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1. 发明申请

US20110294259A1 NONVOLATILE MEMORY ELEMENT, MANUFACTURING METHOD THEREOF, AND NONVOLATILE SEMICONDUCTOR APPARATUS USING THE NONVOLATILE MEMORY ELEMENT 有权
标题翻译：非易失性存储元件，其制造方法和使用非易失性存储元件的非易失性半导体器件
公开(公告)号：US20110294259A1
公开(公告)日：2011-12-01
申请号：US13205408
申请日：2011-08-08
申请人： Yoshihiko KANZAWA , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
发明人： Yoshihiko KANZAWA , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
IPC分类号： H01L21/36
CPC分类号： H01L27/101 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C2013/0073 , G11C2213/32 , G11C2213/71 , G11C2213/72 , G11C2213/79 , H01L27/2409 , H01L27/2436 , H01L27/2481 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625 , H01L45/1675 , Y10S438/90
摘要： A nonvolatile memory element comprises a first electrode layer (103), a second electrode (107), and a resistance variable layer (106) which is disposed between the first electrode layer (103) and the second electrode layer (107), a resistance value of the resistance variable layer varying reversibly according to electric signals having different polarities which are applied between the electrodes (103), (107), wherein the resistance variable layer (106) has a first region comprising a first oxygen-deficient tantalum oxide having a composition represented by TaOx (0
摘要翻译：非易失性存储元件包括设置在第一电极层（103）和第二电极层（107）之间的第一电极层（103），第二电极（107）和电阻变化层（106），电阻电阻变化层的值根据施加在电极（103），（107）之间的具有不同极性的电信号而可逆地变化，其中电阻变化层（106）具有第一区域，该第一区域包括第一氧缺陷型氧化钽，由TaOx（0

2. 发明申请

US20120044749A1 VARIABLE RESISTANCE NONVOLATILE STORAGE DEVICE AND METHOD OF FORMING MEMORY CELL 审中-公开
标题翻译：可变电阻非易失性存储器件及形成存储器单元的方法
公开(公告)号：US20120044749A1
公开(公告)日：2012-02-23
申请号：US13266932
申请日：2010-11-02
申请人： Shunsaku Muraoka , Yoshihiko Kanzawa , Takeshi Takagi , Kazuhiko Shimakawa
发明人： Shunsaku Muraoka , Yoshihiko Kanzawa , Takeshi Takagi , Kazuhiko Shimakawa
IPC分类号： G11C11/00 , H01L21/8239 , H01L45/00
CPC分类号： H01L27/2436 , G11C13/0007 , G11C2213/32 , G11C2213/34 , G11C2213/79 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625
摘要： A variable resistance nonvolatile storage device which includes (i) a semiconductor substrate (301), (ii) a variable resistance element (309) having: lower and upper electrodes (309a, 309c); and a variable resistance layer (309b) whose resistance value reversibly varies based on voltage signals each of which has a different polarity and is applied between the electrodes (309a, 309c), and (iii) a MOS transistor (317) formed on the substrate (301), wherein the variable resistance layer (309b) includes: oxygen-deficient transition metal oxide layers (309b-1, 309b-2) having compositions MOx and MOy (where x
摘要翻译：一种可变电阻非易失性存储装置，包括：（i）半导体衬底（301），（ii）具有下电极和上电极（309a，309c）的可变电阻元件（309）和可变电阻层（309b），其电阻值基于各自具有不同极性的电压信号而被可逆地变化并施加在电极（309a，309c）之间，以及（iii）形成在基板上的MOS晶体管（301），其中所述可变电阻层（309b）包括：具有组成MOx和MOy（其中x

3. 发明授权

US08022502B2 Nonvolatile memory element, manufacturing method thereof, and nonvolatile semiconductor apparatus using the nonvolatile memory element 有权
标题翻译：非易失性存储元件及其制造方法以及使用非易失性存储元件的非易失性半导体装置
公开(公告)号：US08022502B2
公开(公告)日：2011-09-20
申请号：US12307211
申请日：2008-03-26
申请人： Yoshihiko Kanzawa , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
发明人： Yoshihiko Kanzawa , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
IPC分类号： H01L47/00
CPC分类号： H01L27/101 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C2013/0073 , G11C2213/32 , G11C2213/71 , G11C2213/72 , G11C2213/79 , H01L27/2409 , H01L27/2436 , H01L27/2481 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625 , H01L45/1675 , Y10S438/90
摘要： A nonvolatile memory element comprises a first electrode layer (103), a second electrode (107), and a resistance variable layer (106) which is disposed between the first electrode layer (103) and the second electrode layer (107), a resistance value of the resistance variable layer varying reversibly according to electric signals having different polarities which are applied between the electrodes (103), (107), wherein the resistance variable layer (106) has a first region comprising a first oxygen-deficient tantalum oxide having a composition represented by TaOx (0
摘要翻译：非易失性存储元件包括设置在第一电极层（103）和第二电极层（107）之间的第一电极层（103），第二电极（107）和电阻变化层（106），电阻电阻变化层的值根据施加在电极（103），（107）之间的具有不同极性的电信号而可逆地变化，其中电阻变化层（106）具有第一区域，该第一区域包括第一氧缺陷型氧化钽，由TaOx（0

4. 发明授权

US08445319B2 Nonvolatile memory element, manufacturing method thereof, and nonvolatile semiconductor apparatus using the nonvolatile memory element 有权
标题翻译：非易失性存储元件及其制造方法以及使用非易失性存储元件的非易失性半导体装置
公开(公告)号：US08445319B2
公开(公告)日：2013-05-21
申请号：US13205408
申请日：2011-08-08
申请人： Yoshihiko Kanzawa , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
发明人： Yoshihiko Kanzawa , Koji Katayama , Satoru Fujii , Shunsaku Muraoka , Koichi Osano , Satoru Mitani , Ryoko Miyanaga , Takeshi Takagi , Kazuhiko Shimakawa
IPC分类号： H01L47/00
CPC分类号： H01L27/101 , G11C13/0007 , G11C13/004 , G11C13/0069 , G11C2013/0073 , G11C2213/32 , G11C2213/71 , G11C2213/72 , G11C2213/79 , H01L27/2409 , H01L27/2436 , H01L27/2481 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625 , H01L45/1675 , Y10S438/90
摘要： A nonvolatile memory element comprises a first electrode layer (103), a second electrode (107), and a resistance variable layer (106) which is disposed between the first electrode layer (103) and the second electrode layer (107), a resistance value of the resistance variable layer varying reversibly according to electric signals having different polarities which are applied between the electrodes (103), (107), wherein the resistance variable layer (106) has a first region comprising a first oxygen-deficient tantalum oxide having a composition represented by TaOx (0
摘要翻译：非易失性存储元件包括设置在第一电极层（103）和第二电极层（107）之间的第一电极层（103），第二电极（107）和电阻变化层（106），电阻电阻变化层的值根据施加在电极（103），（107）之间的具有不同极性的电信号而可逆地变化，其中电阻变化层（106）具有第一区域，该第一区域包括第一氧缺陷型氧化钽，由TaOx（0

5. 发明申请

US20110044088A1 VARIABLE RESISTANCE NONVOLATILE STORAGE DEVICE AND METHOD OF FORMING MEMORY CELL 有权
标题翻译：可变电阻非易失性存储器件及形成存储器单元的方法
公开(公告)号：US20110044088A1
公开(公告)日：2011-02-24
申请号：US12743472
申请日：2009-08-20
申请人： Shunsaku Muraoka , Yoshihiko Kanzawa , Satoru Mitani , Koji Katayama , Kazuhiko Shimakawa , Satoru Fujii , Takeshi Takagi
发明人： Shunsaku Muraoka , Yoshihiko Kanzawa , Satoru Mitani , Koji Katayama , Kazuhiko Shimakawa , Satoru Fujii , Takeshi Takagi
IPC分类号： G11C11/34 , H01L27/105 , H01L21/02
CPC分类号： H01L45/147 , G11C13/0007 , G11C13/0069 , G11C2013/009 , G11C2213/15 , G11C2213/32 , G11C2213/34 , G11C2213/79 , H01L27/2436 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625 , H01L45/1675
摘要： A variable resistance nonvolatile storage device which includes (i) a semiconductor substrate (301), (ii) a variable resistance element (309) having: lower and upper electrodes (309a, 309c); and a variable resistance layer (309b) whose resistance value reversibly varies based on voltage signals each of which has a different polarity and is applied between the electrodes (309a, 309c), and (iii) a MOS transistor (317) formed on the substrate (301), wherein the variable resistance layer (309b) includes: oxygen-deficient transition metal oxide layers (309b-1, 309b-2) having compositions MOx and MOy (where x
摘要翻译：一种可变电阻非易失性存储装置，包括：（i）半导体衬底（301），（ii）具有下电极和上电极（309a，309c）的可变电阻元件（309）和可变电阻层（309b），其电阻值基于各自具有不同极性的电压信号而被可逆地变化并施加在电极（309a，309c）之间，以及（iii）形成在基板上的MOS晶体管（301），其中所述可变电阻层（309b）包括：具有组成MOx和MOy（其中x

6. 发明授权

US08553444B2 Variable resistance nonvolatile storage device and method of forming memory cell 有权
标题翻译：可变电阻非易失性存储器件和形成存储单元的方法
公开(公告)号：US08553444B2
公开(公告)日：2013-10-08
申请号：US12743472
申请日：2009-08-20
申请人： Shunsaku Muraoka , Yoshihiko Kanzawa , Satoru Mitani , Koji Katayama , Kazuhiko Shimakawa , Satoru Fujii , Takeshi Takagi
发明人： Shunsaku Muraoka , Yoshihiko Kanzawa , Satoru Mitani , Koji Katayama , Kazuhiko Shimakawa , Satoru Fujii , Takeshi Takagi
IPC分类号： G11C11/00
CPC分类号： H01L45/147 , G11C13/0007 , G11C13/0069 , G11C2013/009 , G11C2213/15 , G11C2213/32 , G11C2213/34 , G11C2213/79 , H01L27/2436 , H01L45/08 , H01L45/1233 , H01L45/146 , H01L45/1625 , H01L45/1675
摘要： A variable resistance nonvolatile storage device which includes (i) a semiconductor substrate (301), (ii) a variable resistance element (309) having: lower and upper electrodes (309a, 309c); and a variable resistance layer (309b) whose resistance value reversibly varies based on voltage signals each of which has a different polarity and is applied between the electrodes (309a, 309c), and (iii) a MOS transistor (317) formed on the substrate (301), wherein the variable resistance layer (309b) includes: oxygen-deficient transition metal oxide layers (309b-1, 309b-2) having compositions MOX and MOy (where x
摘要翻译：一种可变电阻非易失性存储装置，包括：（i）半导体衬底（301），（ii）具有下电极和上电极（309a，309c）的可变电阻元件（309）和可变电阻层（309b），其电阻值基于各自具有不同极性的电压信号而被可逆地变化并施加在电极（309a，309c）之间，以及（iii）形成在基板上的MOS晶体管（301），其中所述可变电阻层（309b）包括：具有组成MOX和MOy（其中x

7. 发明申请

US20110122680A1 VARIABLE RESISTANCE NONVOLATILE MEMORY DEVICE 有权
标题翻译：可变电阻非易失性存储器件
公开(公告)号：US20110122680A1
公开(公告)日：2011-05-26
申请号：US13054312
申请日：2010-04-14
申请人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
发明人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
IPC分类号： G11C11/21
CPC分类号： G11C13/0007 , G11C13/0069 , G11C2013/0073 , G11C2213/12 , G11C2213/15 , G11C2213/34 , G11C2213/72 , H01L27/24
摘要： A nonvolatile resistance variable memory device (100) includes memory cells (M11, M12, . . . ) in each of which a variable resistance element (R11, R12, . . . ) including a variable resistance layer placed between and in contact with a first electrode and a second electrode, and a current steering element (D11, D12, . . . ) including a current steering layer placed between and in contact with a third electrode and a fourth electrode, are connected in series, and the device is driven by a first LR drive circuit (105a1) via a current limit circuit (105b) to decrease resistance of the variable resistance element while the device is driven by a second HR drive circuit (105a2) to increase resistance of the variable resistance element, thus using the current limit circuit (105b) to make a current for decreasing resistance of the variable resistance element lower than a current for increasing resistance of the variable resistance element.
摘要翻译：一种非易失性电阻可变存储器件（100）包括存储单元（M11，M12 ...），每个存储单元包括可变电阻元件（R11，R12 ...），该可变电阻元件（R11，R12 ...）第一电极和第二电极，以及包括放置在第三电极和第四电极之间并与第三电极和第四电极接触的电流导向层的电流导向元件（D11，D12 ...）串联连接，并且驱动该装置通过第一LR驱动电路（105a1）经由限流电路（105b），以在器件被第二HR驱动电路（105a2）驱动时降低可变电阻元件的电阻，以增加可变电阻元件的电阻，从而使用电流限制电路（105b），用于使可变电阻元件的电阻降低的电流低于用于增加可变电阻元件的电阻的电流。

8. 发明申请

US20100177555A1 VARIABLE RESISTANCE NONVOLATILE STORAGE DEVICE 有权
标题翻译：可变电阻非易失存储器件
公开(公告)号：US20100177555A1
公开(公告)日：2010-07-15
申请号：US12676933
申请日：2008-12-15
申请人： Kazuhiko Shimakawa , Yoshihiko Kanzawa , Satoru Mitani , Shunsaku Muraoka
发明人： Kazuhiko Shimakawa , Yoshihiko Kanzawa , Satoru Mitani , Shunsaku Muraoka
IPC分类号： G11C11/00 , H01L45/00 , G11C8/08
CPC分类号： H01L27/101 , G11C13/0007 , G11C2213/32 , G11C2213/79 , H01L27/2436 , H01L45/08 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/1625
摘要： The variable resistance nonvolatile storage device includes a memory cell (300) that is formed by connecting in series a variable resistance element (309) including a variable resistance layer (309b) which reversibly changes based on electrical signals each having a different polarity and a transistor (317) including a semiconductor substrate (301) and two N-type diffusion layer regions (302a, 302b), wherein the variable resistance layer (309b) includes an oxygen-deficient oxide of a transition metal, lower and upper electrodes (309a, 309c) are made of materials of different elements, a standard electrode potential V1 of the lower electrode (309a), a standard electrode potential V2 of the upper electrode (309c), and a standard electrode potential Vt of the transition metal satisfy Vt
摘要翻译：可变电阻非易失性存储装置包括通过串联连接可变电阻元件（309）形成的存储单元（300），该可变电阻元件（309）包括基于各自具有不同极性的电信号可逆地改变的可变电阻层（309b）和晶体管（307），包括半导体衬底（301）和两个N型扩散层区域（302a，302b），其中可变电阻层（309b）包括过渡金属的氧缺乏氧化物，下电极和上电极（309a， 309c）的材料由下部电极（309a）的标准电极电位V1，上部电极（309c）的标准电极电位V2，过渡金属的标准电极电位Vt满足Vt

9. 发明授权

US08441837B2 Variable resistance nonvolatile memory device 有权
标题翻译：可变电阻非易失性存储器件
公开(公告)号：US08441837B2
公开(公告)日：2013-05-14
申请号：US13054312
申请日：2010-04-14
申请人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
发明人： Yuuichirou Ikeda , Kazuhiko Shimakawa , Yoshihiko Kanzawa , Shunsaku Muraoka , Ryotaro Azuma
IPC分类号： G11C11/00
CPC分类号： G11C13/0007 , G11C13/0069 , G11C2013/0073 , G11C2213/12 , G11C2213/15 , G11C2213/34 , G11C2213/72 , H01L27/24
摘要： A nonvolatile resistance variable memory device (100) includes memory cells (M11, M12, . . . ) in each of which a variable resistance element (R11, R12, . . . ) including a variable resistance layer placed between and in contact with a first electrode and a second electrode, and a current steering element (D11, D12, . . . ) including a current steering layer placed between and in contact with a third electrode and a fourth electrode, are connected in series, and the device is driven by a first LR drive circuit (105a1) via a current limit circuit (105b) to decrease resistance of the variable resistance element while the device is driven by a second HR drive circuit (105a2) to increase resistance of the variable resistance element, thus using the current limit circuit (105b) to make a current for decreasing resistance of the variable resistance element lower than a current for increasing resistance of the variable resistance element.
摘要翻译：一种非易失性电阻可变存储器件（100）包括存储单元（M11，M12 ...），每个存储单元包括可变电阻元件（R11，R12 ...），该可变电阻元件（R11，R12 ...）第一电极和第二电极，以及包括放置在第三电极和第四电极之间并与第三电极和第四电极接触的电流导向层的电流导向元件（D11，D12 ...）串联连接，并且驱动该装置通过第一LR驱动电路（105a1）经由限流电路（105b），以在器件被第二HR驱动电路（105a2）驱动时降低可变电阻元件的电阻，以增加可变电阻元件的电阻，从而使用电流限制电路（105b），用于使可变电阻元件的电阻降低的电流低于用于增加可变电阻元件的电阻的电流。

10. 发明授权

US08094485B2 Variable resistance nonvolatile storage device with oxygen-deficient oxide layer and asymmetric substrate bias effect 有权
标题翻译：具有氧缺陷氧化层的可变电阻非易失性存储器件和不对称衬底偏置效应
公开(公告)号：US08094485B2
公开(公告)日：2012-01-10
申请号：US12676933
申请日：2008-12-15
申请人： Kazuhiko Shimakawa , Yoshihiko Kanzawa , Satoru Mitani , Shunsaku Muraoka
发明人： Kazuhiko Shimakawa , Yoshihiko Kanzawa , Satoru Mitani , Shunsaku Muraoka
IPC分类号： G11C11/00
CPC分类号： H01L27/101 , G11C13/0007 , G11C2213/32 , G11C2213/79 , H01L27/2436 , H01L45/08 , H01L45/1233 , H01L45/1253 , H01L45/146 , H01L45/1625
摘要： The variable resistance nonvolatile storage device includes a memory cell (300) that is formed by connecting in series a variable resistance element (309) including a variable resistance layer (309b) which reversibly changes based on electrical signals each having a different polarity and a transistor (317) including a semiconductor substrate (301) and two N-type diffusion layer regions (302a, 302b), wherein the variable resistance layer (309b) includes an oxygen-deficient oxide of a transition metal, lower and upper electrodes (309a, 309c) are made of materials of different elements, a standard electrode potential V1 of the lower electrode (309a), a standard electrode potential V2 of the upper electrode (309c), and a standard electrode potential Vt of the transition metal satisfy Vt
摘要翻译：可变电阻非易失性存储装置包括通过串联连接可变电阻元件（309）形成的存储单元（300），该可变电阻元件（309）包括基于各自具有不同极性的电信号可逆地改变的可变电阻层（309b）和晶体管（307），包括半导体衬底（301）和两个N型扩散层区域（302a，302b），其中可变电阻层（309b）包括过渡金属的氧缺乏氧化物，下电极和上电极（309a， 309c）的材料由下部电极（309a）的标准电极电位V1，上部电极（309c）的标准电极电位V2，过渡金属的标准电极电位Vt满足Vt

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