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    • 2. 发明申请
    • Seep Resistant Masking Material
    • 防水遮蔽材料
    • US20160067951A1
    • 2016-03-10
    • US14940374
    • 2015-11-13
    • Snotco, LLC
    • David J. Gruenwald
    • B32B37/12B32B1/00B32B7/14C09J7/02B32B37/20B32B41/00B05B15/04B05D7/00B29C65/00B32B38/00
    • A masking material and method of forming a masking tape that includes a substrate and an adhesive layer disposed on the substrate. Methods of manufacturing the masking material include features associated with forming a masking material having an adhesive layer that is preferably thicker than the substrate and includes features associated with providing an indicia associated with forming discrete rolls of the masking material with the desired degree of uniformity of an edge located adhesive. The method can also include substrate moisture, coating, and/or surface energy control or manipulation to achieve the desired adhesion between the adhesive and substrate associated with the masking material.
    • 一种掩模材料和形成掩模带的方法,所述遮蔽带包括基底和设置在基底上的粘合层。 制造掩模材料的方法包括与形成具有粘合剂层的掩模材料相关的特征,该掩蔽材料优选地比该基底更厚,并且包括与提供与形成掩模材料的离散辊的标记相关联的特征,所述标记具有期望的均匀度 边缘定位粘合剂。 该方法还可以包括底物水分,涂层和/或表面能量控制或操作,以实现与掩模材料相关联的粘合剂和基底之间的期望粘合。