure apparatus, and exposure method 有权
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20060055834A1
公开(公告)日：2006-03-16
申请号：US11140103
申请日：2005-05-31
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G02F1/1335
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

6. 发明申请

US20090284727A1 Illumination optical system, exposure apparatus, device manufacturing method, compensation filter, and exposure optical system 有权
标题翻译：照明光学系统，曝光装置，装置制造方法，补偿滤光片和曝光光学系统
公开(公告)号：US20090284727A1
公开(公告)日：2009-11-19
申请号：US12366429
申请日：2009-02-05
申请人： Kouji Muramatsu , Osamu Tanitsu , Hirohisa Tanaka , Masaya Yamamoto , Norio Miyake , Yasushi Mizuno , Ryuji Takaya , Risa Yoshimoto , Hiroyuki Hirota
发明人： Kouji Muramatsu , Osamu Tanitsu , Hirohisa Tanaka , Masaya Yamamoto , Norio Miyake , Yasushi Mizuno , Ryuji Takaya , Risa Yoshimoto , Hiroyuki Hirota
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G02B3/06 , G02B3/08 , G02B19/0014 , G02B19/0047 , G02B27/0927 , G02B27/0988 , G03F7/70141 , G03F7/70191 , G03F7/70308 , G03F7/70825
摘要： An illumination optical system is one for illuminating a surface to be illuminated with light from a light source, which has a distribution forming optical system including an optical integrator and forming a pupil intensity distribution on an illumination pupil located behind the optical integrator, and an optical attenuator arranged on a predetermined surface in an optical path behind the optical integrator and having an attenuation characteristic of varying an attenuation rate depending upon an angle of incidence to the predetermined surface.
摘要翻译：照明光学系统是用于利用来自光源的光照射被照射的表面的照明光学系统，其具有包括光学积分器的分布形成光学系统并且在位于光学积分器后面的照明光瞳上形成光瞳强度分布，以及光学衰减器布置在光学积分器后面的光路中的预定表面上，并且具有根据与预定表面的入射角度改变衰减率的衰减特性。

7. 发明申请

US20080094602A1 Illumination optical system, exposure apparatus, and exposure method 失效
公开(公告)号：US20080094602A1
公开(公告)日：2008-04-24
申请号：US11979516
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72 , G03B27/42
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.

8. 发明申请

US20080074632A1 Illumination optical system, exposure apparatus, and exposure method 失效
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20080074632A1
公开(公告)日：2008-03-27
申请号：US11979517
申请日：2007-11-05
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kenichi Muramatsu , Norio Komine , Hisashi Nishinaga , Tomoyuki Matsuyama , Takehito Kudo
IPC分类号： G03B27/72
CPC分类号： G03F7/70566 , G03B27/42 , G03F7/70091
摘要： An illumination optical system for, when installed in an exposure system, realizing a suitable illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of the light. The illumination optical system has a light source unit for supplying a linearly polarized light for illuminating surfaces to be illuminated therewith, and a polarized state changing device for changing the polarized state of the illuminating light from a predetermined polarized state to a nonpolarized state and vice versa. The polarized state changing device is arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing device can be removed from the illumination optical path and has a depolarizer for selectively depolarizing the incident linearly polarized light.
摘要翻译：一种照明光学系统，当安装在曝光系统中时，通过根据掩模的图案特性改变照明光的偏振状态，同时抑制光的强度损失，实现合适的照明条件。照明光学系统具有用于提供用于照射被照射的面的线偏振光的光源单元和用于将照明光的偏振状态从预定极化状态改变为非极化状态的偏振状态改变装置，反之亦然。偏光状态改变装置配置在光源单元与被照射面之间的光路中。可以从照明光路去除偏振状态改变装置，并且具有去偏振器，用于选择性地使入射的线偏振光去极化。

9. 发明授权

US09599905B2 Illumination optical system, exposure apparatus, device production method, and light polarization unit 有权
公开(公告)号：US09599905B2
公开(公告)日：2017-03-21
申请号：US14124034
申请日：2011-11-25
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
IPC分类号： G03B27/72 , G03F7/20 , G02B26/08 , G02B27/28 , G03F7/00
CPC分类号： G03F7/70191 , G02B26/0816 , G02B26/0833 , G02B27/286 , G03F7/0007 , G03F7/70116 , G03F7/70566
摘要： An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.

10. 发明申请

US20140233008A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, DEVICE PRODUCTION METHOD, AND LIGHT POLARIZATION UNIT 有权
标题翻译：照明光学系统，曝光装置，装置生产方法和光偏振装置
公开(公告)号：US20140233008A1
公开(公告)日：2014-08-21
申请号：US14124034
申请日：2011-11-25
申请人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
发明人： Osamu Tanitsu , Hirohisa Tanaka , Kinya Kato , Takashi Mori
IPC分类号： G03F7/20 , G02B26/08 , G02B27/28
CPC分类号： G03F7/70191 , G02B26/0816 , G02B26/0833 , G02B27/286 , G03F7/0007 , G03F7/70116 , G03F7/70566
摘要： An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an illumination pupil of the illumination optical system; and a polarization unit which is arranged in a position optically conjugate with the predetermined plane, and which polarizes an incident light beam having a first and second partial light beams, coming into the polarization unit such that the first and second partial light beams have polarization states different from each other, and emits the polarized incident light beam as an outgoing light beam, wherein the polarization unit changes, in a cross section of the outgoing light beam, a ratio between a cross sectional areas of the first and second partial light beams.
摘要翻译：照明光学系统，其利用来自光源的光照射照明物镜表面。照明光学系统包括：空间光调制器，其包括布置在预定平面内的多个光学元件，并分别控制，并且在照明光学系统的照明光瞳中形成光强度分布; 以及偏振单元，其布置在与所述预定平面光学共轭的位置，并且使具有第一和第二部分光束的入射光束偏振到所述偏振单元中，使得所述第一和第二部分光束具有偏振状态彼此不同，并且发射偏振入射光束作为输出光束，其中偏振单元在出射光束的横截面中改变第一和第二部分光束的横截面积之间的比率。

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