专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20090260977A1 METHOD FOR MANUFACTURING WORKPIECES WITH ION-ETCHED SURFACE 有权
标题翻译：用离子蚀刻表面制造工件的方法
公开(公告)号：US20090260977A1
公开(公告)日：2009-10-22
申请号：US12427021
申请日：2009-04-21
申请人： Siegfried Krassnitzer , Oliver Gstoehl , Markus Esselbach
发明人： Siegfried Krassnitzer , Oliver Gstoehl , Markus Esselbach
IPC分类号： C23F4/00 , C25F3/02
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
摘要翻译：安装在转盘（19）上的工件的行星架（22）设置在真空室内。提供了用于包含离子（CL）的云的源（24），使得云的中心轴（ACL）拦截转盘（19）的旋转轴线（A20）。云（CL）在行星轴（A22）的移动路径（T）处具有离离约定中心轴（ACL）一定距离处的最大离子密度的50％的离子密度分布，行星架（22）的直径。当行星齿轮架（22）上的工件被包含离子的云所蚀刻时，被蚀刻掉的物质基本上不会重新沉积在相邻的行星架上，而是朝向真空室的壁喷射。

2. 发明授权

US08864959B2 Method for manufacturing workpieces with ion-etched surface 有权
标题翻译：用离子刻蚀表面制造工件的方法
公开(公告)号：US08864959B2
公开(公告)日：2014-10-21
申请号：US12427021
申请日：2009-04-21
申请人： Siegfried Krassnitzer , Oliver Gstoehl , Markus Esselbach
发明人： Siegfried Krassnitzer , Oliver Gstoehl , Markus Esselbach
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00 , B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C23C16/00 , H01J37/32
CPC分类号： H01J37/32 , H01J2237/334
摘要： Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50% of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.
摘要翻译：安装在转盘（19）上的工件的行星架（22）设置在真空室内。提供了用于包含离子（CL）的云的源（24），使得云的中心轴（ACL）拦截转盘（19）的旋转轴线（A20）。云（CL）在行星轴（A22）的移动路径（T）处具有离离约定中心轴（ACL）一定距离处的最大离子密度的50％的离子密度分布，行星架（22）的直径。当行星齿轮架（22）上的工件被包含离子的云所蚀刻时，被蚀刻掉的物质基本上不会重新沉积在相邻的行星架上，而是朝向真空室的壁喷射。

3. 发明申请

US20140369387A1 METHOD FOR THE TEMPERATURE MEASUREMENT OF SUBSTRATES IN A VACUUM CHAMBER 审中-公开
标题翻译：基板在真空室中的温度测量方法
公开(公告)号：US20140369387A1
公开(公告)日：2014-12-18
申请号：US14345019
申请日：2012-09-07
申请人： Siegfried Krassnitzer , Markus Esselbach
发明人： Siegfried Krassnitzer , Markus Esselbach
IPC分类号： G01K7/10 , G01K7/04
CPC分类号： G01K7/10 , G01J5/0003 , G01J5/0007 , G01J5/061 , G01J2005/0048 , G01J2005/065 , G01J2005/068 , G01K7/04
摘要： The present invention relates to a temperature-measuring system, comprising a temperature sensor and a reference body, wherein means for determining temperature changes of the reference body and/or for control of the temperature of the reference body are provided. When the temperature measuring-system is used in a vacuum, the reference body forms no substantial material thermal bridges to the temperature sensor and the reference body shields the temperature sensor with respect to the environment in such a way that only radiation that comes from the surfaces of the reference and from surfaces of which the temperature is to be determined reaches the surface of the temperature sensor.
摘要翻译：本发明涉及一种温度测量系统，包括温度传感器和参考体，其中提供了用于确定参考体的温度变化和/或用于控制参考体的温度的装置。当在真空中使用温度测量系统时，参考体不形成温度传感器的实质材料热桥，并且参考体相对于环境屏蔽温度传感器，使得只有来自表面的辐射的参考值和从其表面测定温度到达温度传感器的表面。

4. 发明授权

US11264216B2 Modifiable magnet configuration for arc vaporization sources 有权
公开(公告)号：US11264216B2
公开(公告)日：2022-03-01
申请号：US13148384
申请日：2009-12-30
申请人： Siegfried Krassnitzer , Juerg Hagmann , Oliver Gstoehl
发明人： Siegfried Krassnitzer , Juerg Hagmann , Oliver Gstoehl
IPC分类号： H01J37/32 , H01J37/34 , C23C14/32
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.

5. 发明申请

US20110308941A1 MODIFIABLE MAGNET CONFIGURATION FOR ARC VAPORIZATION SOURCES 审中-公开
标题翻译：用于弧蒸发源的可修改磁体配置
公开(公告)号：US20110308941A1
公开(公告)日：2011-12-22
申请号：US13148384
申请日：2009-12-30
申请人： Siegfried Krassnitzer , Juerg Hagmann , Oliver Gstoehl
发明人： Siegfried Krassnitzer , Juerg Hagmann , Oliver Gstoehl
IPC分类号： C23C14/24
CPC分类号： H01J37/3266 , C23C14/325 , H01J37/32055 , H01J37/3455 , H01J37/3458
摘要： The present invention relates to an arc vaporization source for generating hard surface coatings on tools. The invention comprises an arc-vaporization source, comprising at least one electric solenoid and a permanent magnet arrangement that is displaceable relative to the target surface. The vaporization source can be adjusted to the different requirements of oxide, nitride, or metal coatings. The rate drop during the lifespan of a target to be vaporized can be held constant or adjusted by suitably adjusting the distance of the permanent magnets to the front side of the target. A compromise between the coating roughness and rate can be set.
摘要翻译：本发明涉及一种用于在工具上产生硬表面涂层的电弧蒸发源。本发明包括电弧蒸发源，其包括至少一个电螺线管和相对于目标表面可移位的永磁体装置。蒸发源可以根据氧化物，氮化物或金属涂层的不同要求进行调整。可以通过适当地调节永久磁铁与目标的前侧的距离，使待蒸发的目标的寿命期间的速率下降保持不变或调节。可以设置涂层粗糙度和速率之间的折衷。

6. 发明申请

US20110220495A1 IGNITION APPARATUS FOR ARC SOURCES 审中-公开
标题翻译：点火装置用于电弧源
公开(公告)号：US20110220495A1
公开(公告)日：2011-09-15
申请号：US13127489
申请日：2009-10-08
申请人： Siegfried Krassnitzer , Oliver Gstoehl , Juerg Hagmann
发明人： Siegfried Krassnitzer , Oliver Gstoehl , Juerg Hagmann
IPC分类号： C23C14/32 , C23C14/34
CPC分类号： H01J37/32 , C23F1/08 , H01J37/32009 , H01J37/32055
摘要： The present invention relates to an ignition device for igniting a high-current discharge of an electrical arc evaporator in a vacuum coating system. Ignition is performed by means of mechanically closing and opening a contact between the cathode and the anode. Contact is established by means of an ignition finger that can move on a forced path. On account of the forced path, the ignition finger can be moved by means of a simple mechanical drive to a park position, which is protected against coating, and said ignition finger can also be used to ignite a second target.
摘要翻译：点火装置技术领域本发明涉及一种用于点燃真空镀膜系统中电弧蒸发器的高电流放电的点火装置。通过机械地闭合和打开阴极和阳极之间的接触来进行点火。通过可在强制路径上移动的点火指示器建立接触。由于强制路径，点火指可以通过简单的机械驱动移动到停止位置，防止被涂覆，并且所述点火指也可用于点燃第二目标。

7. 发明授权

US09657389B2 Target for spark vaporization with physical limiting of the propagation of the spark 有权
公开(公告)号：US09657389B2
公开(公告)日：2017-05-23
申请号：US13641499
申请日：2011-01-10
申请人： Siegfried Krassnitzer , Juerg Hagmann
发明人： Siegfried Krassnitzer , Juerg Hagmann
IPC分类号： C23C14/00 , C23C14/32 , H01J37/305 , H01J37/32
CPC分类号： C23C14/325 , H01J37/305 , H01J37/32614
摘要： The present invention relates to a target for an ARC source having a first body (3) of a material to be vaporized, which essentially comprises in one plane a surface which is intended to be vaporized, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body (7) is provided, which is preferably in the form of a disk and is electrically isolated from the first body (3), in such a way that the second body (7) can essentially provide no electrons for maintaining a spark.

8. 发明授权

US09376745B2 High-power sputtering source 有权
标题翻译：大功率溅射源
公开(公告)号：US09376745B2
公开(公告)日：2016-06-28
申请号：US14112618
申请日：2012-03-30
申请人： Siegfried Krassnitzer , Kurt Ruhm
发明人： Siegfried Krassnitzer , Kurt Ruhm
IPC分类号： C23C14/34 , C23C14/35 , H01J37/34
CPC分类号： C23C14/35 , C23C14/352 , H01J37/3405 , H01J37/3444 , H01J37/3464 , H01J37/3467 , H01J37/3497
摘要： The invention relates to a magnetron sputtering process that allows material to be sputtered from a target surface in such a way that a high percentage of the sputtered material is provided in the form of ions. According to the invention, said aim is achieved using a simple generator, the power of which is fed to multiple magnetron sputtering sources spread out over several time intervals, i.e. the maximum power is supplied to one sputtering source during one time interval, and the maximum power is supplied to the following sputtering source in the subsequent time interval, such that discharge current densities of more than 0.2 A/cm2 are obtained. The sputtering target can cool down during the off time, thus preventing the temperature limit from being exceeded.
摘要翻译：本发明涉及一种磁控溅射工艺，其允许材料以目标表面溅射，使得高比例的溅射材料以离子的形式提供。根据本发明，使用简单的发生器实现所述目的，其功率被馈送到在多个时间间隔内分布的多个磁控溅射源，即在一个时间间隔期间将最大功率提供给一个溅射源，并且最大值在随后的时间间隔内向下一个溅射源供电，从而获得大于0.2A / cm 2的放电电流密度。溅射靶可以在关闭时间内冷却，从而防止超出温度限制。

9. 发明申请

US20130126347A1 ARC DEPOSITION SOURCE HAVING A DEFINED ELECTRIC FIELD 审中-公开
标题翻译：具有定义电场的ARC沉积源
公开(公告)号：US20130126347A1
公开(公告)日：2013-05-23
申请号：US13805730
申请日：2011-06-03
申请人： Siegfried Krassnitzer , Juerg Hagmann
发明人： Siegfried Krassnitzer , Juerg Hagmann
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/0089 , C23C14/021 , C23C14/325 , C23C14/5873 , H01J37/32055
摘要： The invention relates to an arc deposition device, comprising a cathode, an anode, as well as a voltage source for putting the anode at positive potential relative to the cathode. The device also comprises magnetic elements, which cause a magnetic field over the cathode surface, wherein the anode is arranged in the vicinity of the cathode in such a way that the magnetic field lines exiting from the cathode surface hit the anode.
摘要翻译：本发明涉及一种电弧沉积装置，其包括阴极，阳极以及用于将阳极相对于阴极置于正电位的电压源。该装置还包括在阴极表面上产生磁场的磁性元件，其中阳极被布置在阴极附近，使得从阴极表面离开的磁场线撞击阳极。

10. 发明申请

US20090107396A1 Vacuum chamber on a frame basis for coating installations 有权
标题翻译：真空室用于涂装设备
公开(公告)号：US20090107396A1
公开(公告)日：2009-04-30
申请号：US12259910
申请日：2008-10-28
申请人： Fredy Zund , Marco Mayer , Siegfried Krassnitzer , Jurgen Gwehenberger
发明人： Fredy Zund , Marco Mayer , Siegfried Krassnitzer , Jurgen Gwehenberger
IPC分类号： C23C14/00
CPC分类号： C23C16/44 , C23C14/22
摘要： The present invention relates to a vacuum chamber and to its production. According to the invention, the vacuum chamber comprises a frame into which insert plates are placed. The insert plates form together with the frame a closed space in which a vacuum can be created. Preferably, the shell of the frame is extracted from an integrally formed metal piece, with a large portion of material being removed, leading to openings for the insert plates to be created. This has among others the advantage that no welding seams are necessary where the individual plates are inserted.
摘要翻译：本发明涉及真空室及其生产。根据本发明，真空室包括其中放置有插入板的框架。插入板与框架一起形成封闭空间，其中可以产生真空。优选地，框架的外壳从整体形成的金属件中取出，大部分材料被移除，导致用于插入板的产生的开口。这其中还有一个优点是在插入单个板时不需要焊缝。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式