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1. 发明申请

US20100255418A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物及其形成方法
公开(公告)号：US20100255418A1
公开(公告)日：2010-10-07
申请号：US12754441
申请日：2010-04-05
申请人： Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
发明人： Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
IPC分类号： G03F7/20 , G03F7/004 , C07C309/32 , C07D217/22
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/00 , C07C309/10 , C07C309/14 , C07C309/17 , C07C309/42 , C07C311/09 , C07C311/48 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/18 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07C2603/90 , C07D333/46 , C07D333/76 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n≧1, m≧2 and n
摘要翻译：根据一个实施方案，光化学射线或辐射敏感性树脂组合物包含具有n个碱性基团和m个基团的碱性化合物（C），当暴露于光化射线或辐射时，产生酸，条件是n和m满足关系n≥1，m≥2，n

2. 发明授权

US09551928B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith 有权
标题翻译：光化学射线或辐射敏感性树脂组合物及其形成图案的方法
公开(公告)号：US09551928B2
公开(公告)日：2017-01-24
申请号：US12754441
申请日：2010-04-05
申请人： Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
发明人： Shuhei Yamaguchi , Hisamitsu Tomeba , Mitsuhiro Fujita
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07C309/14 , C07C309/00 , C07C309/10 , C07C309/17 , C07C309/42 , C07C311/09 , C07C311/48 , C07C381/12 , C07D333/46 , C07D333/76 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0045 , C07C303/32 , C07C309/00 , C07C309/10 , C07C309/14 , C07C309/17 , C07C309/42 , C07C311/09 , C07C311/48 , C07C381/12 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/18 , C07C2603/68 , C07C2603/74 , C07C2603/86 , C07C2603/90 , C07D333/46 , C07D333/76 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/38
摘要： According to one embodiment, An actinic-ray- or radiation-sensitive resin composition comprises a basic compound (C) having n basic groups and m groups that when exposed to actinic rays or radiation, generate an acid, provided that n and m satisfy the relationships n≧1, m≧2 and n
摘要翻译：根据一个实施方案，光化学射线或辐射敏感性树脂组合物包含具有n个碱性基团和m个基团的碱性化合物（C），当暴露于光化射线或辐射时，产生酸，条件是n和m满足关系n≥1，m≥2，n

3. 发明授权

US09081277B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern using the composition 有权
标题翻译：光化学射线或辐射敏感性树脂组合物，其中的光化射线或辐射敏感膜，以及使用组合物形成图案的方法
公开(公告)号：US09081277B2
公开(公告)日：2015-07-14
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/004 , C07C381/12 , G03F7/039 , G03F7/20 , G03F7/11
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

4. 发明申请

US20120273924A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：抗紫外线或辐射敏感性树脂组合物，其抗紫外线或辐射敏感性膜及其使用组合物形成图案的方法
公开(公告)号：US20120273924A1
公开(公告)日：2012-11-01
申请号：US13520106
申请日：2011-12-22
申请人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
发明人： Tomoki Matsuda , Akinori Shibuya , Yoko Tokugawa , Shuhei Yamaguchi , Mitsuhiro Fujita
IPC分类号： G03F7/027 , H01L21/311 , H01L29/02 , G03F7/20
CPC分类号： G03F7/0045 , C07C381/12 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041
摘要： Provided are an actinic-ray- or radiation-sensitive resin composition that excels in the sensitivity, roughness characteristics and exposure latitude, and a method of forming a pattern using the same. The composition includes (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, and (B) a compound that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid, the compound being any of compounds of general formula (1-1) below.
摘要翻译：提供了在灵敏度，粗糙度特性和曝光宽容度方面优异的光化射线或辐射敏感性树脂组合物，以及使用其形成图案的方法。组合物包括（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，和（B）当暴露于光化射线或辐射时被分解从而产生酸的化合物该化合物是下述通式（1-1）的化合物中的任何一种。

5. 发明授权

US08846290B2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same 有权
标题翻译：光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US08846290B2
公开(公告)日：2014-09-30
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
IPC分类号： G03F7/027 , C08F220/18
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。

6. 发明申请

US20120015302A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：化学敏感性或辐射敏感性树脂组合物和使用其的图案形成方法
公开(公告)号：US20120015302A1
公开(公告)日：2012-01-19
申请号：US13260777
申请日：2010-03-26
申请人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
发明人： Naohiro Tango , Michihiro Shirakawa , Mitsuhiro Fujita , Shuhei Yamaguchi , Akinori Shibuya , Shohei Kataoka
IPC分类号： G03F7/20 , G03F7/027 , G03F7/004 , B82Y30/00
CPC分类号： G03F7/0045 , C08F220/18 , C08F220/28 , C08F220/42 , G03F7/0397 , G03F7/2041 , C08F220/22
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
摘要翻译：光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生酸的化合物，其中（B）当以光化射线或辐射照射时能够产生酸的化合物的含量为10〜30质量％基于光化射线敏感性或辐射敏感性树脂组合物的全部固体含量，并且图案形成方法使用该组合物。

7. 发明授权

US5647083A Apparatus for cleaning substrates and methods for attaching/detaching and cleaning brushes of such apparatus 失效
标题翻译：用于清洁基板的装置和用于附接/拆卸和清洁这种装置的刷子的方法
公开(公告)号：US5647083A
公开(公告)日：1997-07-15
申请号：US495216
申请日：1995-06-28
申请人： Kenji Sugimoto , Nobuyasu Hiraoka , Mitsuhiro Fujita , Masami Ohtani
发明人： Kenji Sugimoto , Nobuyasu Hiraoka , Mitsuhiro Fujita , Masami Ohtani
IPC分类号： B08B1/04 , B08B3/02 , H01L21/00 , A46B13/02
CPC分类号： H01L21/67028 , B08B1/007 , B08B1/04 , B08B3/02
摘要： A plurality of brush support arms, each having a distal end unit brush attached thereto, stand by in juxtaposition in a standby position. The brush support arm having a desired brush attached thereto is selected from the plurality of brush support arms. Then, the selected brush support arm is connected at its proximal end to a distal end of a swing arm. The brush support arm engaged with the swing arm is swung with the swing arm about a pivotal point at a proximal end of the swing arm. As a result, the brush attached to the distal end of the selected brush support arm is moved between the standby position and the center of a substrate, to clean the substrate with this brush. Upon completion of this substrate cleaning, the brush support arm is returned to the standby position. A different brush support arm is selected in the standby position for use in a subsequent cleaning operation, and the substrate is cleaned with the brush connected to this different brush support arm.
摘要翻译：每个具有附接到其上的远端单元刷子的多个刷子支撑臂在待机位置处并列放置。从多个刷支撑臂中选择具有附接到其上的所需刷的刷支撑臂。然后，所选择的刷支撑臂在其近端处连接到摆臂的远端。与摇臂接合的刷子支撑臂与摆臂围绕摇臂的近端的枢转点摆动。结果，附着到所选择的刷支撑臂的远端的刷子在待机位置和衬底的中心之间移动，以用该刷清洁衬底。在完成该基板清洁之后，刷支撑臂返回待机位置。在备用位置中选择不同的刷支撑臂用于随后的清洁操作，并且用连接到该不同刷支撑臂的刷子清洁基板。

8. 发明授权

US5375575A Fuel-injection device 失效
标题翻译：燃油喷射装置
公开(公告)号：US5375575A
公开(公告)日：1994-12-27
申请号：US36863
申请日：1993-03-25
申请人： Takashi Ohishi , Mitsuhiro Fujita , Satoshi Yajima , Masahiko Shinagawa
发明人： Takashi Ohishi , Mitsuhiro Fujita , Satoshi Yajima , Masahiko Shinagawa
IPC分类号： F02B3/06 , F02D41/00 , F02D41/20 , F02D41/38 , F02D41/40 , F02M57/02 , F02M59/36 , F02M59/46 , F02D41/14
CPC分类号： F02D41/0085 , F02D41/20 , F02D41/38 , F02D41/40 , F02D41/401 , F02M57/02 , F02M59/366 , F02M59/466 , F02B3/06 , F02D2041/2027 , F02D2041/2051 , F02D2041/2055 , F02D2041/2058 , F02D2200/063 , F02D2200/503 , F02D41/008 , Y02T10/44
摘要： A fuel-injection device includes a solenoid valve which adjusts a fuel-injection level of a fuel-injection pump by adjusting its throttling for the fuel-injection passage to supply the fuel to a compressor. A driving pulse to drive the solenoid valve is formed taking various factors into consideration. For example, the driving pulse is composed of a segment having a large duty ratio and a segment having a small duty ratio in order to secure a responsiveness of the solenoid valve. The driving pulse is formed on the basis of a change in electrical voltage to drive the solenoid valve, varying levels of voltage drop in a wiring harness installed for every cylinder, and of varying levels of responsiveness unique with fuel-injection pumps.
摘要翻译：燃料喷射装置包括电磁阀，其通过调节燃料喷射通道的节流来调节燃料喷射泵的燃料喷射水平以将燃料供应给压缩机。考虑到各种因素，形成驱动电磁阀的驱动脉冲。例如，为了确保电磁阀的响应性，驱动脉冲由占空比大的部分和占空比小的部分构成。驱动脉冲基于电压变化来驱动电磁阀，对于每个气缸安装的线束中的电压降变化程度，以及燃料喷射泵独特的响应性水平。

9. 发明授权

US5323128A Dielectric filter having inter-resonator coupling including both magnetic and electric coupling 失效
标题翻译：具有谐振器耦合的介质滤波器包括磁耦合和电耦合
公开(公告)号：US5323128A
公开(公告)日：1994-06-21
申请号：US871698
申请日：1992-04-21
申请人： Toshio Ishizaki , Mitsuhiro Fujita , Hikaru Ikeda , Takashi Fujino
发明人： Toshio Ishizaki , Mitsuhiro Fujita , Hikaru Ikeda , Takashi Fujino
IPC分类号： H01P1/203 , H01P1/205 , H01P1/212 , H01P7/08 , H01P11/00
CPC分类号： H01P1/20345
摘要： A small and thin plane type narrow-band dielectric filter to be used for a portable telephone and the like, includes a plurality of end short-circuited strip line resonators having a length of about quarter-wavelength formed parallel and closely to each other on a first dielectric substrate and directly magnetically coupled to each other. The thus formed strip line resonators are partially bonded to parallel plane capacitor electrodes formed on a second dielectric substrate in respective overlapping areas thereby electrically coupling the strip line resonators through the parallel plane capacitors, so that the inter-resonator coupling can be reduced due to the fact that it is achieved in combination with the magnetic coupling and the electrical coupling.
摘要翻译：一种用于便携式电话等的小型和薄型平面型窄带介质滤波器包括多个端部短路带状线谐振器，其长度约为四分之一波长，形成为彼此平行且紧密地形成在第一电介质基板并且彼此直接磁耦合。这样形成的带状线谐振器部分地接合在各重叠区域上形成在第二电介质基板上的平行平面电容器电极，从而通过并联平面电容器使带状线谐振器电耦合，从而可以减小谐振器间耦合这是与磁耦合和电耦合相结合的事实。

10. 发明授权

US07240518B2 Process for producing spherical glass 失效
标题翻译：球形玻璃制造工艺
公开(公告)号：US07240518B2
公开(公告)日：2007-07-10
申请号：US10477152
申请日：2002-12-25
申请人： Masahiro Hiraka , Shigeo Furukawa , Mitsuhiro Fujita
发明人： Masahiro Hiraka , Shigeo Furukawa , Mitsuhiro Fujita
IPC分类号： C03B19/10 , C03C3/00
CPC分类号： C03C3/00 , C03B19/1045 , C03B19/1055 , C03B19/109 , Y02P40/57
摘要： The apparatus for producing glass beads of the present invention comprises a melting pot 2 for heating and melting glass, a nozzle 2A for dripping molten glass 4 in the melting pot 2, which is disposed at the bottom of the melting pot 2, and a liquid glass droplet receiver 11 filled with cooling solution 150 for cooling the liquid glass droplet 10 dripped from the nozzle 2A, which is disposed under the nozzle 2A, wherein the cooling solution 150 is made from a material that forms a bubble layer around the liquid glass droplet 10 as the cooling solution 150 is vaporized due to the heat of the liquid glass droplet 10 during a period when the liquid glass droplet 10 is cooled down to a temperature lower than the glass transfer temperature in the cooling solution 150.
摘要翻译：本发明的玻璃珠制造装置包括：熔融玻璃用熔融炉2，熔融锅2内的熔融玻璃4滴落用喷嘴2A，配置在熔池2的底部，液体玻璃液滴接收器11填充有冷却溶液150，用于冷却从喷嘴2A下方的喷嘴2A滴下的液体玻璃液滴10，其中冷却溶液150由围绕着形成气泡层的材料制成在液体玻璃液滴10被冷却到低于冷却溶液150中的玻璃转移温度的温度期间，由于液体玻璃液滴10的热量，冷却溶液150的液体玻璃液滴10蒸发。

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